Dr. Qi-De Qian Profile

Dr. Qi-De Qian

CTO at IC Scope Research

SPIE Involvement:

Author

Publications (22)

Proceedings Article | 3 May 2004 Paper

DFM through correct process construction

Qi-De Qian

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.535496

KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, Design for manufacturing, Image processing, Transistors, Critical dimension metrology, Resolution enhancement technologies, Compound parabolic concentrators, Standards development

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Proceedings Article | 17 December 2003 Paper

Focus latitude optimization for model-based OPC

Qi-De Qian, Shinichi Takase

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517996

KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Data modeling, Optical lithography, Lithography, Optimization (mathematics), Manufacturing, Model-based design, Printing

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Proceedings Article | 28 August 2003 Paper

Controlling defocus impact on OPC performance

Shinichi Takase, Qi-De Qian

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504380

KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Data modeling, Optical lithography, Lithography, Manufacturing, Printing, Model-based design, Process modeling

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Proceedings Article | 10 July 2003 Paper

LithoScope: an advanced physical modeling system for mask data verification

Qi-De Qian

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.487630

KEYWORDS: Photomasks, Data modeling, Optical proximity correction, Semiconducting wafers, Manufacturing, Lithography, Photoresist processing, Image processing, Systems modeling, Process modeling

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Proceedings Article | 27 December 2002 Paper

LithoScope: simulation-based mask layout verification with physical resist model

Qi-De Qian

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467780

KEYWORDS: Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Optical lithography, Photoresist processing, Process modeling, Systems modeling, Manufacturing, Image processing

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Proceedings Article | 27 December 2002 Paper

Digital image processor for complex shape metrology

Qi-De Qian

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467779

KEYWORDS: Metrology, Image processing, Photomasks, Manufacturing, Scanning electron microscopy, Digital imaging, Denoising, Digital image processing, Feature extraction, Critical dimension metrology

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Proceedings Article | 1 August 2002 Paper

Defect dispositioning using mask printability analysis on alternating phase-shifting masks

Chung-Hsing Chang, Chen-Hao Hsieh, San-De Tzu, Chang-Min Dai, Burn Lin, Linyong Pang, Qi-De Qian, Jiunn-Hung Chen, Jason Huang

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476976

KEYWORDS: Semiconducting wafers, Photomasks, Inspection, Scanning electron microscopy, Reticles, Phase shifts, Virtual reality, Printing, Phase shifting, Reflectivity

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Proceedings Article | 1 August 2002 Paper

Simulation based defect printability analysis on attenuated phase-shifting masks

Linyong Pang, Qi-De Qian, Kevin Chan, Nobuhito Toyama, Naoya Hayashi

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476979

KEYWORDS: Virtual reality, Inspection, Photomasks, Reticles, Semiconducting wafers, Phase shifts, Cadmium, Critical dimension metrology, Printing, Telecommunications

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Proceedings Article | 1 August 2002 Paper

Defect printability analysis on alternating phase-shifting masks

Linyong Pang, Qi-De Qian, Kevin Chan, Yasutaka Morikawa, Masaharu Nishiguchi, Naoya Hayashi

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476975

KEYWORDS: Photomasks, Inspection, Phase shifts, Semiconducting wafers, Virtual reality, Defect inspection, Cadmium sulfide, Manufacturing, Quartz, Wavefronts

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Proceedings Article | 16 July 2002 Paper

Defect printability analysis study using virtual stepper system in a production environment

Shao-Yung Chiou, Henrry Lei, WeiJyh Liu, M. Chu, Daryl Chiang, Steve Tuan, Chia-Lung Hong, Michael Chang, Jiunn-Hung Chen, Kevin Chan, Qi-De Qian, Lynn Cai, Linyong Pang

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473465

KEYWORDS: Photomasks, Semiconducting wafers, Binary data, Virtual reality, Inspection, Scanning electron microscopy, Decision support systems, Reticles, Phase shifts, Scanners

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Proceedings Article | 22 January 2001 Paper

Technological challenges in implementation of alternating phase-shift mask

Wilman Tsai, Qi-De Qian, Ken Buckmann, Wen-Hao Cheng, Long He, Brian Irvine, Marilyn Kamna, Yulia Korobko, Michael Kovalchick, Steven Labovitz, R. Talevi, Jeff Farnsworth

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410720

KEYWORDS: Etching, Photomasks, Inspection, Image processing, Critical dimension metrology, Optical lithography, Semiconducting wafers, Plasma etching, Phase shifts, Isotropic etching

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Proceedings Article | 5 July 2000 Paper

Impact of MEEF on low k1 lithography and mask inspection

Qi-De Qian

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389048

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Critical dimension metrology, Optical lithography, Databases, Lithography, Image resolution, Calibration, Image processing

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Proceedings Article | 8 December 1995 Paper

Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes

Pei-yang Yan, Qi-De Qian, Joan McCall, Joseph Langston, Yu Ger, Joe Cho, Robert Hainsey

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228166

KEYWORDS: Photomasks, Quartz, Semiconducting wafers, Carbon, Scanning electron microscopy, Atomic force microscopy, Printing, Ion beams, Laser ablation, Deep ultraviolet

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Proceedings Article | 8 December 1995 Paper

Predicting mask performance by numerical simulation

Qi-De Qian, Giang Dao, Pei-yang Yan, Francisco Leon

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228201

KEYWORDS: Photomasks, Semiconducting wafers, Wavefronts, Quartz, Lithography, Phase shifts, Numerical simulations, Maxwell's equations, Data modeling, Mask making

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Proceedings Article | 26 May 1995 Paper

Fast algorithms for 3D high NA lithography simulation

Qi-De Qian, Francisco Leon

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209269

KEYWORDS: 3D modeling, Photomasks, Imaging systems, Lithography, 3D image processing, Computer simulations, Wave propagation, Spatial frequencies, Coherence imaging, 3D image enhancement

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SPIE Journal Paper | 1 October 1993

Modeling spray/puddle dissolution processes for deep-ultraviolet acid-hardened resists

John Hutchinson, Siddhartha Das, Qi-De Qian, Henry Gaw

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.145968

KEYWORDS: Deep ultraviolet, Data modeling, Signal processing, Semiconducting wafers, Process modeling, Photoresist processing, Picture Archiving and Communication System, Lithography, In situ metrology, Systems modeling

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Proceedings Article | 8 August 1993 Paper

Effect of lens aberration on oblique-illumination stepper system

Pei-yang Yan, Qi-De Qian, Joseph Langston

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150422

KEYWORDS: Monochromatic aberrations, Distortion, Diffraction, Printing, Modulation transfer functions, Critical dimension metrology, Lithographic illumination, Optical lithography, Photomasks, Lithography

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Proceedings Article | 4 August 1993 Paper

Interferometric measurement of etch depths in phase-shift masks

Patrick Troccolo, Donald Cohen, Nelson Tam, Giang Dao, Qi-De Qian

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.149001

KEYWORDS: Photomasks, Etching, Phase shifts, Quartz, Interferometers, Phase measurement, Interferometry, Semiconducting wafers, Mirrors, Reticles

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Proceedings Article | 1 June 1992 Paper

Effect of chromatic aberration in excimer laser lithography

Pei-yang Yan, Qi-De Qian, Joseph Langston, Paco Leon

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130330

KEYWORDS: Spectral resolution, Excimer lasers, Chromatic aberrations, Modulation transfer functions, Colorimetry, Optical simulations, Lithography, Image quality, Lens design, Quartz

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Proceedings Article | 1 June 1992 Paper

Modeling spray/puddle dissolution processes for DUV acid-hardened resists

John Hutchinson, Siddhartha Das, Qi-De Qian, Henry Gaw

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130337

KEYWORDS: Signal processing, Semiconducting wafers, Data modeling, Process modeling, Picture Archiving and Communication System, Deep ultraviolet, Optical lithography, Lithography, Systems modeling, Statistical modeling

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Proceedings Article | 1 July 1991 Paper

Laser alignment modeling using rigorous numerical simulations

Gregory Wojcik, David Vaughan, John Mould, Francisco Leon, Qi-De Qian, Michael Lutz

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44789

KEYWORDS: Optical alignment, Chemical elements, 3D modeling, Computer simulations, Radio propagation, Scattering, Optical simulations, Metals, Wave propagation, Light scattering

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Proceedings Article | 1 July 1991 Paper

Study of the relationship between exposure margin and photolithographic process latitude and mask linearity

Steven Hansen, Giang Dao, Henry Gaw, Qi-De Qian, Peggy Spragg, Rodney Hurditch

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44784

KEYWORDS: Photomasks, Optical lithography, Absorption, Photoresist materials, Critical dimension metrology, Photoresist developing, Computer simulations, Electroluminescence, Lithography, Standards development

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Showing 5 of 22 publications

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