Mr. Seiji Takeuchi Profile

Seiji Takeuchi

at Canon U.S.A., Inc.

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 15 February 2017 Paper

Ultraminiature video-rate forward-view spectrally encoded endoscopy with straight axis configuration

Zhuo Wang, Tzu-Yu Wu, Mark Hamm, Alexander Altshuler, Anderson Mach, Donald Gilbody, Bin Wu, Santosh Ganesan, James Chung, Mitsuhiro Ikuta, Jacob Brauer, Seiji Takeuchi, Tokuyuki Honda

Proceedings Volume 10040, 100400M (2017) https://doi.org/10.1117/12.2253020

KEYWORDS: Endoscopes, Endoscopy, Optical design, Optical components, Diffraction gratings, Surgery, Spectroscopy, Image processing software, Diffraction, Neodymium, Reflection, Imaging systems

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SPIE Journal Paper | 1 January 2009

Influence of resist blur on resolution of hyper-NA immersion lithography beyond 45-nm half-pitch

Minoru Yoshii, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Seiji Takeuchi, Tokuyuki Honda, Toyohiko Yatagai

JM3, Vol. 8, Issue 01, 013003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3059551

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography

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Proceedings Article | 26 March 2007 Paper

Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography

Yasuhiro Kishikawa, Miyoko Kawashima, Akinori Ohkubo, Yuichi Iwasaki, Seiji Takeuchi, Minoru Yoshii, Tokuyuki Honda

Proceedings Volume 6520, 65203L (2007) https://doi.org/10.1117/12.711420

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Immersion lithography, Polymers, Interferometry, Lithography, Optical lithography, Optical simulations, Image resolution

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Proceedings Article | 22 March 2006 Paper

Visible light point-diffraction interferometer for testing of EUVL optics

Seiji Takeuchi, Osamu Kakuchi, Kenji Yamazoe, Yoshio Gomei, Todd Decker, Michael Johnson, Donald Phillion, John Taylor

Proceedings Volume 6151, 61510E (2006) https://doi.org/10.1117/12.656275

KEYWORDS: Wavefronts, Interferometers, Polarization, Optical testing, Calibration, Monochromatic aberrations, Visible radiation, Extreme ultraviolet lithography, Near field optics, Zernike polynomials

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Proceedings Article | 18 August 2005 Paper

Calibration of symmetric and non-symmetric errors for interferometry of ultra-precise imaging systems

Donald Phillion, Gary Sommargren, Michael Johnson, Todd Decker, John Taylor, Yoshio Gomei, Osamu Kakuchi, Seiji Takeuchi

Proceedings Volume 5869, 58690R (2005) https://doi.org/10.1117/12.623187

KEYWORDS: Wavefronts, Interferometers, Optical testing, Calibration, Mirrors, Spherical lenses, Interferometry, Phase interferometry, Extreme ultraviolet lithography, CCD cameras

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Proceedings Article | 18 August 2005 Paper

Construction and testing of wavefront reference sources for interferometry of ultra-precise imaging systems

Michael Johnson, Donald Phillion, Gary Sommargren, Todd Decker, John Taylor, Yoshio Gomei, Osamu Kakuchi, Seiji Takeuchi

Proceedings Volume 5869, 58690P (2005) https://doi.org/10.1117/12.623185

KEYWORDS: Wavefronts, Mirrors, Extreme ultraviolet lithography, Calibration, Silicon, Metrology, Charge-coupled devices, Polarization, Cameras, Monochromatic aberrations

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Proceedings Article | 14 November 2003 Paper

Precise in-situ transmission measurement system at 157 nm

Seiji Takeuchi, Yasuhiro Kishikawa, Minoru Yoshii, Akiyoshi Suzuki

Proceedings Volume 5192, (2003) https://doi.org/10.1117/12.506614

KEYWORDS: Beam splitters, Polarization, Transmittance, Sensors, Reflection, Calcium, Reflectivity, Lithography, Excimer lasers, Pulsed laser operation

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Proceedings Article | 16 June 2003 Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

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Proceedings Article | 30 July 2002 Paper

Development of environmental control technologies for 157-nm lithography at ASET

Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Hiroyuki Nagasaka, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Keiji Egawa, Takehito Watanabe, Ikuo Uchino, Akira Sumitani, Kiyoharu Nakao

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474622

KEYWORDS: Adhesives, Oxygen, Metals, Quartz, Lithography, Systems modeling, Transmittance, Information operations, Lenses, Scanning electron microscopy

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Proceedings Article | 14 September 2001 Paper

Present status of development of gas-purging and chemically clean technologies at ASET

Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Keiji Egawa, Takehito Watanabe, Kiyoharu Nakao

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435763

KEYWORDS: Oxygen, Nitrogen, Surface finishing, Contamination, Lithography, Sensors, Gases, Optical testing, Transmittance, Absorption

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Showing 5 of 10 publications

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