Mr. Chidane Ouchi Profile

Chidane Ouchi

at Canon Inc

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 21 March 2008 Paper

EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki, H. Yokota, K. Murakami, C. Ouchi, T. Hasegawa, M. Okada, K. Otaki, S. Kato, Y. Zhu, J. Kawakami, M. Hasegawa, T. Honda, M. Niibe

Proceedings Volume 6921, 69212U (2008) https://doi.org/10.1117/12.772624

KEYWORDS: Wavefronts, Diffusion tensor imaging, Optical testing, Extreme ultraviolet, Projection systems, Mirrors, EUV optics, Wavefront metrology, Interferometers, Optics manufacturing

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Proceedings Article | 24 March 2006 Paper

EUV wavefront metrology at EUVA

Hideo Yokota, Chidane Ouchi, Masahito Niibe, Takayuki Hasegawa, Masashi Okada, Mitsuo Takeda, Katsumi Sugisaki, Seima Kato, Jun Saito, Masanobu Hasegawa, Katsuhiko Murakami

Proceedings Volume 6152, 61522O (2006) https://doi.org/10.1117/12.656039

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Diffraction, EUV optics, Projection systems, Extreme ultraviolet lithography, Diffraction gratings, CCD cameras, Mirrors

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Proceedings Article | 17 September 2005 Paper

Comparisons between EUV at-wavelength metrological methods

Mikihiko Ishii, Masashi Okada, Akiyoshi Suzuki, Katsuhiko Murakami, Jun Saito, Katsumi Sugisaki, Chidane Ouchi, Yucong Zhu, Katsura Otaki, Masahito Niibe, Takayuki Hasegawa, Mitsuo Takeda, Masanobu Hasegawa, Jun Kawakami, Seima Kato, Hideo Yokota, Zhiqiang Liu

Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

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Proceedings Article | 10 May 2005 Paper

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Masanobu Hasegawa, Yucong Zhu, Akiyoshi Suzuki, Masashi Okada, Jun Saito, Chidane Ouchi, Zhiqiang Liu, Katsumi Sugisaki, Katsuhiko Murakami, Masahito Niibe, Katsura Ohtaki, Seima Kato, Mikihiko Ishii

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599456

KEYWORDS: Diffraction, Diffraction gratings, Calibration, Shearing interferometers, Wavefronts, Light sources, Interferometers, Monochromatic aberrations, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 10 May 2005 Paper

Experimental comparison of absolute PDI and lateral shearing interferometer

Masahito Niibe, Takayuki Hasegawa, Mikihiko Ishii, Akiyoshi Suzuki, Chidane Ouchi, Masanobu Hasegawa, Katsura Otaki, Zhiqian Liu, Seima Kato, Yucong Zhu, Masashi Okada, Jun Kawakami, Katsuhiko Murakami, Katsumi Sugisaki, Jun Saito

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600274

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Extreme ultraviolet lithography, Extreme ultraviolet, Charge-coupled devices, Diffraction, Interferometers, Photomasks, Monochromatic aberrations

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV interferometry methods in EUVA project

Jun Saito, Katsuhiko Murakami, Takayuki Hasegawa, Masashi Okada, Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, Seima Kato, Katsumi Sugisaki, Yucong Zhu, Chidane Ouchi, Masahito Niibe

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600468

KEYWORDS: Wavefronts, Optical testing, Diffraction, Charge-coupled devices, Extreme ultraviolet, Monochromatic aberrations, Interferometers, Phase shifts, Calibration, Diffraction gratings

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Proceedings Article | 18 October 2004 Paper

Recent progress of EUV wavefront metrology in EUVA

Katsura Otaki, Akiyoshi Suzuki, Seima Kato, Jun Saito, Akinori Ohkubo, Katsuhiko Murakami, Takayuki Hasegawa, Mitsuo Takeda, Katsumi Sugisaki, Masashi Okada, Masahito Niibe, Chidane Ouchi, Masanobu Hasegawa

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431

KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

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Proceedings Article | 20 May 2004 Paper

EUV wavefront metrology system in EUVA

Takayuki Hasegawa, Katsuhiko Murakami, Masahito Niibe, Akiyoshi Suzuki, Masanobu Hasegawa, Katsumi Sugisaki, Seima Kato, Chidane Ouchi, Jun Saito

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536327

KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Wavefront metrology, Photomasks, Metrology, Nickel, Synchrotron technology, Interferometers, Spherical lenses

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Proceedings Article | 20 May 2004 Paper

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

Seima Kato, Masanobu Hasegawa, Chidane Ouchi, Katsumi Sugisaki, Akiyoshi Suzuki, Katsuhiko Murakami, Masahito Niibe, Jun Saito

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537344

KEYWORDS: Oxygen, Contamination, Tantalum, Extreme ultraviolet, Nickel, Gold, Carbon, Adsorption, Projection systems, Wavefronts

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Proceedings Article | 20 May 2004 Paper

Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Masanobu Hasegawa, Chidane Ouchi, Masahito Niibe, Katsumi Sugisaki, Akiyoshi Suzuki, Yucong Zhu, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537331

KEYWORDS: Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography, Shearing interferometers, Phase shifts, Diffraction gratings, Projection systems, Algorithm development, Diffraction, Extreme ultraviolet

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Proceedings Article | 16 June 2003 Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Akiyoshi Suzuki, Mikihiko Ishii, Osamu Kakuchi, Jun Kawakami, Yutaka Watanabe, Seiji Takeuchi, Yucong Zhu, Chidane Ouchi, Jun Saito, Shinichi Hara, Katsumi Sugisaki, Tetsuya Oshino, Hiroyuki Kondo, Takayuki Hasegawa, Katsuhiko Murakami, Kazuya Ota, Yoshiyuki Sekine, Masanobu Hasegawa

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

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Proceedings Article | 30 July 2002 Paper

Development of low-loss optical coatings for 157-nm lithography

Yasuyuki Suzuki, Jun Saito, Tadahiko Saito, Shunsuke Niisaka, Masanobu Hasegawa, Kazuho Sone, Akira Tanaka, Minoru Otani, Akira Matsumoto, Ryuji Biro, Chidane Ouchi

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474550

KEYWORDS: Optical coatings, Lithography, Neodymium, Spectroscopy, Fluorine, Vacuum ultraviolet, Lenses, Transmittance, Absorption, Reflection

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Proceedings Article | 10 December 2001 Paper

Measurement of absorptance of optical coatings for F2 lithography

Akira Matsumoto, Masanobu Hasegawa, Chidane Ouchi, Kazuho Sone

Proceedings Volume 4449, (2001) https://doi.org/10.1117/12.450089

KEYWORDS: Nitrogen, Optical coatings, Lithography, Temperature metrology, Laser development, Contamination, Antireflective coatings, Absorption, Protactinium, Power meters

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Showing 5 of 13 publications

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