Dr. Chris A. Spence
VP Advanced Technology Development at ASML
SPIE Involvement:
Author
Publications (55)

Proceedings Article | 10 April 2024 Presentation + Paper
Jyun-Ming Chen, David Rio, Maxence Delorme, Cyrus Tabery, Christoph Hennerkes, Chris Spence, Benjamin Kam, Mohand Brouri, Nader Shamma
Proceedings Volume 12953, 129530C (2024) https://doi.org/10.1117/12.3010402
KEYWORDS: Photoresist materials, Optical proximity correction, Calibration, Semiconducting wafers, Shrinkage, Printing, Scanning electron microscopy, Photoresist developing, Metals, Critical dimension metrology

SPIE Journal Paper | 30 January 2024
Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jiyoon Chang, James Moon, Jun Ye
JM3, Vol. 23, Issue 01, 011204, (January 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011204
KEYWORDS: Microchannel plates, Optical proximity correction, Lithography, Extreme ultraviolet, Deep ultraviolet, Solids, SRAF, Metals, Photovoltaics, Data storage

Proceedings Article | 22 November 2023 Presentation
Cyrus Tabery, Miao Wang, Victor Blanco Carballo, Eren Canga, Aiqin Jiang, Chris Spence, Tom Wallow
Proceedings Volume PC12750, PC127500B (2023) https://doi.org/10.1117/12.2688141
KEYWORDS: Electron beam lithography, Metrology, Design and modelling, Scanning laser ophthalmoscopy, Scanning electron microscopy, Line width roughness, Image enhancement, Failure analysis, Extreme ultraviolet, Etching

Proceedings Article | 22 November 2023 Presentation
Thomas Wallow, Aiqin Jiang, Ton Kiers, Tim Houben, Chris Spence
Proceedings Volume PC12750, PC127500C (2023) https://doi.org/10.1117/12.2687837
KEYWORDS: Scanning electron microscopy, Defect detection, Extreme ultraviolet, Machine learning, Inspection

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 127500E (2023) https://doi.org/10.1117/12.2687699
KEYWORDS: Optical proximity correction, Semiconducting wafers, Extreme ultraviolet, Data modeling, Calibration, Metrology, Finite element methods, Critical dimension metrology, Contour modeling, Computer simulations

Proceedings Article | 28 April 2023 Presentation + Paper
Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jun Ye
Proceedings Volume 12495, 1249506 (2023) https://doi.org/10.1117/12.2658649
KEYWORDS: Optical proximity correction, Lithography, Extreme ultraviolet, Deep ultraviolet, Data storage

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11854, 118540C (2021) https://doi.org/10.1117/12.2600937
KEYWORDS: Stochastic processes, Semiconducting wafers, Ruthenium, Inspection, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 26 February 2021 Presentation + Paper
Adam Lyons, Luke Long, Tom Wallow, Chris Spence, Ton Kiers, Paul van Adrichem, Vidya Vaenkatesan, Jiyou Fu, Christoph Hennerkes, Cyrus Tabery
Proceedings Volume 11609, 116090C (2021) https://doi.org/10.1117/12.2584744

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11609, 116090T (2021) https://doi.org/10.1117/12.2583800

Proceedings Article | 13 October 2020 Poster + Paper
Adam Lyons, Tom Wallow, Christoph Hennerkes, Chris Spence, Maxence Delorme, David Rio, Dai Tsunoda, Yohei Torigoe, Masakazu Hamaji
Proceedings Volume 11517, 115171D (2020) https://doi.org/10.1117/12.2573160
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Process modeling, Extreme ultraviolet, Semiconducting wafers, Metrology, Calibration, Finite element methods

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 108090N (2018) https://doi.org/10.1117/12.2503321
KEYWORDS: Source mask optimization, Semiconducting wafers, Scanners, Logic, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet

Proceedings Article | 13 March 2018 Paper
Hidetami Yaegashi, Kyohei Koike, Carlos Fonseca, Fumiko Yamashita, Kumar Kaushik, Shinya Morikita, Kiyohito Ito, Shota Yoshimura, Vadim Timoshkov, Mark Maslow, Tae Kwon Jee, Liesbeth Reijnen, Peter Choi, Mu Feng, Chris Spence, Stijn Schoofs
Proceedings Volume 10586, 1058605 (2018) https://doi.org/10.1117/12.2297661
KEYWORDS: Extreme ultraviolet, Optical lithography, Plasma treatment, Stochastic processes, Extreme ultraviolet lithography, Photomasks, System on a chip, Lithography, Silica, Manufacturing

Proceedings Article | 16 October 2017 Presentation + Paper
Chris Spence, Quan Zhang, Vincent Shu, Been-Der Chen, Stanislas Baron, Yasuko Saito, Masakazu Hamaji, Yasuaki Horima, Shuichiro Ohara
Proceedings Volume 10451, 1045104 (2017) https://doi.org/10.1117/12.2280470
KEYWORDS: Photomasks, Optical proximity correction, Lithography, SRAF, Mask making, Process modeling

Proceedings Article | 28 April 2017 Presentation
Thomas Wallow, Chen Zhang, Anita Fumar-Pici, Jun Chen, Bart Laenens, Christopher Spence, David Rio, Paul van Adrichem, Harm Dillen, Jing Wang, Peng-Cheng Yang, Werner Gillijns, Patrick Jaenen, Frieda van Roey, Jeroen van de Kerkhove, Sergey Babin
Proceedings Volume 10145, 101451Q (2017) https://doi.org/10.1117/12.2260443
KEYWORDS: Metrology, Optical proximity correction, Data modeling, Optical lithography, Signal to noise ratio, OLE for process control, Instrument modeling, Image analysis, Calibration, Metals

Proceedings Article | 28 March 2017 Presentation + Paper
Jan Mulkens, Michael Hanna, Bram Slachter, Wim Tel, Michael Kubis, Mark Maslow, Chris Spence, Vadim Timoshkov
Proceedings Volume 10145, 1014505 (2017) https://doi.org/10.1117/12.2260155
KEYWORDS: Line edge roughness, Optical proximity correction, Optical lithography, Overlay metrology, Metrology, Lithography, Control systems, Extreme ultraviolet lithography, Extreme ultraviolet, Process control, Logic devices, Immersion lithography, Scanners, Semiconducting wafers, Critical dimension metrology, Line width roughness

Proceedings Article | 15 March 2016 Paper
Proceedings Volume 9780, 978005 (2016) https://doi.org/10.1117/12.2225456
KEYWORDS: Overlay metrology, Optical proximity correction, Etching, Metrology, Process modeling, Semiconducting wafers, Optical lithography, Photomasks, Lithography, Scanners

Proceedings Article | 19 March 2015 Paper
Stefan Hunsche, Marinus Jochemsen, Vivek Jain, Xinjian Zhou, Frank Chen, Venu Vellanki, Chris Spence, Sandip Halder, Dieter van den Heuvel, Vincent Truffert
Proceedings Volume 9424, 94241B (2015) https://doi.org/10.1117/12.2087178
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Scanners, Optical lithography, Metrology, Inspection, Critical dimension metrology, Reticles, Data modeling, Lithography

Proceedings Article | 16 March 2009 Paper
Martin Burkhardt, J. C. Arnold, Z. Baum, S. Burns, J. Chang, J. Chen, J. Cho, V. Dai, Y. Deng, S. Halle, G. Han, S. Holmes, D. Horak, S. Kanakasabapathy, R. H. Kim, A. Klatchko, C. S. Koay, A. Krasnoperova, Y. Ma, E. McLellan, K. Petrillo, S. Schmitz, C. Tabery, Y. Yin, L. Zhuang, Y. Zou, J. Kye, V. Paruchuri, S. Mansfield, C. Spence, M. Colburn
Proceedings Volume 7274, 727404 (2009) https://doi.org/10.1117/12.814433
KEYWORDS: Etching, Lithography, Printing, Optical lithography, Double patterning technology, Resolution enhancement technologies, Logic, Metals, Photomasks, Tolerancing

Proceedings Article | 13 March 2009 Paper
Proceedings Volume 7275, 72750U (2009) https://doi.org/10.1117/12.813522
KEYWORDS: Optical proximity correction, Photomasks, Computer simulations, Etching, Resolution enhancement technologies, Lithography, Statistical modeling, SRAF, Computer hardware, Optical lithography

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67300P (2007) https://doi.org/10.1117/12.746953
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Reticles, Optical proximity correction, Metrology, Environmental sensing, Wafer inspection, Critical dimension metrology, Defect detection

Proceedings Article | 20 October 2006 Paper
Andre Poock, Stephanie Maelzer, Chris Spence, Cyrus Tabery, Michael Lang, Guido Schnasse, Milko Peikert, Kaustuve Bhattacharyya
Proceedings Volume 6349, 63490U (2006) https://doi.org/10.1117/12.692525
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Wafer inspection, Reticles, Defect inspection, Defect detection, Wafer testing, Printing, Image resolution

Proceedings Article | 21 June 2006 Paper
Proceedings Volume 6281, 62810H (2006) https://doi.org/10.1117/12.692639
KEYWORDS: Optical proximity correction, Photomasks, Vestigial sideband modulation, Logic, SRAF, Reticles, Resolution enhancement technologies, Manufacturing, Metals, Data storage

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 599211 (2005) https://doi.org/10.1117/12.629369
KEYWORDS: Photomasks, Optical proximity correction, Vestigial sideband modulation, Resolution enhancement technologies, SRAF, Metals, Manufacturing, Logic, Reticles, Data storage

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.608020
KEYWORDS: Optical proximity correction, Photomasks, Data modeling, Lithography, Manufacturing, Mask making, Critical dimension metrology, Electronic design automation, Resolution enhancement technologies, Semiconducting wafers

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518220
KEYWORDS: Reticles, Semiconducting wafers, Lithography, Modulation transfer functions, Reflectivity, Spatial frequencies, Critical dimension metrology, Chromium, Antireflective coatings, Scanners

Proceedings Article | 26 June 2003 Paper
Rolf Seltmann, Rolf Stephan, Martin Mazur, Christopher Spence, Bruno La Fontaine, Dirk Stankowski, Andre Poock, Wolfram Grundke
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485337
KEYWORDS: Scanners, Reticles, Manufacturing, Semiconducting wafers, Critical dimension metrology, Optical filters, Contamination, Modulation transfer functions, Logic, Etching

Proceedings Article | 27 December 2002 Paper
Chris Spence, Cyrus Tabery, Gerald Cantrell, Leslie Dahl, Peter Buck, William Wilkinson
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468094
KEYWORDS: Semiconducting wafers, Photomasks, Reticles, Image processing, Lithography, Etching, Photoresist processing, Absorption, Reflectivity, Optical proximity correction

Proceedings Article | 11 March 2002 Paper
Jerry Chen, John Riddick, Matt Lamantia, Azeddine Zerrade, Robert Henderson, Greg Hughes, Cyrus Tabery, Khoi Phan, Chris Spence, Amy Winder, William Stanton, Eugene Delarosa, John Maltabes, Cecilia Philbin, Lloyd Litt, Anthony Vacca, Scott Pomeroy
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458362
KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Scanning electron microscopy, Etching, Atomic force microscopy, Ions, Reticles, Inspection, Critical dimension metrology

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435743
KEYWORDS: Photomasks, Etching, Quartz, Solids, Cadmium, Error analysis, Phase shifts, Critical dimension metrology, Lithography, Phase shifting

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435716
KEYWORDS: Photomasks, Reticles, Lithography, Inspection, Optical proximity correction, Semiconducting wafers, Virtual reality, Resolution enhancement technologies, Decision support systems, Critical dimension metrology

Proceedings Article | 14 September 2001 Paper
Marina Plat, Chris Spence, Christopher Lyons, Amada Wilkison
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435785
KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Binary data, Monochromatic aberrations, Scanners, Optical proximity correction, Polymers, Etching

Proceedings Article | 5 September 2001 Paper
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438388
KEYWORDS: Semiconducting wafers, Photomasks, Reticles, Virtual reality, Scanning electron microscopy, Decision support systems, Critical dimension metrology, Optical proximity correction, Inspection, Tolerancing

Proceedings Article | 22 January 2001 Paper
Khoi Phan, Chris Spence, John Riddick, Jerry Chen, Matt Lamantia, Hugo Villa
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410693
KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Inspection, Scanning electron microscopy, Optical proximity correction, Binary data, Printing, 193nm lithography, Defect detection

Proceedings Article | 19 July 2000 Paper
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392102
KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Semiconducting wafers, Phase shifts, Distortion, Binary data, Transistors, Visualization, Logic

Proceedings Article | 5 July 2000 Paper
Marina Plat, Khanh Nguyen, Chris Spence, Christopher Lyons, Amada Wilkison
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389009
KEYWORDS: Photomasks, Binary data, Critical dimension metrology, Reticles, Image enhancement, Semiconducting wafers, Cadmium, Optical lithography, Image quality, Optical proximity correction

Proceedings Article | 5 July 2000 Paper
Chris Spence, Ramkumar Subramanian, David Teng, Ernesto Gallardo
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389052
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Optical lithography, Cadmium, Reticles, Metrology, Image processing, Scanning electron microscopy, Detection and tracking algorithms

Proceedings Article | 2 June 2000 Paper
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386536
KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Lithography, Scanning electron microscopy, 193nm lithography, Binary data, Optical proximity correction, Antimony, Scanners

Proceedings Article | 30 December 1999 Paper
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373322
KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Phase shifts, Semiconducting wafers, Distortion, Transistors, Binary data, Computer aided design, Data modeling

Proceedings Article | 30 December 1999 Paper
Khoi Phan, Chris Spence, S. Dakshina-Murthy, Vidya Bala, Alvina Williams, Steve Strener, Richard Eandi, Junling Li, Linard Karklin
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373301
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Scanning electron microscopy, Inspection, Optical proximity correction, Binary data, Photoresist processing, Microscopes, Lithography

Proceedings Article | 26 July 1999 Paper
Ramkumar Subramanian, Chris Spence, Luigi Capodieci, Thomas Werner, Ernesto Gallardo
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354409
KEYWORDS: Photomasks, Lithography, Printing, Binary data, Semiconducting wafers, Optical lithography, Deep ultraviolet, Scanning electron microscopy, Phase shifts, Dielectrics

Proceedings Article | 26 July 1999 Paper
Rolf Seltmann, Anna Maria Minvielle, Chris Spence, Sven Muehle, Luigi Capodieci, Khanh Nguyen
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354337
KEYWORDS: Reticles, Semiconducting wafers, Scanners, Cadmium, Monochromatic aberrations, Deep ultraviolet, Critical dimension metrology, Photomasks, Photoresist processing, Manufacturing

Proceedings Article | 4 September 1998 Paper
Qi Xiang, Subash Gupta, Chris Spence, Bhanwar Singh, Geoffrey Yeap, Ming-Ren Lin
Proceedings Volume 3506, (1998) https://doi.org/10.1117/12.323977
KEYWORDS: Etching, Transistors, Oxides, Optical lithography, Metrology, Scanning electron microscopy, Lithography, Molybdenum, Deep ultraviolet, Photoresist materials

Proceedings Article | 1 September 1998 Paper
Chris Spence, David Emery, Larry Zurbrick, Durai Prakash, X. Chang, Steve Khanna, Brent Leback, Eiji Tsujimoto, Greg Hughes, Baorui Yang
Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328859
KEYWORDS: Inspection, Reticles, Photomasks, Deep ultraviolet, Detection and tracking algorithms, Algorithm development, Defect detection, Phase shifts, Semiconducting wafers, Etching

Proceedings Article | 29 June 1998 Paper
Regina Schmidt, Chris Spence, Luigi Capodieci, Zoran Krivokapic, Bernd Geh, Donis Flagello
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310750
KEYWORDS: Monochromatic aberrations, Critical dimension metrology, Cadmium, Reticles, Phase shifts, Etching, Photomasks, Semiconducting wafers, Binary data, Profilometers

Proceedings Article | 7 July 1997 Paper
Regina Schmidt, Chris Spence
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275971
KEYWORDS: Critical dimension metrology, Printing, Photomasks, Semiconducting wafers, Scanning electron microscopy, Binary data, Photoresist processing, Inspection

Proceedings Article | 7 July 1997 Paper
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276034
KEYWORDS: Manufacturing, Critical dimension metrology, Phase shifting, Optical proximity correction, Control systems, Logic devices, Optics manufacturing, Binary data, Phase shifts, Switches

Proceedings Article | 12 February 1997 Open Access Paper
Chris Spence, John Nistler, William Arnold, David Emery, Larry Zurbrick, Durai Prakash, X. Chang, Steve Khanna, Brent Leback, Eiji Tsujimoto, Greg Hughes
Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301195
KEYWORDS: Inspection, Reticles, Detection and tracking algorithms, Photomasks, Deep ultraviolet, Etching, Phase shift keying, Algorithm development, Defect detection, Phase shifts

Proceedings Article | 3 November 1994 Paper
Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191965
KEYWORDS: Photomasks, Computer aided design, Optical design, Image processing, Logic, Databases, X-ray technology, Logic devices, Algorithm development, Computing systems

Proceedings Article | 17 May 1994 Paper
Chris Spence, John Nistler, Eytan Barouch, Uwe Hollerbach, Steven Orszag
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175424
KEYWORDS: Computer aided design, Tolerancing, Deep ultraviolet, Computer simulations, Scanning electron microscopy, Photomasks, Optical design, Image enhancement, Optical proximity correction, Lithography

Proceedings Article | 1 June 1992 Paper
Chris Spence, Daniel Cole, Barbara Peck
Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130328
KEYWORDS: Optical lithography, Tolerancing, Printing, Semiconducting wafers, Photomasks, Scanning electron microscopy, Chlorine, Adaptive optics, Monochromatic aberrations, Nano opto mechanical systems

Proceedings Article | 1 June 1992 Paper
Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59795
KEYWORDS: Photomasks, Phase shifts, Opacity, Phase shifting, Inspection, Integrated circuits, Metrology, Process control, Reticles, Lithography

Proceedings Article | 1 June 1991 Paper
T. Dao, Chris Spence, Dennis Hess
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46377
KEYWORDS: Silicon, FT-IR spectroscopy, Crystals, Nitrogen, Quartz, Polymers, Head-mounted displays, Molecules, Absorbance, Photoresist processing

Proceedings Article | 1 June 1991 Paper
Chris Spence, Richard Ferguson
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46381
KEYWORDS: Data modeling, Absorption, Data acquisition, Silicon, Transmittance, Semiconducting wafers, Reflectivity, FT-IR spectroscopy, Photoresist materials, Chemical reactions

Proceedings Article | 1 June 1990 Paper
Chris Spence, Scott MacDonald, Hubert Schlosser
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20097
KEYWORDS: Silicon, Silicon films, Etching, Head-mounted displays, Polymers, FT-IR spectroscopy, Diffusion, Reactive ion etching, Semiconducting wafers, Absorption

Proceedings Article | 1 June 1990 Paper
Richard Ferguson, Chris Spence, Elsa Reichmanis, Larry Thompson, Andrew Neureuther
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20086
KEYWORDS: Absorption, Chemical reactions, Absorbance, FT-IR spectroscopy, Data modeling, Temperature metrology, Industrial chemicals, Deep ultraviolet, Transmittance, Photoresist processing

Showing 5 of 55 publications
Conference Committee Involvement (3)
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
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