Mr. SinFu Yeh Profile

SinFu Yeh

at Zeon Corp

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Author

Publications (5)

Proceedings Article | 9 April 2024 Presentation + Paper

Main chain scission resists towards high-NA EUV lithography

Akihide Shirotori, Yuji Oda, Rui Zhang, Kazunori Taguchi, Nobuhiro Sato, Sin Fu Yeh , Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, Hideaki Sanuki

Proceedings Volume 12957, 129570P (2024) https://doi.org/10.1117/12.3009737

KEYWORDS: Extreme ultraviolet lithography, Lithography, Polymers, Extreme ultraviolet, Film thickness, Etching, Electron beam lithography, Optical lithography, Photoresist materials, Critical dimension metrology

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Proceedings Article | 9 April 2024 Poster + Paper

Studies on resolution with ZEP530A for EUV mask

Akihide Shirotori, Takashi Tsutsumi, Sin Fu Yeh, Kenji Kuroyanagi

Proceedings Volume 12956, 129560U (2024) https://doi.org/10.1117/12.3010109

KEYWORDS: Lithography, Polymers, Solubility, Extreme ultraviolet, Design, Viscosity, Line edge roughness, Bridges, Extreme ultraviolet lithography, Electron beam lithography

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Proceedings Article | 21 November 2023 Poster + Paper

Update on main chain scission resists in Zeon for high-NA EUV lithography

Akihide Shirotori, Yuji Oda, Kazunori Taguchi, Sin Fu Yeh, Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, Hideaki Sanuki

Proceedings Volume 12750, 127500U (2023) https://doi.org/10.1117/12.2686602

KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Polymers, Lithography, Stochastic processes, Scanners, Printing, High volume manufacturing, Extreme ultraviolet, Polymer thin films

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Proceedings Article | 1 May 2023 Presentation + Paper

Development on main chain scission resists for high-NA EUV lithography

Akihide Shirotori, Manabu Hoshino, Makoto Fujimura, Sin Fu Yeh , Hyo Seon Suh, Danilo De Simone, Geert Vandenberghe, Hideaki Sanuki

Proceedings Volume 12498, 1249807 (2023) https://doi.org/10.1117/12.2657506

KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Extreme ultraviolet, Scanners, Photoresist materials, Compact discs, Coating, Etching, Electron beam lithography

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Proceedings Article | 25 May 2022 Presentation + Paper

Improved resolution with main chain scission resists for EUV lithography

Akihide Shirotori, Manabu Hoshino, Ashish Rathore, SinFu Yeh , Danilo De Simone, Geert Vandenberghe, Hirokazu Matsumoto

Proceedings Volume 12055, 120550E (2022) https://doi.org/10.1117/12.2613445

KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Extreme ultraviolet, Electron beam lithography, Etching, Photoresist processing, Optical lithography, Photoresist materials, Photomasks

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