Dr. Takahiro Ikeda Profile

Dr. Takahiro Ikeda

CEO at Pi PHOTONICS, INC.

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Author

Publications (9)

SPIE Journal Paper | 1 November 2005 Open Access

Erythrocyte structure and dynamics quantified by Hilbert phase microscopy

Gabriel Popescu, Takahiro Ikeda, Catherine Best, Kamran Badizadegan, Ramachandra Dasari, Michael Feld

JBO, Vol. 10, Issue 06, 060503, (November 2005) https://doi.org/10.1117/12.10.1117/1.2149847

KEYWORDS: Microscopy, High power microwaves, Blood, Microscopes, Photonics, Phase measurement, Refractive index, Collimation, Charge-coupled devices, Spectroscopy

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Proceedings Article | 1 September 2005 Open Access

Nanometer fluctuations of erythrocytes imaged by Hilbert phase microscopy

Gabriel Popescu, Takahiro Ikeda, Kamran Badizadegan, Ramachandra Dasari, Michael Feld

Proceedings Volume 5864, 58640B (2005) https://doi.org/10.1117/12.632916

KEYWORDS: High power microwaves, Microscopy, Blood, Microscopes, Atomic force microscopy, Charge-coupled devices, Phase shifts, Objectives, Beam splitters, Imaging spectroscopy

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Proceedings Article | 20 August 2004 Paper

A photomask defect evaluation system

Eiji Yamanaka, Shingo Kanamitsu, Takashi Hirano, Satoshi Tanaka, Takahiro Ikeda, Osamu Ikenaga, Tsukasa Kawashima, Syogo Narukawa, Hideaki Kobayashi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557782

KEYWORDS: Photomasks, Scanning electron microscopy, Semiconducting wafers, Manufacturing, Inspection, Image resolution, Lithography, Standards development, Defect detection, Data conversion

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Proceedings Article | 20 August 2004 Paper

Tolerance-based process proximity correction (PPC) verification methodology

Kohji Hashimoto, Hiroharu Fujise, Shigeki Nojima, Takeshi Ito, Takahiro Ikeda

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557795

KEYWORDS: Tolerancing, Computer aided design, Lithography, Scanning electron microscopy, Manufacturing, Feature extraction, Optical lithography, Image processing, Metals, Optical proximity correction

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Proceedings Article | 24 May 2004 Paper

Measurement precision of CD-SEM for 65-nm technology node

Hideaki Abe, Hiroshi Motoki, Takahiro Ikeda, Yuichiro Yamazaki

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534910

KEYWORDS: Critical dimension metrology, Factor analysis, Semiconducting wafers, Pattern recognition, Error analysis, Image quality, Scanning electron microscopy, Quality measurement, Semiconductors, Neodymium

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Proceedings Article | 17 December 2003 Paper

Fine pixel CD-SEM for measurements of two-dimensional patterns

Shinji Yamaguchi, Masamitsu Itoh, Takahiro Ikeda, Yumiko Miyano, Tadashi Mitsui, Masuo Amma, Shoichi Horikawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518289

KEYWORDS: Scanning electron microscopy, Optical proximity correction, Image quality, Image acquisition, Head, Algorithm development, Semiconductors, Quality measurement, Photomasks, Electron beams

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Proceedings Article | 26 June 2003 Paper

Model-based PPC verification methodology with two dimentional pattern feature extraction

Kohji Hashimoto, Takeshi Ito, Takahiro Ikeda, Shigeki Nojima, Soichi Inoue

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485511

KEYWORDS: Lithography, Semiconducting wafers, Model-based design, Photomasks, Solid modeling, Feature extraction, Feedback loops, Computer aided design, Optical lithography, Photoresist processing

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Proceedings Article | 2 June 2003 Paper

Pattern shape comparison methods using SEM image

Takahiro Ikeda, Toshiya Kotani, Takashi Sato, Kusuo Ueno, Ryoichi Matsuoka

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482831

KEYWORDS: Computer aided design, Scanning electron microscopy, Semiconducting wafers, Photomasks, Data acquisition, Lithography, Image filtering, Inspection, Data modeling, Algorithm development

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Proceedings Article | 29 June 1998 Paper

Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography

Masafumi Asano, Yumiko Maruyama, Toru Koike, Kenji Chiba, Eishi Shiobara, Takahiro Ikeda

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312447

KEYWORDS: Photoresist processing, Image processing, Lithography, Critical dimension metrology, Etching, Excimer lasers, Scanning electron microscopy, Reactive ion etching, Lithographic illumination, Geometrical optics

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Showing 5 of 9 publications

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