Mr. Tetsuya Kitagawa Profile

Tetsuya Kitagawa

at Sony Corp

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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Proceedings Article | 20 August 2004 Paper

Feedforward correction of mask image placement for proximity electron lithography

Shinji Omori, Shinichiro Nohdo, Tomonori Motohashi, Tetsuya Kitagawa, Takashi Susa, Kenta Yotsui, Kojiro Itoh, Akira Tamura

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557821

KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Metrology, Lithography, Distortion, Scanners, Data corrections, Electron beams, Data processing

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Proceedings Article | 20 August 2004 Paper

A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, Shigeru Moriya, Tetsuya Kitagawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822

KEYWORDS: Photomasks, Inspection, Lithography, Defect detection, Electron beam lithography, Etching, Semiconducting wafers, Photoresist processing, Monte Carlo methods, Opacity

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 20 May 2004 Paper

Analysis of critical dimension uniformity for LEEPL

Masaki Yoshizawa, Kazuya Iwase, Hiizu Ohtorii, Kumiko Oguni, Hiroki Hane, Keiko Amai, Shigeru Moriya, Hiroyuki Nakano, Tetsuya Kitagawa

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536029

KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Edge roughness, Electrons, Scanning electron microscopy, Scattering, Semiconducting wafers, Lithography, Image enhancement

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Proceedings Article | 20 May 2004 Paper

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Tetsuya Kitagawa, Masaki Yoshizawa, Kazuya Iwase, Shinji Omori, Shoji Nohama, Hiroyuki Nakano, Shigeru Moriya, Hiroichi Kawahira

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423

KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

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Proceedings Article | 17 December 2003 Paper

Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Shinji Omori, Kazuya Iwase, Keiko Amai, Yoko Watanabe, Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Tetsuya Kitagawa, Kenta Yotsui, Gaku Suzuki, Akira Tamura

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photoresist processing, Image processing, Scanners, Etching, Electroluminescence, Overlay metrology, Charged-particle lithography

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Proceedings Article | 28 August 2003 Paper

State-of-the-art performance of stencil mask for LEEPL

Shoji Nohama, Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504273

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Etching, Image enhancement, Scanning electron microscopy, Line edge roughness, Lithography, Photoresist processing, Defect inspection

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Proceedings Article | 28 August 2003 Paper

Alignment accuracy of LEEPL: image placement error correction

Shinichiro Nohdo, Tomonori Motohashi, Nobuo Shimazu, Hiroyuki Nakano, Shinji Omori, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504067

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Lithography, Optical alignment, Distortion, Overlay metrology, Resolution enhancement technologies, Silicon carbide, Cadmium sulfide

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Proceedings Article | 28 August 2003 Paper

On-site use of 1x stencil mask: control over image placement and dimension

Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504258

KEYWORDS: Photomasks, Semiconducting wafers, Contamination, Critical dimension metrology, Lithography, Metrology, Distortion, Overlay metrology, Charged-particle lithography, Silicon

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Proceedings Article | 16 June 2003 Paper

Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node

Hiroyuki Nakano, Shinichiro Nohdo, Kumiko Oguni, Tomonori Motohashi, Masaki Yoshizawa, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484429

KEYWORDS: Charged-particle lithography, Lithography, Photoresist processing, Electron beam lithography, Image resolution, Silicon, Oxides, Electron beams, Chemically amplified resists, Photomasks

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Proceedings Article | 1 August 2002 Paper

Assessment of mask quality assurance method of critical layers with high MEEF

Hiroyuki Ishida, Michihide Tanaka, Yasuhiro Mizuma, Tetuya Kitagawa, Akihiro Ogura

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476980

KEYWORDS: Photomasks, Inspection, Lithography, Semiconducting wafers, Cadmium sulfide, Defect detection, Molybdenum, Scanning electron microscopy, Semiconductors, Process engineering

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Proceedings Article | 14 September 2001 Paper

Br lamp for F2 laser wavelength calibration

Masaki Yoshioka, Tetsuya Kitagawa, Tomoyoshi Arimoto, Hiromitsu Matsuno, Tatsumi Hiramoto, Toru Suzuki, Kazuaki Hotta

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435659

KEYWORDS: Bromine, Lamps, Calibration, Chemical species, Argon, Doppler effect, Excimers, Electrodes, Vacuum ultraviolet, Glasses

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Proceedings Article | 1 September 1998 Paper

Mask CD quality assurance specifications for 0.25-um devices with a practical lithography window

Takehiko Gunji, Tetuya Kitagawa, Kunihiko Tsuboi

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328825

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Lithography, Wafer-level optics, Defect inspection, Inspection, Ion beams, Particles, Transmittance

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Showing 5 of 14 publications

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