Dr. Toru Suzuki Profile

Dr. Toru Suzuki

at Gigaphoton Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 16 March 2009 Paper

Paper

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Masaya Yoshino, Shinichi Matsumoto, Hidenori Watanabe, Toru Suzuki, Akihiko Kurosu, Satoshi Tanaka, Hiroshi Umeda, Hiroaki Nakarai, Hakaru Mizoguchi, Takahito Kumazaki, Takashi Matsunaga, Hiroaki Tsushima, Junichi Fujimoto, Yasufumi Kawasuji, Takeshi Ohta

Proceedings Volume 7274, 72743L (2009) https://doi.org/10.1117/12.813642

KEYWORDS: Reliability, Oscillators, Light sources, Fluorine, Laser applications, Double patterning technology, Optical amplifiers, High power lasers, Excimer lasers, Immersion lithography

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Proceedings Article | 16 March 2009 Paper

Paper

Optical performance of laser light source for ArF immersion double patterning lithography tool

Satoshi Tanaka, Takeshi Ohta, Takahito Kumazaki, Takashi Matsunaga, Yasufumi Kawasuji, Akihiko Kurosu, Hidenori Watanabe, Hiroaki Nakarai, Katsuhiko Wakana, Junichi Fujimoto, Shinichi Matsumoto, Masaya Yoshino, Hiroaki Tsushima, Hakaru Mizoguchi, Toru Suzuki

Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476

KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

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Proceedings Article | 11 April 2008 Paper

Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Hitoshi Nagano, Toru Suzuki, Takashi Matsunaga, Masaya Yoshino, Junichi Fujimoto, Yukio Watanabe, Shinji Nagai, Hiroaki Nakarai, Takeshi Ohta, Kouji Kakizaki, Toru Abe, Osamu Wakabayashi, Ryoichi Nohdomi, Hiroshi Umeda, Hakaru Mizoguchi, Taku Yamazaki, Satoshi Tanaka, Yasufumi Kawasuji

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

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Proceedings Article | 7 March 2008 Paper

Paper

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Hiroshi Umeda, Takashi Matsunaga, Yasufumi Kawasuji, Ryoichi Nohdomi, Toru Suzuki, Kouji Kakizaki, Shinichi Matsumoto, Satoshi Tanaka, Hitoshi Nagano, Junichi Fujimoto, Hakaru Mizoguchi, Masaya Yoshino, Takahito Kumazaki, Hiroaki Nakarai

Proceedings Volume 6924, 69242R (2008) https://doi.org/10.1117/12.778149

KEYWORDS: Semiconducting wafers, Reliability, Immersion lithography, Light sources, Laser stabilization, Metrology, High power lasers, Spectroscopy, Laser development, Laser applications

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Proceedings Article | 26 March 2007 Paper

Paper

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Toru Suzuki, Kouji Kakizaki, Yasufumi Kawasuji, Shinji Nagai, Takashi Matsunaga, Hitoshi Nagano, Hiroshi Umeda, Hakaru Mizoguchi, Takahito Kumazaki, Masashi Shimbori, Masaya Yoshino, Youichi Sasaki, Satoshi Tanaka

Proceedings Volume 6520, 652024 (2007) https://doi.org/10.1117/12.711366

KEYWORDS: Light sources, Spectroscopy, Immersion lithography, Optical proximity correction, Excimer lasers, Lithography, Scanners, Laser applications, Laser development, Critical dimension metrology

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Proceedings Article | 15 March 2006 Paper

Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Shinji Nagai, Hiroaki Tsushima, Koji Kakizaki, Satoshi Tanaka, Junichi Fujimoto, Toru Suzuki, Toyoharu Inoue, Hitoshi Tomaru, Taku Yamazaki, Takanori Nakaike, Takashi Matsunaga, Takashi Saito, Hakaru Mizoguchi, Osamu Wakabayashi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

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Proceedings Article | 12 May 2005 Paper

Paper

High-power injection lock laser platform for ArF dry/wet lithography

M. Moriya, J. Kinoshita, H. Tanaka, H. Nagano, H. Mizoguchi, T. Inoue, Y. Sasaki, N. Matsui, M. Niwano, J. Fujimoto, M. Yoshino, M. Kaminishi, Y. Watanabe, H. Nogawa, K. Kakizaki, T. Abe, T. Suzuki, S. Sakanishi, M. Nakane, H. Hayashi, M. Shinbori, M. Yashiro, H. Taniguchi, T. Ohta, T. Yamazaki, T. Nakaike, T. Kawasuji, M. Goto, S. Tanaka, A. Kurosu, T. Matsunaga, T. Mimura, K. Miyao, H. Umeda, T. Ito

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600796

KEYWORDS: Molybdenum, Lithography, High power lasers, Optical lithography, 193nm lithography, Control systems, Light sources, Optical components, Oscillators, Laser development

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Proceedings Article | 28 May 2004 Paper

Paper

Development of high-power ArF/F2 laser platform for VUV microlithography

Toyoharu Inoue, Kouji Kakizaki, Takayuki Yabu, Akira Sumitani, Tatsuya Ariga, Hakaru Mizoguchi, Tsukasa Hori, Toru Suzuki, Junichi Fujimoto, Koutarou Sasano, Takayuki Watanabe, Yukio Watanabe, Masashi Kaminishi, Takashi Matsunaga, Taku Yamazaki, Yasufumi Kawasuji, Takahito Kumazaki, Osamu Wakabayashi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536846

KEYWORDS: High power lasers, Optical lithography, Vacuum ultraviolet, Mirrors, Lithography, Reliability, Light sources, Magnetism, Laser development

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Proceedings Article | 26 June 2003 Paper

Paper

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Taku Yamazaki, Hitoshi Tomaru, Toyoharu Inoue, Hirotoshi Inoue, Hakaru Mizoguchi, Junichi Fujimoto, Kouji Kakizaki, Toru Suzuki, Takashi Matsunaga, Takashi Saito, Akira Sumitani, Osamu Wakabayashi, Masaya Yoshino, Katsutomo Terashima, Tatsuo Enami

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485386

KEYWORDS: Excimer lasers, Lithography, Acoustics, Reliability, Electrodes, Laser development, Laser stabilization, Magnetism, Laser ablation, Fabry–Perot interferometers

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Proceedings Article | 30 July 2002 Paper

Paper

Spectral metrologies for ultra-line-narrowed F2 laser

Masaki Yoshioka, Hakaru Mizoguchi, Takashi Suganuma, Takahito Kumazaki, Osamu Wakabayashi, Takanori Nakaike, Tatsuya Ariga, Kiyoharu Nakao, Toru Suzuki, Ryoichi Nohdomi, Naoki Kitatochi, Kazuaki Hotta

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474560

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Laser development, Calibration, Refractor telescopes, Metrology, Light sources, Laser systems engineering, Oscillators, Optical lithography

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Proceedings Article | 14 September 2001 Paper

Paper

Spectral measurement of ultra line-narrowed F2 laser

Shuntaro Watanabe, Kiyoharu Nakao, Toru Suzuki, Kazuaki Hotta, Osamu Wakabayashi, Takashi Suganuma, Takanori Nakaike, Tadashi Togashi, Naoki Kitatochi, Takahito Kumazaki, Yasuo Nabekawa, Jun Sakuma, Hakaru Mizoguchi, Hirokazu Kubo

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435638

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Light sources, Laser development, Michelson interferometers, Calibration, Xenon, Spectral calibration, Excimer lasers, Sapphire lasers

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Proceedings Article | 14 September 2001 Paper

Paper

Br lamp for F2 laser wavelength calibration

Tomoyoshi Arimoto, Tetsuya Kitagawa, Masaki Yoshioka, Toru Suzuki, Kazuaki Hotta, Tatsumi Hiramoto, Hiromitsu Matsuno

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435659

KEYWORDS: Bromine, Lamps, Calibration, Chemical species, Argon, Doppler effect, Excimers, Electrodes, Vacuum ultraviolet, Glasses

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Proceedings Article | 14 September 2001 Paper

Paper

High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Takashi Suganuma, Osamu Wakabayashi, Toshio Yamashita, Hirokazu Kubo, Hakaru Mizoguchi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435662

KEYWORDS: Spectroscopy, Excimer lasers, Diffraction gratings, Holography, Diffraction, Light sources, Collimators, Surface plasmons, Mirrors, Charge-coupled devices

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Proceedings Article | 6 November 2000 Paper

Paper

High-repetition-rate ArF excimer laser for microlithography

Yasuo Itakura, Satoshi Andou, Ken Ishii, Osamu Wakabayashi, Hakaru Mizoguchi, Tatsuo Enami, Hiroshi Umeda, Hirokazu Tanaka, Hirokazu Kubo, Toru Suzuki, Ayako Ohbu, Takashi Matsunga, Takayuki Watanabe, Akira Sumitani, Takeshi Ohta, Katsutomo Terashima

Proceedings Volume 4088, (2000) https://doi.org/10.1117/12.405749

KEYWORDS: Excimer lasers, Gas lasers, Xenon, Laser development, Laser stabilization, Pulsed laser operation, Light sources, Spectroscopy, Laser applications, Lithography

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Proceedings Article | 5 July 2000 Paper

Paper

High-resolution multigrating spectrometer for high-quality deep-UV light source production

Osamu Wakabayashi, Takanori Nakaike, Toru Suzuki, Hakaru Mizoguchi

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388982

KEYWORDS: Spectroscopy, Excimer lasers, Light sources, Mirrors, Diffraction gratings, Deep ultraviolet, Charge-coupled devices, Sensors, CCD image sensors, Diffraction

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Proceedings Article | 5 July 2000 Paper

Paper

Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Takayuki Watanabe, Hirokazu Kubo, Toru Suzuki, Takeshi Ohta, Hakaru Mizoguchi, Ken Ishii, Yasuo Itakura, Katsutomo Terashima, Tatsuo Enami, Hirokazu Tanaka, Ayako Ohbu, Osamu Wakabayashi, Akira Sumitani

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388981

KEYWORDS: Excimer lasers, Gas lasers, Laser development, Lithography, Deep ultraviolet, Performance modeling, Electrodes, Optical lithography, Light sources, Laser applications

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Proceedings Article | 26 July 1999 Paper

Paper

Billion-level durable ArF excimer laser with highly stable energy

Hakaru Mizoguchi, Hirokazu Tanaka, Akira Sumitani, Osamu Wakabayashi, Tatsuo Enami, Toru Suzuki, Hirokazu Kubo, Takeshi Ohta, Katsutomo Terashima

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354311

KEYWORDS: Excimer lasers, Gas lasers, Laser development, Pulsed laser operation, Fabry–Perot interferometers, Xenon, Laser stabilization, Spectroscopy, Carbon dioxide lasers, Light sources

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Proceedings Article | 7 April 1999 Paper

Paper

1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage

Akira Sumitani, Tatsuo Enami, Toru Suzuki, Hirokazu Kubo, Takeshi Ohta, Hakaru Mizoguchi, Hirokazu Tanaka, Fumika Sunaka, Osamu Wakabayashi, Katsutomo Terashima, Youichi Kawasa

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344436

KEYWORDS: Excimer lasers, Luminescence, Laser stabilization, Crystals, Optical lithography, Laser development, Silica, Optical damage, Pulsed laser operation, Laser optics

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Showing 5 of 18 publications

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