Dr. Toru Tojo Profile

Dr. Toru Tojo

Senior Manager at Topcon Corp

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Author

Publications (22)

SPIE Journal Paper | 1 October 2008

Coherence control of illumination optics in mask inspection systems

Akira Takada, Toru Tojo, Masato Shibuya

JM3, Vol. 7, Issue 04, 043010, (October 2008) https://doi.org/10.1117/12.10.1117/1.3013458

KEYWORDS: Inspection, Light, Spatial coherence, Optical inspection, Light sources, Photomasks, Imaging systems, Optical components, Transmittance, Neptunium

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Proceedings Article | 24 March 2008 Paper

Verification of optics for the die-to-wafer-like image mask inspection

Akira Takada, Toru Tojo, Masato Shibuya

Proceedings Volume 6922, 692229 (2008) https://doi.org/10.1117/12.772359

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Optical inspection, Wafer-level optics, Diffraction, Scanners, Computer aided design, Resolution enhancement technologies, Defect inspection

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SPIE Journal Paper | 1 October 2007

Lens-cementing technology used in optical systems of deep-ultroviolet wavelength regions

Takashi Takahashi, Toshiki Okumura, Etsuya Suzuki, Tatsuya Kojima, Hitoshi Suzuki, Toru Tojo, Koji Machida

JM3, Vol. 6, Issue 04, 043010, (October 2007) https://doi.org/10.1117/12.10.1117/1.2804125

KEYWORDS: Cements, Deep ultraviolet, Adhesives, Transmittance, Objectives, Inspection, Microscopes, Fluorine, Lamps, Excimer lasers

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Proceedings Article | 5 April 2007 Paper

Image quality improvement in inspection systems using double integrator illumination

Akira Takada, Hitoshi Suzuki, Toru Tojo, Masato Shibuya

Proceedings Volume 6518, 65184B (2007) https://doi.org/10.1117/12.711286

KEYWORDS: Inspection, Integrated optics, Photomasks, Image sensors, Defect inspection, Image quality, Imaging systems, Image processing, Lenses, Image acquisition

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Proceedings Article | 24 March 2006 Paper

Real-time aerial-images-based mask inspection, die-to-wafer image inspection

Akira Takada, Toru Tojo

Proceedings Volume 6152, 615245 (2006) https://doi.org/10.1117/12.655978

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Diffraction, Defect detection, Computer aided design, Optical proximity correction, Binary data, Wafer inspection, Chromium

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Proceedings Article | 24 March 2006 Paper

Lens-cementing technology used in optical system of DUV wavelength region: selection of optical cement and degradation evaluation by DUV irradiation

Takashi Takahashi, Susumu Saito, Toshiki Okumura, Etsuya Suzuki, Tatsuya Kojima, Shinsuke Motomiya, Hidesuke Maruyama, Hitoshi Suzuki, Koji Machida, Toru Tojo

Proceedings Volume 6152, 61523P (2006) https://doi.org/10.1117/12.654700

KEYWORDS: Adhesives, Cements, Transmittance, Deep ultraviolet, Objectives, Microscopes, Inspection, Silica, Excimer lasers, Calcium

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Proceedings Article | 6 December 2004 Paper

Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era

Dong-Hoon Chung, Katsumi Ohira, Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, Masao Otaki

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578592

KEYWORDS: Photomasks, Inspection, Optical proximity correction, Lithography, Optical lithography, Resolution enhancement technologies, Defect detection, Defect inspection, SRAF, Optical inspection

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Proceedings Article | 6 December 2004 Paper

Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Toru Tojo, Ryoich Hirano, Hideo Tsuchiya, Junji Oaki, Takeshi Nishizaka, Yasushi Sanada, Kazuto Matsuki, Ikunao Isomura, Riki Ogawa, Noboru Kobayashi, Kazuhiro Nakashima, Shinji Sugihara, Hiromu Inoue, Shinichi Imai, Hitoshi Suzuki, Akihiko Sekine, Makoto Taya, Akemi Miwa, Nobuyuki Yoshioka, Katsumi Ohira, Dong-Hoon Chung, Masao Otaki

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579133

KEYWORDS: Inspection, Photomasks, Sensors, Image sensors, Defect detection, Algorithm development, Speckle, Modulation transfer functions, Image processing, Optical inspection

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Proceedings Article | 20 August 2004 Paper

Optical mask inspection strategy for 65-nm node and beyond

Dong-Hoon Chung, Katsumi Ohira, Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, Masao Otaki

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557726

KEYWORDS: Photomasks, Inspection, Lithography, Optical proximity correction, SRAF, Defect inspection, Optical lithography, Optical inspection, Defect detection, Resolution enhancement technologies

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Proceedings Article | 18 October 2002 Paper

Mask blank particle inspection in vacuum environments

Akihiko Sekine, Hiroyuki Nagahama, Toru Tojo, Kiminobu Akeno, Ryoichi Hirano

Proceedings Volume 4902, (2002) https://doi.org/10.1117/12.467384

KEYWORDS: Photomasks, Inspection, Particles, Light scattering, Laser scattering, Semiconducting wafers, Signal detection, Scattering, Sensors, Wafer inspection

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Proceedings Article | 11 March 2002 Paper

Stage tracking of a mask-scan EB mask writer test stand

Shinsuke Nishimura, Soichiro Mitsui, Munehiro Ogasawara, Kiminobu Akeno, Mitsuko Shimizu, Hideo Kusakabe, Hirotsugu Wada, Kiyoshi Hattori, Shusuke Yoshitake, Naoharu Shimomura, Jun Takamatsu, Hitoshi Sunaoshi, Yuuji Fukudome, Toru Tojo, Seiichi Tsuchiya

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458327

KEYWORDS: Photomasks, Optical amplifiers, Vestigial sideband modulation, Amplifiers, Electron beams, Interferometers, Electro optics, Objectives, Electro optical systems, Photography

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Proceedings Article | 20 August 2001 Paper

Improvement of beam-adjustment accuracy by beam-intensity distribution measurement on a second shaping aperture in electron-beam writing systems

Shinsuke Nishimura, Munehiro Ogasawara, Toru Tojo

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436691

KEYWORDS: Ultraviolet radiation, Lithography, Atomic force microscopy

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Proceedings Article | 30 December 1999 Paper

New mask blank handling system for the advanced electron-beam writer

Shusuke Yoshitake, Kenji Ooki, Ryoichi Hirano, Toru Tojo, Yoji Ogawa, Katsuhito Ogura, Teruaki Yamamoto, Masaki Toriumi, Yoshiaki Tada

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373383

KEYWORDS: Photomasks, Contamination, Reticles, Atmospheric particles, Contamination control, Particles, Semiconductors, Standards development, Interfaces, Pollution control

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Proceedings Article | 25 August 1999 Paper

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa, Shuichi Tamamushi, Yoshiaki Hattori, Souji Koikari, Hideo Kusakabe, Takayuki Abe, Munehiro Ogasawara, Kiminobu Akeno, Hirohito Anze, Kiyoshi Hattori, Ryoichi Hirano, Shusuke Yoshitake, Tomohiro Iijima, Kenji Ohtoshi, Kazuto Matsuki, Naoharu Shimomura, Noboru Yamada, Hitoshi Higurashi, Noriaki Nakayamada, Yuuji Fukudome, Shigehiro Hara, Eiji Murakami, Takashi Kamikubo, Yasuo Suzuki, Susumu Oogi, Mitsuko Shimizu, Shinsuke Nishimura, Hideyuki Tsurumaki, Satoshi Yasuda, Kenji Ooki, Kiyomi Koyama, Susumu Watanabe, Mitsuhiro Yano, Hiroaki Suzuki, Hiroshi Hoshino, Masaki Toriumi, Osamu Watanabe, Kazuo Tsuji, Mitsunobu Katayama, Seiichi Tsuchiya, Kimio Suzuki, Shiro Kurasawa, Kazuyuki Okuzono, Hirokazu Yamada, Koji Handa, Yoshio Suzuki, Tetsu Akiyama, Yoshiaki Tada, Akira Noma, Tadahiro Takigawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360219

KEYWORDS: Photomasks, Data conversion, Mask making, Lithography, Distortion, Electron beams, Manufacturing, Critical dimension metrology, Vibration control, Sensors

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Proceedings Article | 25 August 1999 Paper

Reduction of fogging effect caused by scattered electrons in an electron beam system

Naoharu Shimomura, Munehiro Ogasawara, Jun Takamatsu, Shusuke Yoshitake, Kenji Ooki, Noriaki Nakayamada, Fumiyuki Okabe, Toru Tojo

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360242

KEYWORDS: Electrons, Electron beams, Calibration, Objectives, Critical dimension metrology, Photomasks, Electron beam lithography, Control systems, X-ray technology, Electronics

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Proceedings Article | 25 August 1999 Paper

New mask blank handling system for the advanced electron-beam writer EX-11

Shusuke Yoshitake, Kenji Ooki, Yoji Ogawa, Katsuhito Ogura, Teruaki Yamamoto, Ryoichi Hirano, Masaki Toriumi, Toru Tojo

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360222

KEYWORDS: Reticles, Photomasks, Particles, Semiconducting wafers, Contamination, Contamination control, Inspection, Lithography, Ions, Optical lithography

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Proceedings Article | 28 July 1997 Paper

Development of an in-situ cleaning system for an e-beam reticle writer

Kenji Ohtoshi, Satoshi Yamasaki, Shuichi Tamamushi, Toru Tojo, Ryoichi Hirano, Yuuji Fukudome, Naoharu Shimomura, Shinsuke Nishimura, Shusuke Yoshitake, Munehiro Ogasawara

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277287

KEYWORDS: Contamination, Reticles, Electron beams, Gold, Optical testing, Microwave radiation, Etching, Diffusion, Electronics, Molecules

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Proceedings Article | 28 July 1997 Paper

New die-to-database mask inspection system with i-line optics for 256-Mbit and 1-Gbit DRAMs

Mitsuo Tabata, Kyoji Yamashita, Hideo Tsuchiya, Takehiko Nomura, Hiromu Inoue, Tomohide Watanabe, Toru Tojo, Hisakazu Yoshino

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277266

KEYWORDS: Inspection, Photomasks, Image sensors, Image processing, Sensors, Defect inspection, Data processing, Defect detection, Binary data, Image resolution

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Proceedings Article | 24 July 1996 Paper

Pattern shift error induced by coating and developing

Shusuke Yoshitake, Kazuto Matsuki, Ryoichi Hirano, Toru Tojo

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245203

KEYWORDS: Photomasks, Coating, Distortion, Lithography, Electron beams, Electron beam lithography, Device simulation, Error analysis, Tolerancing, Metrology

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Proceedings Article | 3 July 1995 Paper

Analysis of pattern shift error for mask clamping measured by Nikon XY-31

Shusuke Yoshitake, Kazuto Matsuki, Satoshi Yamasaki, Ryoichi Hirano, Shuichi Tamamushi, Yoji Ogawa, Toru Tojo

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212777

KEYWORDS: Photomasks, Error analysis, Metrology, Distortion, Mirrors, Factor analysis, Lithography, Quartz, Chromium, Sputter deposition

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Proceedings Article | 3 July 1995 Paper

Reticle flexure influence on pattern positioning accuracy for reticle writing

Ryoichi Hirano, Kazuto Matsuki, Shusuke Yoshitake, Yoshihiko Takahashi, Shuichi Tamamushi, Yoji Ogawa, Toru Tojo

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212776

KEYWORDS: Reticles, Electron beams, Beam shaping, Affine motion model, Lithium, Vestigial sideband modulation, Laser interferometry, Image registration, Sensors, Time metrology

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Proceedings Article | 3 July 1995 Paper

Advanced mask fabrication system

Tadahiro Takigawa, Toru Tojo, Yoji Ogawa, Kiyomi Koyama, Akira Ono, Soichi Inoue, Shinichi Ito, Mineo Goto

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212798

KEYWORDS: Photomasks, Data conversion, Mask making, Inspection, Critical dimension metrology, Optical lithography, Deep ultraviolet, Optical resolution, Optical proximity correction, Transmittance

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Showing 5 of 22 publications

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