Mr. Kenji Ohtoshi Profile

Kenji Ohtoshi

General Manager of Mask Lithography at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (19)

SPIE Journal Paper | 9 November 2021

Study on physical model of resist surface charge in multi-beam mask writer and single variable-shaped beam writers

Haruyuki Nomura, Noriaki Nakayamada, Hayato Kimura, Keisuke Yamaguchi, Takanao Touya, Kazuhiro Kishi, Yasunori Hatanaka, Kenji Ohtoshi

JM3, Vol. 20, Issue 04, 041404, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041404

KEYWORDS: Electron beam melting, Photomasks, Electron beams, Diffusion, Differential equations, Metrology, Glasses, Polymethylmethacrylate, Optical simulations, Statistical analysis

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Proceedings Article | 23 March 2020 Paper

Electron beam mask writer EBM-8000P for high throughput mask production

Tomohiro Iijima, Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu, Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami, Takao Tamura, Kenji Ohtoshi, Hirokazu Yamada

Proceedings Volume 11324, 113241B (2020) https://doi.org/10.1117/12.2552447

KEYWORDS: Photomasks, Electron beams, Critical dimension metrology, Beam shaping

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Proceedings Article | 26 March 2019 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hayato Kimura, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10958, 109580J (2019) https://doi.org/10.1117/12.2515200

KEYWORDS: Photomasks, Extreme ultraviolet, Photoresist processing, Electron beam lithography, Electron beams

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SPIE Journal Paper | 24 September 2018

Multibeam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

JM3, Vol. 17, Issue 03, 031205, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.031205

KEYWORDS: Modulation, Photomasks, Optical lithography, Critical dimension metrology, Image resolution, Line edge roughness, Photoresist processing, Electron beam lithography, Vestigial sideband modulation, Convolution

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Proceedings Article | 12 June 2018 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10807, 1080707 (2018) https://doi.org/10.1117/12.2502599

KEYWORDS: Photomasks, Optical lithography, Photoresist processing, Electron beam lithography, Electron beams

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Proceedings Article | 5 April 2018 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10584, 105840H (2018) https://doi.org/10.1117/12.2299885

KEYWORDS: Modulation, Photomasks, Photoresist processing, Electron beam lithography, Optical lithography, Image resolution, Electron beams, Beam shaping, Vestigial sideband modulation, Convolution

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Proceedings Article | 16 October 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Ryosuke Ueba, Kenji Otoshi, Hirokazu Yamada, Jin Choi, Byoung-Sup Ahn, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 10451, 1045117 (2017) https://doi.org/10.1117/12.2280502

KEYWORDS: Photomasks, Computer aided design, Data processing, Modulation

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Proceedings Article | 28 September 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10446, 1044607 (2017) https://doi.org/10.1117/12.2280453

KEYWORDS: Data processing, Photomasks, Data storage, Vestigial sideband modulation, Relays, Interfaces, Data conversion, Modulation, Photoresist processing, Image processing

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Proceedings Article | 13 July 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10454, 104540E (2017) https://doi.org/10.1117/12.2283033

KEYWORDS: Photomasks, Data storage, Relays, Vestigial sideband modulation, Modulation, Data processing, Extreme ultraviolet lithography, Semiconductors, High volume manufacturing, Optical design

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Proceedings Article | 17 October 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito, Hiroyoshi Ando, Hideo Inoue, Noriaki Nakayamada, Takashi Kamikubo, Rieko Nishimura, Yoshinori Kojima, Jun Yashima, Akihito Anpo, Seiichi Nakazawa, Tomohiro Iijima, Kenji Ohtoshi, Hirohito Anze, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 9235, 92350X (2014) https://doi.org/10.1117/12.2065551

KEYWORDS: Photomasks, Electron beam melting, Electron beams, Data conversion, Amplifiers, LCDs, Mask making, Seaborgium, Beam shaping

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Proceedings Article | 28 July 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Proceedings Volume 9256, 925607 (2014) https://doi.org/10.1117/12.2065230

KEYWORDS: Photomasks, Electron beam melting, Amplifiers, Electron beams, Logic, LCDs, Mask making, Objectives, Vestigial sideband modulation

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Proceedings Article | 14 October 2011 Paper

EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond

Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando, Tomohiro Iijima, Kenji Ohtoshi, Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi, Yoshiaki Hattori, Seiichi Tsuchiya, Masayuki Katoh, Kouichi Suzuki, Yuichi Tachikawa, Munehiro Ogasawara, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 8166, 81661D (2011) https://doi.org/10.1117/12.898850

KEYWORDS: Photomasks, Lithography, Amplifiers, Data storage servers, Mask making, Immersion lithography, Data conversion, Extreme ultraviolet lithography, Data processing, Data corrections

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Proceedings Article | 30 September 2009 Paper

Electron beam mask writer EBM-7000 for hp 32nm generation

Takashi Kamikubo, Kenji Ohtoshi, Noriaki Nakayamada, Rieko Nishimura, Hitoshi Sunaoshi, Kiminobu Akeno, Soichiro Mitsui, Yuichi Tachikawa, Hideo Inoue, Susumu Oogi, Hitoshi Higurashi, Akinori Mine, Takiji Ishimura, Seiichi Tsuchiya, Yoshitada Gomi, Hideki Matsui, Shuichi Tamamushi

Proceedings Volume 7488, 74881E (2009) https://doi.org/10.1117/12.833462

KEYWORDS: Photomasks, Data processing, Electron beams, Distributed computing, Objectives, Double patterning technology, Magnetism, Optical lithography, Overlay metrology, Lithography

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Proceedings Article | 17 October 2008 Paper

New electron optics for mask writer EBM-7000 to challenge hp 32nm generation

Takashi Kamikubo, Steven Golladay, Rodney Kendall, Victor Katsap, Kenji Ohtoshi, Munehiro Ogasawara, Shinsuke Nishimura, Rieko Nishimura, Osamu Iizuka, Takahito Nakayama, Shunji Shinkawa, Tetsurou Nishiyama, Shuichi Tamamushi

Proceedings Volume 7122, 71220J (2008) https://doi.org/10.1117/12.801725

KEYWORDS: Photomasks, Photoresist processing, Objectives, Beam shaping, Optical testing, Chemically amplified resists, Signal detection, Electron beam melting, In situ metrology, Electron beams

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Proceedings Article | 11 May 2007 Paper

Electron-beam mask writer EBM-6000 for 45-nm HP node

Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, Seiji Wake, Yusuke Sakai, Shinji Sakamoto, Shigehiro Hara, Hitoshi Higurashi, Kiyoshi Hattori, Kenichi Saito, Rodney Kendall, Shuichi Tamamushi

Proceedings Volume 6607, 660703 (2007) https://doi.org/10.1117/12.728917

KEYWORDS: Line edge roughness, Photomasks, Control systems, Standards development, Manufacturing, Monochromatic aberrations, Electron beam melting, Photoresist processing, Beam shaping, Electron beams

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Proceedings Article | 20 May 2006 Paper

EBM-5000: electron-beam mask writer for 45 nm node

Hitoshi Sunaoshi, Yuichi Tachikawa, Hitoshi Higurashi, Tomohiro Iijima, Junichi Suzuki, Takashi Kamikubo, Kenji Ohtoshi, Hirohito Anze, Takehiko Katsumata, Noriaki Nakayamada, Shigehiro Hara, Shuichi Tamamushi, Yoji Ogawa

Proceedings Volume 6283, 628306 (2006) https://doi.org/10.1117/12.681732

KEYWORDS: Photomasks, Line edge roughness, Error analysis, Electron beams, Manufacturing, Data conversion, Electron beam melting, Optical proximity correction, Electro optical systems

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Proceedings Article | 5 September 2001 Paper

Writing accuracy of EBM-3500 electron-beam mask writing system

Kenji Ohtoshi, Hitoshi Sunaoshi, Jun Takamatsu, Fumiyuki Okabe, K. Ishibashi, Shusuke Yoshitake, Hirokazu Yamada, Shuichi Tamamushi, Hirohito Anze, T. Kamikobo, Yoji Ogawa

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438403

KEYWORDS: Photomasks, Optical proximity correction, Beam shaping, Electron beams, Magnetism, Vestigial sideband modulation, Electron beam lithography, Lithography, Error analysis, Scanning electron microscopy

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Proceedings Article | 25 August 1999 Paper

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa, Shuichi Tamamushi, Yoshiaki Hattori, Souji Koikari, Hideo Kusakabe, Takayuki Abe, Munehiro Ogasawara, Kiminobu Akeno, Hirohito Anze, Kiyoshi Hattori, Ryoichi Hirano, Shusuke Yoshitake, Tomohiro Iijima, Kenji Ohtoshi, Kazuto Matsuki, Naoharu Shimomura, Noboru Yamada, Hitoshi Higurashi, Noriaki Nakayamada, Yuuji Fukudome, Shigehiro Hara, Eiji Murakami, Takashi Kamikubo, Yasuo Suzuki, Susumu Oogi, Mitsuko Shimizu, Shinsuke Nishimura, Hideyuki Tsurumaki, Satoshi Yasuda, Kenji Ooki, Kiyomi Koyama, Susumu Watanabe, Mitsuhiro Yano, Hiroaki Suzuki, Hiroshi Hoshino, Masaki Toriumi, Osamu Watanabe, Kazuo Tsuji, Mitsunobu Katayama, Seiichi Tsuchiya, Kimio Suzuki, Shiro Kurasawa, Kazuyuki Okuzono, Hirokazu Yamada, Koji Handa, Yoshio Suzuki, Tetsu Akiyama, Yoshiaki Tada, Akira Noma, Tadahiro Takigawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360219

KEYWORDS: Photomasks, Data conversion, Mask making, Lithography, Distortion, Electron beams, Manufacturing, Critical dimension metrology, Vibration control, Sensors

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Proceedings Article | 28 July 1997 Paper

Development of an in-situ cleaning system for an e-beam reticle writer

Kenji Ohtoshi, Satoshi Yamasaki, Shuichi Tamamushi, Toru Tojo, Ryoichi Hirano, Yuuji Fukudome, Naoharu Shimomura, Shinsuke Nishimura, Shusuke Yoshitake, Munehiro Ogasawara

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277287

KEYWORDS: Contamination, Reticles, Electron beams, Gold, Optical testing, Microwave radiation, Etching, Diffusion, Electronics, Molecules

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Showing 5 of 19 publications

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