Development and production deployment of new laser-based mask writer for optical and EUV applications

Christopher Leavitt; Michael Hunsweck; Florence Eschbach; Yang Liu; Kyle Vogt; Jun Kim; Andrew Sowers; Frank Abboud; Mikael Wahlsten; Robert Eklund; Mats Rosling; Peter Henriksson; Anders Svensson; Fredric Ihren; Youngjin Park

doi:10.1117/12.2688097

12 December 2023 Development and production deployment of new laser-based mask writer for optical and EUV applications

Christopher Leavitt, Michael Hunsweck, Florence Eschbach, Yang Liu, Kyle Vogt, Jun Kim, Andrew Sowers, Frank Abboud, Mikael Wahlsten, Robert Eklund, Mats Rosling, Peter Henriksson, Anders Svensson, Fredric Ihren, Youngjin Park

Author Affiliations +

Proceedings Volume PC12751, Photomask Technology 2023; PC127510T (2023) https://doi.org/10.1117/12.2688097
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

The high throughput time that can be achieved with laser-based lithography tools provide a tangible benefit for exposure of large areas with loose CD requirements. In this paper we present a recently developed DUV laser-based photolithography tool, supplied by Mycronic, that has been installed and qualified for optical and EUV lithography process at Intel Mask Operations. The tool utilizes a solid-state laser system for low power consumption and sustainable operation, modern electronics providing extensive logging capabilities, and an offline datapath that enables write times independent of pattern complexity. It also features multi-pass printing options that can be selected based on CD and REG requirements and throughput time, altogether providing flexibility and low cost of ownership. Tool specifications for critical dimensions and registration results will be presented in addition to tool matching and qualification data.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Christopher Leavitt, Michael Hunsweck, Florence Eschbach, Yang Liu, Kyle Vogt, Jun Kim, Andrew Sowers, Frank Abboud, Mikael Wahlsten, Robert Eklund, Mats Rosling, Peter Henriksson, Anders Svensson, Fredric Ihren, and Youngjin Park "Development and production deployment of new laser-based mask writer for optical and EUV applications", Proc. SPIE PC12751, Photomask Technology 2023, PC127510T (12 December 2023); https://doi.org/10.1117/12.2688097

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