The high throughput time that can be achieved with laser-based lithography tools provide a tangible benefit for exposure of large areas with loose CD requirements. In this paper we present a recently developed DUV laser-based photolithography tool, supplied by Mycronic, that has been installed and qualified for optical and EUV lithography process at Intel Mask Operations. The tool utilizes a solid-state laser system for low power consumption and sustainable operation, modern electronics providing extensive logging capabilities, and an offline datapath that enables write times independent of pattern complexity. It also features multi-pass printing options that can be selected based on CD and REG requirements and throughput time, altogether providing flexibility and low cost of ownership. Tool specifications for critical dimensions and registration results will be presented in addition to tool matching and qualification data.
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