Dr. Masahito Niibe Profile

Dr. Masahito Niibe

Associate Professor/Researcher at Univ of Hyogo

SPIE Involvement:

Author

Publications (35)

Proceedings Article | 23 August 2021 Paper

Damage-less removal of surface contamination using atomic hydrogen generated on heated tungsten mesh

Akira Heya, Tetsuo Harada, Masahito Niibe, Koji Sumitomo, Takeo Watanabe

Proceedings Volume 11908, 119080S (2021) https://doi.org/10.1117/12.2597935

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Proceedings Article | 18 May 2009 Paper

Competitive reactions of carbon deposition and oxidation on the surface of Mo/Si multilayer mirrors by EUV irradiation

Masahito Niibe, Keigo Koida

Proceedings Volume 7361, 73610L (2009) https://doi.org/10.1117/12.822286

KEYWORDS: Carbon, Extreme ultraviolet, Reflectivity, Protactinium, Mirrors, Multilayers, Contamination, Oxygen, Extreme ultraviolet lithography, Oxidation

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Proceedings Article | 21 March 2008 Paper

Phenomenological analysis of carbon deposition rate on the multilayer mirror

Takahiro Nakayama, Hiromitsu Takase, Shigeru Terashima, Takashi Sudo, Yutaka Watanabe, Yasuaki Fukuda, Katsuhiko Murakami, Shintaro Kawata, Takashi Aoki, Shuichi Matsunari, Yukinobu Kakutani, Masahito Niibe

Proceedings Volume 6921, 69213B (2008) https://doi.org/10.1117/12.769958

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Multilayers, Bioalcohols, Chemical species, Coating, Oxidation

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Proceedings Article | 21 March 2008 Paper

Protection from surface oxidation of Ru capping layers for EUVL projection optics mirrors by introducing hydrocarbon gas

Keigo Koida, Masahito Niibe, Yukinobu Kakutani, Shuichi Matsunari, Takashi Aoki, Shigeru Terashima, Takahiro Nakayama, Hiromitsu Takase, Yasuaki Fukuda

Proceedings Volume 6921, 69213C (2008) https://doi.org/10.1117/12.771814

KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Bioalcohols, Carbon, Oxides, Protactinium, Oxygen, Oxidation

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Proceedings Article | 21 March 2008 Paper

EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, M. Niibe

Proceedings Volume 6921, 69212U (2008) https://doi.org/10.1117/12.772624

KEYWORDS: Wavefronts, Diffusion tensor imaging, Optical testing, Extreme ultraviolet, Projection systems, Mirrors, EUV optics, Wavefront metrology, Interferometers, Optics manufacturing

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Proceedings Article | 21 March 2007 Paper

Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Watanabe, Y. Kakutani, M. Niibe, Y. Fukuda

Proceedings Volume 6517, 65172X (2007) https://doi.org/10.1117/12.710816

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Gases, Natural surfaces, Reflectivity, Adsorption, Protactinium, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 21 March 2007 Paper

Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol

Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Yasuaki Fukuda

Proceedings Volume 6517, 651731 (2007) https://doi.org/10.1117/12.711364

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Bioalcohols, Extreme ultraviolet lithography, Protactinium, Ruthenium, Carbon, Oxygen, Oxidation

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Proceedings Article | 24 March 2006 Paper

New contamination experimental equipment in the NewSUBARU and evaluation of Si-capped multilayer mirrors using it

Masahito Niibe, Yukinobu Kakutani, Shigeru Terashima, Hiromitsu Takase, Yoshio Gomei, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Proceedings Volume 6151, 615134 (2006) https://doi.org/10.1117/12.656845

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Contamination, Extreme ultraviolet lithography, Absorption, Carbon, Protactinium, Oxygen, In situ metrology

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Proceedings Article | 24 March 2006 Paper

EUV wavefront metrology at EUVA

Chidane Ouchi, Seima Kato, Masanobu Hasegawa, Takayuki Hasegawa, Hideo Yokota, Katsumi Sugisaki, Masashi Okada, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 6152, 61522O (2006) https://doi.org/10.1117/12.656039

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Diffraction, EUV optics, Projection systems, Extreme ultraviolet lithography, Diffraction gratings, CCD cameras, Mirrors

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Proceedings Article | 24 March 2006 Paper

Study of ruthenium-capped multilayer mirror for EUV irradiation durability

Hiromitsu Takase, Shigeru Terashima, Yoshio Gomei, Masayuki Tanabe, Yutaka Watanabe, Takashi Aoki, Katsuhiko Murakami, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Proceedings Volume 6151, 615135 (2006) https://doi.org/10.1117/12.657089

KEYWORDS: Silicon, Extreme ultraviolet, Ruthenium, Diffusion, Reflectivity, Protactinium, Extreme ultraviolet lithography, Oxides, Mirrors, Oxidation

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Proceedings Article | 23 March 2006 Paper

Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror

Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Proceedings Volume 6151, 61510H (2006) https://doi.org/10.1117/12.656240

KEYWORDS: Reflectivity, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Projection systems, Atmospheric optics, Carbon, Lithography, Oxidation

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Proceedings Article | 17 September 2005 Paper

Comparisons between EUV at-wavelength metrological methods

Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

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Proceedings Article | 10 May 2005 Paper

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Zhiqiang Liu, Masashi Okada, Katsumi Sugisaki, Mikihiko Ishii, Yucong Zhu, Katsura Ohtaki, Jun Saito, Akiyoshi Suzuki, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Masahito Niibe, Katsuhiko Murakami

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599456

KEYWORDS: Diffraction, Diffraction gratings, Calibration, Shearing interferometers, Wavefronts, Light sources, Interferometers, Monochromatic aberrations, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 10 May 2005 Paper

Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqian Liu, Mikihiko Ishii, Jun Kawakami, Jun Saito, Katsuhiko Murakami, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Masahito Niibe

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600274

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Extreme ultraviolet lithography, Extreme ultraviolet, Charge-coupled devices, Diffraction, Interferometers, Photomasks, Monochromatic aberrations

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Proceedings Article | 6 May 2005 Paper

Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation

Yukinobu Kakutani, Masahito Niibe, Hiromitsu Takase, Shigeru Terashima, Hiroyuki Kondo, Shuichi Matsunari, Takashi Aoki, Yoshio Gomei, Yasuaki Fukuda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599577

KEYWORDS: Reflectivity, Extreme ultraviolet, Carbon, Protactinium, Mirrors, Extreme ultraviolet lithography, Chemical species, Oxygen, Optical filtering, Oxidation

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Proceedings Article | 6 May 2005 Paper

Characterization of capped multilayer mirrors using XPS, AES, and SIMS

Hiromitsu Takase, Yoshio Gomei, Shigeru Terashima, Hiroyuki Kondo, Takashi Aoki, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600452

KEYWORDS: Ruthenium, Silicon, Carbon, Extreme ultraviolet lithography, Protactinium, Molybdenum, Mirrors, Oxides, Chemical analysis, Oxidation

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV interferometry methods in EUVA project

Seima Kato, Chidane Ouchi, Masanobu Hasegawa, Akiyoshi Suzuki, Takayuki Hasegawa, Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600468

KEYWORDS: Wavefronts, Optical testing, Diffraction, Charge-coupled devices, Extreme ultraviolet, Monochromatic aberrations, Interferometers, Phase shifts, Calibration, Diffraction gratings

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Proceedings Article | 18 October 2004 Paper

A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU

Yukinobu Kakutani, Masahito Niibe, Kazuya Kakiuchi, Hiromitsu Takase, Shigeru Terashima, Hiroyuki Kondo, Shuichi Matsunari, Takashi Aoki, Yoshio Gomei, Yasuaki Fukuda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559395

KEYWORDS: Reflectivity, Mirrors, Protactinium, Extreme ultraviolet lithography, Extreme ultraviolet, Carbon, Optical testing, Absorption, Oxygen, Gases

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Proceedings Article | 18 October 2004 Paper

Recent progress of EUV wavefront metrology in EUVA

Masanobu Hasegawa, Chidane Ouchi, Takayuki Hasegawa, Seima Kato, Akinori Ohkubo, Akiyoshi Suzuki, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431

KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

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Proceedings Article | 20 May 2004 Paper

EUV wavefront metrology system in EUVA

Takayuki Hasegawa, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Akiyoshi Suzuki, Katsumi Sugisaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536327

KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Wavefront metrology, Photomasks, Metrology, Nickel, Synchrotron technology, Interferometers, Spherical lenses

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Proceedings Article | 20 May 2004 Paper

Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Yucong Zhu, Katsumi Sugisaki, Chidane Ouchi, Masanobu Hasegawa, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537331

KEYWORDS: Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography, Shearing interferometers, Phase shifts, Diffraction gratings, Projection systems, Algorithm development, Diffraction, Extreme ultraviolet

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Proceedings Article | 20 May 2004 Paper

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

Katsumi Sugisaki, Masanobu Hasegawa, Seima Kato, Chidane Ouchi, Jun Saito, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537344

KEYWORDS: Oxygen, Contamination, Tantalum, Extreme ultraviolet, Nickel, Gold, Carbon, Adsorption, Projection systems, Wavefronts

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Proceedings Article | 24 December 2002 Paper

Development of EUV point diffraction interferometry using the NewSUBARU undulator radiation

Masahito Niibe, Mikihito Mukai, Takeshi Tanaka, Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei

Proceedings Volume 4782, (2002) https://doi.org/10.1117/12.451354

KEYWORDS: Monochromators, Mirrors, Optical testing, Photons, Extreme ultraviolet, Diffraction, Diffraction gratings, EUV optics, Interferometry, Charge-coupled devices

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Proceedings Article | 1 July 2002 Paper

ASET development of at-wavelength phase-shifting point diffraction interferometer

Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei, Masahito Niibe

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472344

KEYWORDS: Wavefronts, Optical testing, Mirrors, Extreme ultraviolet, Photomasks, Visible radiation, Monochromatic aberrations, Phase shifts, Point diffraction interferometers, Diffraction

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Proceedings Article | 20 December 2001 Paper

Current status of ASET-HIT EUV phase-shifting point diffraction interferometer

Yoshio Gomei, Katsumi Sugisaki, Yucong Zhu, Masahito Niibe, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450962

KEYWORDS: Extreme ultraviolet, Diffraction gratings, Diffraction, Phase shifts, Mirrors, Fringe analysis, CCD cameras, Point diffraction interferometers, Optical testing, Tantalum

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Proceedings Article | 8 November 2000 Paper

Present status of the ASET at-wavelength phase-shifting point diffraction interferometer

Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei, Masahito Niibe, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406675

KEYWORDS: Visible radiation, Extreme ultraviolet, Mirrors, Wavefronts, Interferometers, Information technology, Interferometry, Point diffraction interferometers, Phase shifts, Optical testing

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Proceedings Article | 13 November 1998 Paper

Fabrication of an aspherical mirror for extreme-ultraviolet lithography (EUVL) optics

Masahito Niibe, Atsushi Miyafuji, Hiroo Kinoshita, Takeo Watanabe, Shozo Inoue, Keiji Koterazawa

Proceedings Volume 3447, (1998) https://doi.org/10.1117/12.331127

KEYWORDS: Multilayers, Mirrors, Extreme ultraviolet lithography, Surface roughness, Argon, Cameras, Aspheric lenses, Molybdenum, Reflectivity, Silicon

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Proceedings Article | 13 November 1998 Paper

Design of a LIGA beamline using a multilayer-coated reflection mirror

Hiroo Kinoshita, Yachiyo Kimpara, T. Uruga, Takeo Watanabe, Masahito Niibe, Yuriy Platonov, James Wood

Proceedings Volume 3447, (1998) https://doi.org/10.1117/12.331117

KEYWORDS: Mirrors, Reflectivity, Multilayers, Platinum, Coating, X-rays, Reflection, X-ray lithography, Silicon carbide, X-ray optics

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Proceedings Article | 1 September 1998 Paper

Mask technology of extreme-ultraviolet lithography

Hiroo Kinoshita, Takeo Watanabe, Akira Ozawa, Masahito Niibe

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328848

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Chromium, Tantalum, Reflectivity, Etching, Inspection, Aluminum, Mask making

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Proceedings Article | 5 June 1998 Paper

Three-aspherical-mirror system for EUV lithography

Hiroo Kinoshita, Takeo Watanabe, Masahito Niibe, Masaaki Ito, H. Oizumi, Hiromasa Yamanashi, Katsuhiko Murakami, Tetsuya Oshino, Yuriy Platonov, Nicola Grupido

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309580

KEYWORDS: Semiconducting wafers, Wafer-level optics, Photomasks, Optical alignment, Mirrors, Extreme ultraviolet lithography, Synchrotron radiation, Tolerancing, Assembly tolerances, Optical design

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Proceedings Article | 1 February 1994 Paper

Recent progress in collisionally excited x-ray laser research at the Institute of Laser Engineering

Yoshiaki Kato, Hiroyuki Daido, Ryosuke Kodama, Kensuki Murai, G. Yuan, M. Schulz, Masanobu Yamanaka, Masaru Takagi, Tadashi Kanabe, Sadao Nakai, David Neely, Andrew MacPhee, Ciaran Lewis, Gary Slark, Masahito Niibe, Masami Tsukamoto, Yasuaki Fukuda, Hiroshi Tsunemi, Susumu Nomoto, Itsuo Kodama, Takeo Honda, Kunio Shinohara, Hiroshi Iwasaki, Tatsuo Yoshinobu

Proceedings Volume 2012, (1994) https://doi.org/10.1117/12.167381

KEYWORDS: X-ray lasers, X-rays, Germanium, Holograms, Charge-coupled devices, Holography, Plasma, Laser engineering, Refraction, Spatial resolution

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Proceedings Article | 20 October 1992 Paper

Fabrication and evaluation of Cr-C multilayer mirrors for soft x rays

Masahito Niibe, Masami Tsukamoto, Takashi Iizuka, Akira Miyake, Yutaka Watanabe, Yasuaki Fukuda

Proceedings Volume 1720, (1992) https://doi.org/10.1117/12.132127

KEYWORDS: Reflectivity, X-rays, Transmission electron microscopy, Chromium, Mirrors, Moire patterns, Crystals, Grazing incidence, Nickel, Argon

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Proceedings Article | 20 October 1992 Paper

Radiation damage of multilayer mirrors for soft x-ray lasers

Masami Tsukamoto, Masahito Niibe, Yutaka Watanabe, Akira Miyake, Takashi Iizuka, Yasuaki Fukuda, Yoshiaki Kato, Hiroyuki Shiraga, Hiroyuki Daido, Kensuki Murai, Ciaran Lewis, David Neely, Domhnail O'Neill

Proceedings Volume 1720, (1992) https://doi.org/10.1117/12.132129

KEYWORDS: Mirrors, X-rays, Plasma, Germanium, Particles, Reflectivity, X-ray lasers, Silicon, Light scattering, Multilayers

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Proceedings Article | 5 February 1992 Paper

Development of soft x-ray lasers at the Institute of Laser Engineering: recent results on Ge soft x-ray laser (Invited Paper)

Yoshiaki Kato, Hiroyuki Daido, Hiroyuki Shiraga, Masanobu Yamanaka, Hiromi Azuma, Kensuki Murai, E. Miura, G. Yuan, M. Ohmi, Kazuo Tanaka, Tadashi Kanabe, Masaru Takagi, Sadao Nakai, Ciaran Lewis, Domhnail O'Neill, David Neely, Kunio Shinohara, Masahito Niibe, Yasuaki Fukuda

Proceedings Volume 1551, (1992) https://doi.org/10.1117/12.134808

KEYWORDS: X-ray lasers, Germanium, X-rays, Mirrors, Spatial coherence, Laser engineering, Spectroscopy, Pulsed laser operation, Ions, Amplifiers

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Proceedings Article | 1 February 1991 Paper

Suppression of columnar-structure formation in Mo-Si layered synthetic microstructures

Masahito Niibe, Masami Hayashida, Takashi Iizuka, Akira Miyake, Yutaka Watanabe, Rie Takahashi, Yasuaki Fukuda

Proceedings Volume 1343, (1991) https://doi.org/10.1117/12.23172

KEYWORDS: Reflectivity, Argon, X-rays, Interfaces, Sputter deposition, Transmission electron microscopy, Chemical species, Acquisition tracking and pointing, Photomicroscopy, Molybdenum

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Showing 5 of 35 publications

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