Mr. Christof Krautschik Profile

Christof Krautschik

Technology Manager at Intel Corp

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Author

Publications (12)

Proceedings Article | 20 May 2004 Paper

Anisotropic EUV flare measured in the engineering test stand (ETS)

Sang Hun Lee, Manish Chandhok, Christof Krautschik, Michael Goldstein

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537311

KEYWORDS: Extreme ultraviolet, Mirrors, Projection systems, Extreme ultraviolet lithography, Polishing, Lithography, Scattering, Critical dimension metrology, Deep ultraviolet, Photomasks

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Proceedings Article | 20 May 2004 Paper

Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Manish Chandhok, Sang Lee, Christof Krautschik, Guojing Zhang, Bryan Rice, Michael Goldstein, Eric Panning, Robert Bristol, Alan Stivers, Melissa Shell

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535995

KEYWORDS: Point spread functions, Modulation transfer functions, Mirrors, Extreme ultraviolet lithography, Critical dimension metrology, Spatial frequencies, Extreme ultraviolet, Optical proximity correction, Fourier transforms, Deep ultraviolet

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Proceedings Article | 20 May 2004 Paper

Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL

Manish Chandhok, Sang Lee, Christof Krautschik, Bryan Rice, Eric Panning, Michael Goldstein, Melissa Shell

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536024

KEYWORDS: Critical dimension metrology, Mirrors, Point spread functions, Nanoimprint lithography, Cadmium, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Polishing, Spatial frequencies

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Proceedings Article | 16 June 2003 Paper

Lithographic flare measurements of EUV full-field projection optics

Sang Hun Lee, Patrick Naulleau, Christof Krautschik, Manish Chandhok, Henry Chapman, Donna O'Connell, Michael Goldstein

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.485547

KEYWORDS: Mirrors, Extreme ultraviolet, Projection systems, Point spread functions, Lithography, Wavefronts, Spatial frequencies, Extreme ultraviolet lithography, Polishing, Surface roughness

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Proceedings Article | 16 June 2003 Paper

Printability of opaque and clear phase defects using the finite-difference time-domain (FDTD) method

Christof Krautschik, Iwao Nishiyama

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482640

KEYWORDS: Photomasks, Opacity, Finite-difference time-domain method, Extreme ultraviolet, Semiconducting wafers, Phase shifts, Critical dimension metrology, Cadmium, Computer simulations, Chromium

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Proceedings Article | 16 June 2003 Paper

Implementing flare compensation for EUV masks through localized mask CD resizing

Christof Krautschik, Manish Chandhok, Guojing Zhang, Sang Hun Lee, Michael Goldstein, Eric Panning, Bryan Rice, Robert Bristol, Vivek Singh

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482344

KEYWORDS: Photomasks, Critical dimension metrology, Point spread functions, Chromium, Cadmium, Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Convolution, Mirrors

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Proceedings Article | 1 July 2002 Paper

Impact of EUV light scatter on CD control as a result of mask density changes

Christof Krautschik, Masaaki Ito, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472302

KEYWORDS: Mirrors, Critical dimension metrology, Chromium, Surface roughness, Point spread functions, Extreme ultraviolet, Light scattering, Spatial frequencies, Scattering, Control systems

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Proceedings Article | 20 August 2001 Paper

Quantifying EUV imaging tolerances for the 70-, 50-, 35-nm modes through rigorous aerial image simulations

Christof Krautschik, Masaaki Ito, Iwao Nishiyama, Takashi Mori

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436684

KEYWORDS: Critical dimension metrology, Distortion, Extreme ultraviolet, Tolerancing, Extreme ultraviolet lithography, Control systems, Photomasks, Wavefronts, Logic, Overlay metrology

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Proceedings Article | 20 August 2001 Paper

Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations

Christof Krautschik, Masaaki Ito, Iwao Nishiyama, Katsura Otaki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436666

KEYWORDS: Photomasks, Extreme ultraviolet, Binary data, Reflectivity, Phase shifting, Scattering, Finite element methods, Mirrors, Tantalum, Coherence (optics)

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Proceedings Article | 26 July 1999 Paper

Mathematical treatment of condenser aberrations and their impact on linewidth control

Christof Krautschik, Masato Shibuya, Kenny Toh

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354395

KEYWORDS: Monochromatic aberrations, Reticles, Distortion, Light sources, Photomasks, Image quality, Fiber optic illuminators, Spherical lenses, Lithography, Lithographic illumination

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Proceedings Article | 1 June 1992 Paper

Use of computer optimization programs for the enhancement of Nikon stepper throughput with defectivity reduction benefits

Yumiko Takamori, Christof Krautschik

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59818

KEYWORDS: Semiconducting wafers, Software development, Software, Reticles, Manufacturing, Algorithm development, Integrated circuits, Metrology, Inspection, Process control

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Proceedings Article | 30 December 1991 Paper

Test of photovoltaic model of photoinduced second-harmonic generation in optical fibers

Eugeni Dianov, Peter Kazansky, Christof Krautschik, Dmitrii Stepanov

Proceedings Volume 1516, (1991) https://doi.org/10.1117/12.51145

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Showing 5 of 12 publications

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