Dr. Gukjin Kim Profile

Dr. Gukjin Kim

Publications (18)

Proceedings Article | 26 October 2017 Paper

Wrinkle formation analysis in extreme-ultraviolet pellicle

Hae-Nam Jeong, Guk-Jin Kim, Sung-Gyu Lee, Hye-Keun Oh

Proceedings Volume 10450, 104501Q (2017) https://doi.org/10.1117/12.2281036

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide, Finite element methods, Graphene

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Proceedings Article | 16 October 2017 Paper

Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection

Sung-Gyu Lee, Guk-Jin Kim, Su-Mi Hur, Hye-Keun Oh

Proceedings Volume 10450, 104501M (2017) https://doi.org/10.1117/12.2280618

KEYWORDS: Extreme ultraviolet, Pellicles, Inspection, Deep ultraviolet, Photomasks, Silicon, Refractive index, Ruthenium, Extreme ultraviolet lithography, Polarization

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SPIE Journal Paper | 12 October 2017

Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle

Guk-Jin Kim, In-Seon Kim, Sung-Gyu Lee, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041008, (October 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041008

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

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Proceedings Article | 24 March 2017 Paper

Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 10143, 101431P (2017) https://doi.org/10.1117/12.2258188

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Optical lithography, Optical proximity correction, EUV optics, Photomasks, Wafer-level optics, Reflectivity, Semiconducting wafers, Extreme ultraviolet

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Proceedings Article | 24 March 2017 Paper

Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 10143, 101431V (2017) https://doi.org/10.1117/12.2258189

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Silicon carbide

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Proceedings Article | 24 March 2017 Paper

CD error caused by aberration and its possible compensation by optical proximity correction in extreme-ultraviolet lithography

Jeong-Gu Hwang, In-Seon Kim, Guk-Jin Kim, Hee-Ra No, Byung-Hun Kim, Hye-Keun Oh

Proceedings Volume 10143, 101431U (2017) https://doi.org/10.1117/12.2261827

KEYWORDS: Critical dimension metrology, Optical proximity correction, Extreme ultraviolet lithography, Distortion, Extreme ultraviolet, Tolerancing, Photomasks, Monochromatic aberrations, Optical lithography, Optical calibration, Scanners, Lithography

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Proceedings Article | 26 September 2016 Paper

Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9985, 99850G (2016) https://doi.org/10.1117/12.2242999

KEYWORDS: Pellicles, Extreme ultraviolet, Optical lithography, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Lead, Lithography, Contamination, Neodymium

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SPIE Journal Paper | 1 August 2016

Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Seong-Wook Kim, Hye-Keun Oh

JM3, Vol. 15, Issue 03, 033504, (August 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.033504

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Reflectivity, Imaging systems, Logic, Semiconductors, Applied physics

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SPIE Journal Paper | 9 May 2016

Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Hye-Keun Oh

JM3, Vol. 15, Issue 02, 023503, (May 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023503

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Lithography, Optical lithography, Manufacturing, Oxides, 3D modeling

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Proceedings Article | 18 March 2016 Paper

Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9776, 97762P (2016) https://doi.org/10.1117/12.2219874

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Lithographic illumination, Reflectivity, Critical dimension metrology, Lead

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SPIE Journal Paper | 7 October 2015

Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-ho Ahn, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 14, Issue 04, 043501, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043501

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Radiation effects, Deep ultraviolet, Photomasks, Silicon carbide, Mirrors

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Proceedings Article | 9 July 2015 Paper

Patterning dependence on the mask defect for extreme ultraviolet lithography

Hye-Rim Ji, In-Seon Kim, Guk-Jin Kim, Jin-Goo Park, Min-Su Kim, Micheal Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9658, 965813 (2015) https://doi.org/10.1117/12.2197751

KEYWORDS: Photomasks, Critical dimension metrology, Particles, Extreme ultraviolet lithography, Mass attenuation coefficient, Optical lithography, Iron, Aluminum, Metals, Extreme ultraviolet

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Proceedings Article | 19 March 2015 Paper

Multi-stack extreme-ultraviolet pellicle with out-of-band reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-Ho Ahn, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9422, 94221O (2015) https://doi.org/10.1117/12.2086052

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Semiconducting wafers, Radiation effects, Photomasks, Deep ultraviolet, Silicon, Silicon carbide, Extreme ultraviolet lithography

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Proceedings Article | 28 July 2014 Paper

Etched multilayer mask in EUV lithography for 16 nm node and below

Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9256, 92560Q (2014) https://doi.org/10.1117/12.2069404

KEYWORDS: Photomasks, Computer simulations, Extreme ultraviolet lithography, Diffraction, Lithographic illumination, Image enhancement, Etching, Binary data, Coherence (optics), Extreme ultraviolet

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Proceedings Article | 28 July 2014 Paper

Etched multilayer mask is better than conventional absorber mask

Guk-Jin Kim, Hye-Keun Oh, In-Seon Kim, Michael Yeung, Eytan Barouch

Proceedings Volume 9256, 92560R (2014) https://doi.org/10.1117/12.2069885

KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Semiconducting wafers, Image processing, Ultraviolet radiation, Lithography, Ruthenium, Ions, Oxidation

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Proceedings Article | 17 April 2014 Paper

193nm inspection of extreme ultraviolet mask absorber defect

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Chang-Moon Lim, Hye-Keun Oh

Proceedings Volume 9048, 90482S (2014) https://doi.org/10.1117/12.2046587

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Extreme ultraviolet lithography, Reflectivity, Defect detection, Antireflective coatings, Multilayers, Oxidation

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Proceedings Article | 17 April 2014 Paper

Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seung-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482D (2014) https://doi.org/10.1117/12.2046202

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Silicon, Thin films, Absorption, Optical simulations, Lithography

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Proceedings Article | 18 March 2014 Paper

Effect of defects on extreme ultraviolet pellicle

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Ji-Won Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482A (2014) https://doi.org/10.1117/12.2046171

KEYWORDS: Pellicles, Contamination, Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Carbon, Extreme ultraviolet, Lithography, Absorption, Silicon

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Showing 5 of 18 publications

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