Dr. Hiroaki Tsushima Profile

Dr. Hiroaki Tsushima

at Gigaphoton Inc

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 23 March 2020 Paper

Paper

Imaging performance enhancement by improvements of spectral performance stability and controllability on the cutting-edge

Miwa Igarashi, Hirotaka Miyamoto, Masahide Katou, Hiroaki Tsushima, Masato Moriya, Akihiko Kurosu, Hiroshi Tanaka, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 11327, 1132717 (2020) https://doi.org/10.1117/12.2551845

KEYWORDS: Diffraction gratings, Prisms, Diffraction, Actuators, Light sources, Control systems, Oscillators, Wavefronts, Beam expanders, Excimer lasers

Read Abstract +

Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter leading edge device requirements. To enhance the resolution and productivity for multiple-patterning application, key light source performances are spectral bandwidth stability and wavelength stability. The increased spectral bandwidth stability contributes to more precise critical dimension (CD) control and improves device yield. The increased wavelength stability can realize accurate focus and improve overlay accuracy. Our new spectral bandwidth control module improves E95 spectral bandwidth stability. The spectral bandwidth has deviations by thermal history with light source operations. It should be always controlled tightly even after a quiescent interval, such as wafer loading. In our laser system, a spectral bandwidth is controlled by adjusting the wavefront of a laser beam using a two-lens optical system within a resonator. A high speed actuator equipped the movable lens enables E95 spectral bandwidth stability to be less variation. New designs of drive mechanism suppress the lens vibration and spectral bandwidth error. This technology enables 3-sigma of E95 spectral bandwidth field average to be under 5 fm. This large shrinkage for E95 spectral bandwidth stability is the key to improve larger focus budgets for a leading edge processes. A new designed line narrowing module (LNM) improves wavelength stability. The wavelength is controlled by changing the rotation of a beam expander prism using actuator. Wavelength stability is improved further by the anti-vibration structure of the actuated prism in the LNM. The new design prism holding mechanisms reduce the mass of actuator load. This increases the stiffness of the system and suppresses the vibration of the prism rotation. New LNM reduce wavelength stability about 20%. The improvement in wavelength stability contributes to accurate focus and overlay. In addition, the lifetime of LNM is extending to reduce the Cost of Operation (CoO) and the light source downtime. A new ArF excimer laser, GT66A, maximizes device yield, process productivity and minimizes the operational costs for chipmakers.

Proceedings Article | 27 March 2019 Paper

Paper

Extremely long life excimer laser chamber technology for multi-patterning lithography

Hiroaki Tsushima, Yasuaki Kiyota, Makoto Tanaka, Takashi Itou, Takeshi Asayama, Akihiko Kurosu, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi, Yousuke Fujimaki

Proceedings Volume 10961, 109610X (2019) https://doi.org/10.1117/12.2515667

KEYWORDS: Electrodes, Excimer lasers, Lithography, Laser applications, Light sources, Semiconductors, Optical lithography, Semiconductor manufacturing, Semiconductor lasers, Laser development

Read Abstract +

Proceedings Article | 18 March 2019 Presentation

Presentation

Next generation ArF lightsource "T65A" for cutting-edge immersion lithography providing both high in productivity and performance (Conference Presentation)

Taku Yamazaki, Takeshi Ohta, Hiroaki Tsushima, Satoru Bushida, Tommy Oga

Proceedings Volume 10961, 109610L (2019) https://doi.org/10.1117/12.2515653

KEYWORDS: Immersion lithography, Optical design, Electrodes, Process control, Yield improvement, Manufacturing, Optics manufacturing, Wafer-level optics, Image resolution, Semiconducting wafers

Read Abstract +

Proceedings Article | 20 March 2018 Presentation + Paper

Presentation + Paper

Next-generation ArF laser technologies for multiple-patterning immersion lithography supporting leading edge processes

Hirotaka Miyamoto, Hiroshi Furusato, Keisuke Ishida, Hiroaki Tsushima, Akihiko Kurosu, Hiroshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10587, 1058710 (2018) https://doi.org/10.1117/12.2297316

KEYWORDS: Diffraction, Actuators, Semiconducting wafers, Diffraction gratings, Laser applications, Electrodes, Oscillators, Immersion lithography, Light sources, Laser stabilization

Read Abstract +

Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter process control requirements. The most important features for the next generation light sources are improvement of chip yield, enhancement of productivity and reduction of operational costs for chipmakers [1][2]. One of key performance for light source is E95 bandwidth, which has become more important parameter for enhancing process margin and improving device productivity. A faster actuator to move a lens improves E95 bandwidth stability [3]. This technology enables 3σ of E95 bandwidth field average to be under 10 fm. This contributes to more precise CD control and improves device yield. Latest LNM enables E95 bandwidth to lower from the standard 300 fm to 200 fm [4]. The large shrinkage for E95 bandwidth is achieved by introducing the ingenious design in LNM. High purity E95 bandwidth improves imaging contrast and therefore increases exposure latitude. A new control algorithm enables E95 bandwidth to vary up to 450 fm, leveraging the movable lens. The combination of the new LNM, the movable lens and the new bandwidth control algorithm enables E95 bandwidth to control between 200 fm and 450 fm [5]. The tunable E95 bandwidth technology can improve process productivity for chip makers by compensating not only machine to machine difference of imaging contrast but also difference of imaging contrast between different generation scanners. The tunable E95 bandwidth technology has no influence on key laser performance indicator, dose stability, wavelength stability, E95 bandwidth stability, etc. On the other hand, to reduce downtime and operational costs for chipmakers, the lifetime of consumable modules such as a chamber and a line narrowing module (LNM) is needed to be extended. New electrodes with chamber enables chamber lifetime to extend from 60 billion pulses (Bpls) to 70 Bpls. Furthermore, new optical design in LNM enables the lifetime to extend from 60 Bpls to 110 Bpls. A new ArF excimer laser, GT65A, maximizes device yield, process productivity and minimizes the operational costs for chipmakers.

Proceedings Article | 20 March 2018 Paper

Paper

Extremely long life excimer laser technology for multi-patterning lithography

Yousuke Fujimaki, Makoto Tanaka, Takashi Itou, Hirotaka Miyamoto, Miwa Igarashi, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Satoru Bushida, Hakaru Mizoguchi, Hiroaki Tsushima

Proceedings Volume 10587, 105871J (2018) https://doi.org/10.1117/12.2297341

KEYWORDS: Electrodes, Excimer lasers, Lithography, Laser applications, Diffraction gratings

Read Abstract +

Proceedings Article | 24 March 2017 Paper

Paper

Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

Hiroshi Furusato, Takahito Kumazaki, Takeshi Ohta, Hiroaki Tsushima, Akihiko Kurosu, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10147, 101471N (2017) https://doi.org/10.1117/12.2257960

KEYWORDS: Helium, Actuators, Optical lithography, Excimer lasers, Immersion lithography, Yield improvement, Wavefronts, Critical dimension metrology, Refractive index, Nitrogen, Thermal effects, Diffraction gratings, Control systems

Read Abstract +

Proceedings Article | 24 March 2017 Presentation + Paper

Presentation + Paper

The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Takashi Matsunaga, Hakaru Mizoguchi, Satoru Bushida

Proceedings Volume 10147, 1014719 (2017) https://doi.org/10.1117/12.2257959

KEYWORDS: Neon, Helium, Gases, Image processing, Nitrogen, Immersion lithography, Gas lasers, Image contrast enhancement, Image enhancement, Excimer lasers, Actuators, Wavefronts, Refractive index, Semiconducting wafers, Critical dimension metrology

Read Abstract +

Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter leading edge device requirements. The most needed features for the next generation lasers are improvement of device yield, the prevention against rare resource shortage and the reduction of operational costs in multiple-patterning lithography [1] [2]. To support these requirements, GT65A provides the functions of tighter E95 bandwidth stability, lower E95 bandwidth and tunable E95 bandwidth to enhance chip yields [3] [4]. Furthermore, in the prevention against rare resource shortage and the reduction of operational costs, GT65A realizes helium-free operation in a line narrowing module (LNM) and the reduction of neon consumption in a chamber [5]. A faster actuator equipped with the movable lens enables shot average of E95 bandwidth stability to be within ±5 fm to more rapidly adjust laser beam wavefront. More stable spectral bandwidth stability leads to improve CD uniformity. New designed LNM realizes 200 fm of lower E95 bandwidth, because it suppresses thermal wavefront deformation in optical elements and mechanical components. Lower E95 bandwidth improves image contrast and enhances exposure latitude. The combination of a faster actuator and new LNM enables tunable E95 bandwidth to vary from 200 to 450 fm at less than time intervals of a wafer lot exchange, six seconds. This enhances imaging margins by optimizing E95 bandwidth of light sources according to individual scanners. New LNM additionally enables helium-free operation to lower E95 bandwidth in spite of nitrogen purge with higher refractive index variation to temperature. The employment of a new LNM can avoid helium supply risk and saves helium consumption of 80 kL/year/unit. Gas recycling system saves by about 92% of neon consumption in ArF laser. Similarly, the recycling system saves about 85% of neon consumption in KrF laser too. These functions with GT65A improve chip yield and process margins, and support sustainable high volume manufacturing (HVM).

Proceedings Article | 24 March 2017 Paper

Paper

Excimer laser gas usage reduction technology for semiconductor manufacturing

Masanori Yashiro, Hakaru Mizoguchi, Takashi Matsunaga, Takeshi Ohta, Takuma Oouchi, Hiroaki Tsushima, Akihiko Kurosu

Proceedings Volume 10147, 101471O (2017) https://doi.org/10.1117/12.2257972

KEYWORDS: Gas lasers, Excimer lasers, Neon, Semiconductor manufacturing, Lithography, Beam controllers, Xenon, Deep ultraviolet, Light sources, Molecules, Laser systems engineering, Sustainable technology, Prototyping, Pulsed laser operation, Laser stabilization

Read Abstract +

Proceedings Article | 15 March 2016 Paper

Paper

The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Takashi Matsunaga, Hirotaka Miyamoto, Hakaru Mizoguchi

Proceedings Volume 9780, 97801I (2016) https://doi.org/10.1117/12.2218778

KEYWORDS: Helium, Lithography, Excimer lasers, Immersion lithography, Optical lithography, Refractive index, Nitrogen, Wavefronts, Algorithm development, Deep ultraviolet, Diffraction gratings, Thermal effects, Optical components

Read Abstract +

Proceedings Article | 15 March 2016 Paper

Paper

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

Takeshi Ohta, Hirotaka Miyamoto, Keisuke Ishida, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9780, 978010 (2016) https://doi.org/10.1117/12.2219379

KEYWORDS: Helium, Neon, Control systems, Laser development, Optical components, Immersion lithography, Excimer lasers, Optical lithography, Lithography, Gas lasers, Actuators, Semiconducting wafers, Laser applications

Read Abstract +

Proceedings Article | 18 March 2015 Paper

Paper

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

Takeshi Ohta, Hakaru Mizoguchi, Keisuke Ishida, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Kouji Kakizaki, Takashi Matsunaga

Proceedings Volume 9426, 94261J (2015) https://doi.org/10.1117/12.2085631

KEYWORDS: Semiconducting wafers, Algorithm development, Lithography, Control systems, Laser development, Optical components, Laser stabilization, Gases, Helium, Immersion lithography

Read Abstract +

Proceedings Article | 18 March 2015 Paper

Paper

Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography

Takahito Kumazaki, Takeshi Ohta, Keisuke Ishida, Hiroaki Tsushima, Akihiko Kurosu, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9426, 94261A (2015) https://doi.org/10.1117/12.2085006

KEYWORDS: Helium, Gas lasers, Lithography, Neon, Laser development, Semiconducting wafers, Laser applications, Light sources, Gases, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 4 April 2014 Paper

Paper

Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Hiroaki Tsushima, Hisakazu Katsuumi, Hiroyuki Ikeda, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90521E (2014) https://doi.org/10.1117/12.2046189

KEYWORDS: Excimer lasers, Electrodes, 193nm lithography, Lithography, Laser applications, Light sources, Semiconducting wafers, Neodymium, Optical lithography, Semiconductors

Read Abstract +

Proceedings Article | 12 April 2013 Paper

Paper

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Youichi Sasaki, Takayuki Nagashima, Akihiko Kurosu, Hiroaki Tsushima, Takahito Kumazaki, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi, Takeshi Asayama

Proceedings Volume 8683, 86831G (2013) https://doi.org/10.1117/12.2011404

KEYWORDS: Excimer lasers, Lithography, Light sources, 193nm lithography, Semiconducting wafers, Laser stabilization, Laser systems engineering, Pulsed laser operation, High power lasers, Extreme ultraviolet

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Paper

A reliable higher power ArF laser with advanced functionality for immersion lithography

Masaki Nakano, Hakaru Mizoguchi, Hiroaki Tsushima, Masaya Yoshino, Junichi Fujimoto, Shinichi Matsumoto, Takashi Matsunaga, Masanori Yashiro, Akihiko Kurosu, Hiroyuki Masuda, Shinji Okazaki, Kouji Kakizaki, Takahito Kumazaki

Proceedings Volume 8326, 83261F (2012) https://doi.org/10.1117/12.916324

KEYWORDS: Excimer lasers, Control systems, Optical lithography, Laser drilling, Gas lasers, Laser development, Semiconducting wafers, Gemini Planet Imager, 193nm lithography, Manufacturing

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Paper

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

Akihiko Kurosu, Satoshi Tanaka, Takashi Matsunaga, Hakaru Mizoguchi, Hidenori Watanabe, Yasufumi Kawasuji, Junichi Fujimoto, Masaya Yoshino, Hiroshi Umeda, Hiroaki Tsushima, Hiroshi Tanaka, Shinich Matsumoto

Proceedings Volume 7973, 79731K (2011) https://doi.org/10.1117/12.879205

KEYWORDS: Reliability, Excimer lasers, Ecology, Immersion lithography, Double patterning technology, Laser development, Lithography, Laser applications, Light sources, High power lasers

Read Abstract +

Proceedings Article | 10 March 2010 Paper

Paper

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

Hiroaki Tsushima, Masaya Yoshino, Hiroyuki Nogawa, Junichi Fujimoto, Takashi Matsunaga, Hakaru Mizoguchi, Hidenori Watanabe, Satoshi Tanaka, Shinich Matsumoto, Hiroshi Umeda, Yasufumi Kawasuji, Takashi Onose

Proceedings Volume 7640, 76402A (2010) https://doi.org/10.1117/12.846337

KEYWORDS: Reliability, Double patterning technology, Excimer lasers, High power lasers, Immersion lithography, Lithography, Pulsed laser operation, Laser stabilization, Laser applications, Laser development

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Optical performance of laser light source for ArF immersion double patterning lithography tool

Satoshi Tanaka, Takeshi Ohta, Takahito Kumazaki, Takashi Matsunaga, Yasufumi Kawasuji, Akihiko Kurosu, Hidenori Watanabe, Hiroaki Nakarai, Katsuhiko Wakana, Junichi Fujimoto, Shinichi Matsumoto, Masaya Yoshino, Hiroaki Tsushima, Hakaru Mizoguchi, Toru Suzuki

Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476

KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Masaya Yoshino, Shinichi Matsumoto, Hidenori Watanabe, Toru Suzuki, Akihiko Kurosu, Satoshi Tanaka, Hiroshi Umeda, Hiroaki Nakarai, Hakaru Mizoguchi, Takahito Kumazaki, Takashi Matsunaga, Hiroaki Tsushima, Junichi Fujimoto, Yasufumi Kawasuji, Takeshi Ohta

Proceedings Volume 7274, 72743L (2009) https://doi.org/10.1117/12.813642

KEYWORDS: Reliability, Oscillators, Light sources, Fluorine, Laser applications, Double patterning technology, Optical amplifiers, High power lasers, Excimer lasers, Immersion lithography

Read Abstract +

Proceedings Article | 15 March 2006 Paper

Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Shinji Nagai, Hiroaki Tsushima, Koji Kakizaki, Satoshi Tanaka, Junichi Fujimoto, Toru Suzuki, Toyoharu Inoue, Hitoshi Tomaru, Taku Yamazaki, Takanori Nakaike, Takashi Matsunaga, Takashi Saito, Hakaru Mizoguchi, Osamu Wakabayashi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Paper

Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography

Takeshi Ohta, Ken-ichi Mitsuhashi, Tatsushi Igarashi, Masaya Yoshino, Takashi Matsunaga, Hitoshi Tomaru, Takanobu Ishihara, Katsutomo Terashima, Hiroaki Tsushima, Takashi Saito, Tatsuo Enami, Akifumi Tada

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435658

KEYWORDS: Surface plasmons, Photovoltaics, Excimer lasers, Lithography, Optical lithography, Pulsed laser operation, Laser development, Laser scanners, 3D scanning, Performance modeling

Read Abstract +

Showing 5 of 21 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement