Mr. Hiroshi Umeda Profile

Hiroshi Umeda

Engineering Manager at Gigaphoton Inc

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Author

Publications (9)

Proceedings Article | 23 March 2011 Paper

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

Hiroshi Umeda, Hiroaki Tsushima, Hidenori Watanabe, Satoshi Tanaka, Masaya Yoshino, Shinich Matsumoto, Hiroshi Tanaka, Akihiko Kurosu, Yasufumi Kawasuji, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7973, 79731K (2011) https://doi.org/10.1117/12.879205

KEYWORDS: Reliability, Excimer lasers, Ecology, Immersion lithography, Double patterning technology, Laser development, Lithography, Laser applications, Light sources, High power lasers

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Proceedings Article | 10 March 2010 Paper

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

Masaya Yoshino, Hiroshi Umeda, Hiroaki Tsushima, Hidenori Watanabe, Satoshi Tanaka, Shinich Matsumoto, Takashi Onose, Hiroyuki Nogawa, Yasufumi Kawasuji, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7640, 76402A (2010) https://doi.org/10.1117/12.846337

KEYWORDS: Reliability, Double patterning technology, Excimer lasers, High power lasers, Immersion lithography, Lithography, Pulsed laser operation, Laser stabilization, Laser applications, Laser development

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Proceedings Article | 16 March 2009 Paper

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Hiroaki Tsushima, Masaya Yoshino, Takeshi Ohta, Takahito Kumazaki, Hidenori Watanabe, Shinichi Matsumoto, Hiroaki Nakarai, Hiroshi Umeda, Yasufumi Kawasuji, Toru Suzuki, Satoshi Tanaka, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743L (2009) https://doi.org/10.1117/12.813642

KEYWORDS: Reliability, Oscillators, Light sources, Fluorine, Laser applications, Double patterning technology, Optical amplifiers, High power lasers, Excimer lasers, Immersion lithography

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Proceedings Article | 11 April 2008 Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, Satoshi Tanaka, Yukio Watanabe, Taku Yamazaki, Shinji Nagai, Osamu Wakabayashi, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

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Proceedings Article | 7 March 2008 Paper

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Toru Suzuki, Satoshi Tanaka, Ryoichi Nohdomi, Masaya Yoshino, Shinichi Matsumoto, Yasufumi Kawasuji, Hiroshi Umeda, Hitoshi Nagano, Kouji Kakizaki, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242R (2008) https://doi.org/10.1117/12.778149

KEYWORDS: Semiconducting wafers, Reliability, Immersion lithography, Light sources, Laser stabilization, Metrology, High power lasers, Spectroscopy, Laser development, Laser applications

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Proceedings Article | 26 March 2007 Paper

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Toru Suzuki, Kouji Kakizaki, Takashi Matsunaga, Satoshi Tanaka, Yasufumi Kawasuji, Masashi Shimbori, Masaya Yoshino, Takahito Kumazaki, Hiroshi Umeda, Hitoshi Nagano, Shinji Nagai, Youichi Sasaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652024 (2007) https://doi.org/10.1117/12.711366

KEYWORDS: Light sources, Spectroscopy, Immersion lithography, Optical proximity correction, Excimer lasers, Lithography, Scanners, Laser applications, Laser development, Critical dimension metrology

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Proceedings Article | 21 March 2006 Paper

High power injection lock 6kHz 60W laser for ArF dry/wet lithography

Hakaru Mizoguchi, T. Inoue, J. Fujimoto, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. Nakaike, M. Shinbori, M. Yoshino, T. Kawasuji, H. Nogawa, H. Umeda, H. Taniguchi, Y. Sasaki, J. Kinoshita, T. Abe, H. Tanaka, H. Hayashi, K. Miyao, M. Niwano, A. Kurosu, M. Yashiro, H. Nagano, T. Igarashi, T. Mimura, K. Kakizaki

Proceedings Volume 6154, 615425 (2006) https://doi.org/10.1117/12.656972

KEYWORDS: Molybdenum, Lithography, High power lasers, Optical lithography, Oscillators, Laser applications, Laser systems engineering, Light sources, Control systems, Laser development

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Proceedings Article | 12 May 2005 Paper

High-power injection lock laser platform for ArF dry/wet lithography

H. Mizoguchi, T. Inoue, J. Fujimoto, T. Yamazaki, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. Ohta, M. Nakane, M. Moriya, T. Nakaike, M. Shinbori, M. Yoshino, T. Kawasuji, H. Nogawa, T. Ito, H. Umeda, S. Tanaka, H. Taniguchi, Y. Sasaki, J. Kinoshita, T. Abe, H. Tanaka, H. Hayashi, K. Miyao, M. Niwano, A. Kurosu, M. Yashiro, H. Nagano, N. Matsui, T. Mimura, K. Kakizaki, M. Goto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600796

KEYWORDS: Molybdenum, Lithography, High power lasers, Optical lithography, 193nm lithography, Control systems, Light sources, Optical components, Oscillators, Laser development

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Proceedings Article | 6 November 2000 Paper

High-repetition-rate ArF excimer laser for microlithography

Osamu Wakabayashi, Tatsuo Enami, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Satoshi Andou, Takashi Matsunga, Hiroshi Umeda, Toru Suzuki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 4088, (2000) https://doi.org/10.1117/12.405749

KEYWORDS: Excimer lasers, Gas lasers, Xenon, Laser development, Laser stabilization, Pulsed laser operation, Light sources, Spectroscopy, Laser applications, Lithography

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Showing 5 of 9 publications

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