Dr. Hoon Kim Profile

Dr. Hoon Kim

at National Univ of Singapore

SPIE Involvement:

Author

Proceedings Article | 5 March 2013 Paper

Multi-domain vertical alignment of nematic liquid crystals for reduced off-axis gamma shift

Tae-Hoon Yoon, Byung Wok Park, Ki-Han Kim, Hoon Kim, Ki-Chul Shin, Hee Seop Kim

Proceedings Volume 8642, 86420D (2013) https://doi.org/10.1117/12.2003295

KEYWORDS: Polymers, Liquid crystals, Ultraviolet radiation, Transmittance, Molecules, LCDs, Electrodes, Distortion, Switching, Electro optics

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Proceedings Article | 20 March 2010 Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

In-Yong Kang, Dongwan Kim, Byung-Sup Ahn, Hwan-Seok Seo, Cha-Won Koh, Tae Geun Kim, Seong-Sue Kim, Han-Ku Cho, Hoon Kim, Dong-Gun Lee

Proceedings Volume 7636, 76360X (2010) https://doi.org/10.1117/12.847955

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Lithography, Inspection, Line width roughness, Scanners, Critical dimension metrology, Electroluminescence

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Proceedings Article | 18 March 2009 Paper

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Dong-Gun Lee, Seong-Sue Kim, In-Yong Kang, Sungmin Huh, Dongwan Kim, Han-Ku Cho, Hoon Kim, Hakseung Han, Byung-Sup Ahn, Hwan-Seok Seo

Proceedings Volume 7271, 72710D (2009) https://doi.org/10.1117/12.813932

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Silicon, Semiconducting wafers, Ruthenium, Extreme ultraviolet, Reflectivity, Phase shifts, Refractive index

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Proceedings Article | 27 March 2008 Paper

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Dong Gun Lee, Seoung Sue Kim, Hwan-Seok Seo, Jaehyuck Choi, Byungsup Ahn, Takeo Watanabe, Gisung Yoon, Hoon Kim, Hiroo Kinoshita, Han Ku Cho, Han-Shin Lee, Sungmin Huh, Dongwan Kim

Proceedings Volume 6921, 692115 (2008) https://doi.org/10.1117/12.772412

KEYWORDS: Photomasks, Carbon, Contamination, Ruthenium, Extreme ultraviolet lithography, Silicon, Critical dimension metrology, Reflectivity, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 3 October 2006 Paper

Simulation approach to the improvement of dispersion tolerance for electrical-binary-signal-based duobinary transmitters

Jichai Jeong, Hanlim Lee, Sung Kee Kim, Byungjik Kim, Seongtaek Hwang, Yunje Oh, Hoon Kim, Jaehoon Lee, Yonggyoo Kim

Proceedings Volume 6353, 635346 (2006) https://doi.org/10.1117/12.691607

KEYWORDS: Transmitters, Tolerancing, Modulators, Receivers, Eye, Dispersion, Signal generators, Binary data, Optical filters, Optical amplifiers

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Proceedings Article | 21 September 2006 Paper

Cost-effective optical duobinary transmitters

Hoon Kim, Seongtaek Hwang, Hanlim Lee, Gyuwoong Lee, Sung Kee Kim, Yunje Oh

Proceedings Volume 6353, 63530C (2006) https://doi.org/10.1117/12.688018

KEYWORDS: Modulators, Transmitters, Receivers, Optical filters, Eye, Transponders, Tolerancing, Computer programming, Modulation, Pulse shaping

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Proceedings Article | 9 December 2005 Paper

Differential phase-shift-keyed transmission

Hoon Kim

Proceedings Volume 6021, 60212O (2005) https://doi.org/10.1117/12.636508

KEYWORDS: Receivers, Transmitters, Complex systems, Phase shift keying, Modulation, Modulators, Nonlinear optics, Signal detection, Tolerancing, Sensors

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Showing 5 of 7 publications

Conference Committee Involvement (2)

Optical Transmission, Switching, and Subsystems

2 November 2007 | Wuhan, China

Optical Transmission, Switching, and Subsystems III

7 November 2005 | Shanghai, China

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