Ms. Jae-Cheon Shin Profile

Jae-Cheon Shin

at SK Hynix Inc

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Author

Publications (6)

Proceedings Article | 29 October 2014 Paper

A method of utilizing AIMS to quantify lithographic performance of high transmittance mask

Chun Seon Choi, Dong Sik Jang, Sung Hyun Oh, Jae Cheon Shin, Tae Joong Ha, Sang Pyo Kim, Dong Gyu Yim, Byungho Nam

Proceedings Volume 9235, 92351R (2014) https://doi.org/10.1117/12.2066283

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Nanoimprint lithography, Lithography, Binary data, Chromium, Etching, Image analysis, Extreme ultraviolet

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Proceedings Article | 26 May 2010 Paper

New critical dimension uniformity measurement concept based reticle inspection tool

Kangjoon Seo, Sang Chul Kim, KiHun Park, JaeCheon Shin, ChangYeol Kim, Aditya Dayal, MunSik Kim, John Miller, Trent Hutchinson

Proceedings Volume 7748, 77480N (2010) https://doi.org/10.1117/12.864109

KEYWORDS: Photomasks, Reticles, Inspection, Critical dimension metrology, Reflectivity, Semiconducting wafers, Scanning electron microscopy, Manufacturing, Data processing, Scanners

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Proceedings Article | 30 October 2007 Paper

The advanced mask CD MTT control using dry etch process for sub 65 nm tech

Oscar Han, Jea Young Jun, Jae Cheon Shin, Sang Jin Jo, Ho Yong Jung, Tae Joong Ha, Dong Wook Lee

Proceedings Volume 6730, 673008 (2007) https://doi.org/10.1117/12.746646

KEYWORDS: Etching, Chromium, Dry etching, Critical dimension metrology, Photomasks, Reliability, Electron beams, Scanning electron microscopy, Process control, Semiconductors

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Proceedings Article | 20 October 2006 Paper

Mask CD correction method using dry-etch process

Ho Yong Jung, Oscar Han, Tae Joong Ha, Ku Cheol Jeong, Young Kee Kim, Jae Cheon Shin

Proceedings Volume 6349, 63490B (2006) https://doi.org/10.1117/12.686537

KEYWORDS: Critical dimension metrology, Chromium, Etching, Dry etching, Photoresist processing, Photomasks, Reliability, Scanning electron microscopy, Phase shifts, Electron beam lithography

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Proceedings Article | 20 August 2004 Paper

Spin stream develop process for ZEP resist

Oscar Han, Tae-Joong Ha, Jaecheon Shin, Bo-Kyung Choi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557710

KEYWORDS: Photomasks, Photoresist processing, Critical dimension metrology, Manufacturing, Semiconducting wafers, Phase shifts, Halftones, Mask making, Semiconductors, Electron beam lithography

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Proceedings Article | 17 December 2003 Paper

Cell projection EB exposure for Giga DRAM device mask

Munki Lim, Bo-Kyung Choi, Youngmo Lee, Oscar Han, Jae Cheon Shin, Yongkyoo Choi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518332

KEYWORDS: Silicon, Photomasks, Semiconducting wafers, Etching, Electron beams, Vestigial sideband modulation, Beam shaping, Chemistry, Photoresist processing, Silicon films

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Showing 5 of 6 publications

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