Mr. Johan O. Karlsson Profile

Johan O. Karlsson

at Micronic Laser Systems AB

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Author

Publications (8)

Proceedings Article | 28 June 2005 Paper

High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer

Kezhao Xing, Johan Karlsson, Adisa Paulson, Charles Bjornberg, Axel Lundvall, Peter Hogfeldt, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617056

KEYWORDS: Photomasks, Diffractive optical elements, Lithography, Binary data, Deep ultraviolet, Etching, Critical dimension metrology, Standards development, Vestigial sideband modulation, Photoresist processing

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Proceedings Article | 4 May 2005 Paper

Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist

Adisa Paulsson, Kezhao Xing, Hans Fosshaug, Axel Lundvall, Charles Bjoernberg, Johan Karlsson

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599938

KEYWORDS: Photomasks, Diffusion, Lithography, Critical dimension metrology, Deep ultraviolet, Photoresist processing, Control systems, Chemically amplified resists, Temperature metrology, Manufacturing

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Proceedings Article | 6 December 2004 Paper

FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator

Johan Karlsson, Kezhao Xing, Adisa Bajramovic, Henrik Dahlberg, Charles Bjornberg, Peter Hogfeldt, Lars Kjellberg, Hans Fosshaug, Anna Dahlberg, Axel Lundvall

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569653

KEYWORDS: Etching, Dry etching, Photomasks, Diffractive optical elements, Reactive ion etching, Deep ultraviolet, Photoresist processing, Lithography, Image resolution, Manufacturing

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Proceedings Article | 20 August 2004 Paper

Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator

Henrik Sjoberg, Jean-Michel Chauvet, Jan Harkesjo, Peter Hogfeldt, Andrzej Karawajczyk, Johan Karlsson, Lars Kjellberg, Jonas Mahlen, Angela Beyerl, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren, Johan Aman

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557805

KEYWORDS: Photomasks, Spatial light modulators, Manufacturing, Deep ultraviolet, Printing, Raster graphics, Laser applications, Lithography, Image processing, Solids

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Proceedings Article | 28 May 2004 Paper

DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Peter Björnängen, Mats Ekberg, Thomas Öström, Hans Fosshaug, Johan Karlsson, Charles Björnberg, Fredrik Nikolajeff, Mikael Karlsson

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535767

KEYWORDS: Diffractive optical elements, Diffraction, Spatial light modulators, Manufacturing, Optics manufacturing, Phase shift keying, Quartz, Refractive index, Photomasks, Stray light

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Proceedings Article | 14 May 2004 Paper

Influence of writing strategy on CD control for the spatial light modulator-based Sigma7300 DUV laser pattern generator

Hans Fosshaug, Per Askebjer, Johan Karlsson, Adisa Bajramovic, Kezhao Xing, Robert Eklund, Jonathan Walford, Mats Ekberg, Peter Hogfeldt, Thomas Öström

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535821

KEYWORDS: Diffusion, Critical dimension metrology, Photomasks, Deep ultraviolet, Polymers, Printing, Spatial light modulators, Photoresist materials, Chemistry, Chemically amplified resists

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Proceedings Article | 17 December 2003 Paper

Resist process optimization for a DUV laser pattern generator

Hans Fosshaug, Adisa Bajramovic, Johan Karlsson, Kezhao Xing, Anna Rosendahl, Anna Dahlberg, Charles Bjoernberg, Mans Bjuggren, Torbjorn Sandstrom

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518058

KEYWORDS: Etching, Photoresist processing, Deep ultraviolet, Chromium, Image processing, Scanning electron microscopy, Dry etching, Chemically amplified resists, Laser applications, Photomasks

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Proceedings Article | 17 December 2003 Paper

Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Johan Aman, Hans Fosshaug, Tobias Hedqvist, Jan Harkesjo, Peter Hogfeldt, Marie Jacobsson, Andrzej Karawajczyk, Johan Karlsson, Mats Rosling, Henrik Sjoberg

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519970

KEYWORDS: Spatial light modulators, Deep ultraviolet, Photomasks, Laser applications, Excimer lasers, Electron beams, Optical proximity correction, Coherence imaging, Electronics, Particles

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Showing 5 of 8 publications

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