Mr. Richard Hou Profile

Richard Hou

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Publications (9)

Proceedings Article | 13 March 2013 Paper

Fabrication and evaluation of a 500 W cladding-light stripper

A. Kliner, Kai-Chung Hou, M. Plötner, Ch. Hupel, Th. Stelzner, T. Schreiber, R. Eberhardt, A. Tünnermann

Proceedings Volume 8616, 86160N (2013) https://doi.org/10.1117/12.2001984

KEYWORDS: Etching, Signal attenuation, Cladding, Fiber lasers, Polymers, Coating, Glasses, Crystals, Diodes, Light sources

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Proceedings Article | 8 April 2011 Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Daniel Brown, Richard Sandstrom, Bruno La Fontaine, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard Hou, Wayne Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, David Brandt

Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

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Proceedings Article | 7 April 2011 Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Bruno La Fontaine, Michael Lercel, Alexander Bykanov, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir Fleurov, Kevin Zhang, Daniel Golich, Silvia De Dea, Richard Hou, Wayne Dunstan, Christian Wittak, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt

Proceedings Volume 7969, 79691H (2011) https://doi.org/10.1117/12.882208

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, Plasma, Mirrors, Semiconducting wafers, Carbon dioxide lasers, Laser scanners, 3D scanning

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Proceedings Article | 23 March 2010 Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan, David Brandt

Proceedings Volume 7636, 763639 (2010) https://doi.org/10.1117/12.848408

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Carbon dioxide lasers, Reflectivity, Tin, Plasma, Manufacturing, Mirrors, Ions, Light sources

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Proceedings Article | 20 March 2010 Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan

Proceedings Volume 7636, 76361I (2010) https://doi.org/10.1117/12.848404

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Manufacturing, Prototyping, Tin, Mirrors, Laser scanners

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SPIE Journal Paper | 1 October 2009

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Norbert Böwering, Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, Dave Myers, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

JM3, Vol. 8, Issue 04, 041504, (October 2009) https://doi.org/10.1117/12.10.1117/1.3224942

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

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Proceedings Article | 18 March 2009 Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, David Brandt, Alexander Bykanov, Alex Ershov, William Partlo, Dave Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7271, 727138 (2009) https://doi.org/10.1117/12.814272

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Extreme ultraviolet lithography, Sensors, Carbon dioxide lasers, Mirrors, Tin, Coating, Light sources

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Proceedings Article | 18 March 2009 Open Access

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7271, 727103 (2009) https://doi.org/10.1117/12.814228

KEYWORDS: Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Mirrors, Tin, Plasma, Coating, Scanners, Manufacturing, Light sources

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Proceedings Article | 4 December 2008 Paper

Laser-produced plasma source system development

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7140, 71401E (2008) https://doi.org/10.1117/12.806648

KEYWORDS: Extreme ultraviolet, Plasma, Reflectivity, Mirrors, Extreme ultraviolet lithography, Tin, Plasma systems, Manufacturing, Light sources, Carbon dioxide lasers

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This paper provides a review of development progress for a laser-produced-plasma (LPP) extreme-ultra-violet (EUV) source with performance goals targeted to meet joint requirements from all leading scanner manufacturers. Laser produced plasma systems have been developed as a viable approach for the EUV scanner light source for optical imaging of circuit features at sub-32nm and beyond nodes on the ITRS roadmap. Recent advances in the development of the system, its present average output power level and progress with various subcomponents is discussed. We present the latest results on peak EUV and average EUV power as well as stability of EUV output, measured in burst-mode operation at the nominal repetition rate of the light source. In addition, our progress in developing of critical components, such as normal-incidence EUV collector and liquid-target delivery system is described. We also report on dose stability, plasma position stability and EUV distribution at the output region of the source. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source. The capability to scale LPP power by further development of the high power CO2 drive laser in order to increase duty cycle and duration of continuous light source operation is shown. Production systems with thermal management and capable of 5 sr light collection are being assembled and tested. A description of the development of a normal-incidence ellipsoidal collector is included. Improvements in substrate quality lead to increased EUV reflectance of the mirror. Results on the generation of liquid tin droplets as target material for efficient plasma generation are also described. The droplet generator serves as a key element in the precise and spatially stable delivery of small quantities of liquid tin at high repetition rates. We describe a protection module at the intermediate focus (IF) region of the source and imaging of the EUV distribution using a sub-aperture collector and a fluorescent screen. A path to meet requirements for production scanners planned well into the next decade is also presented.

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