KEYWORDS: Amplifiers, Semiconducting wafers, Data conversion, Distortion, Electron beam direct write lithography, Optical alignment, Control systems, Electrons, Data processing, Process control
We have developed a Character Projection (CP)-type, low-energy Electron-Beam Direct Writing (EBDW) system for a
quick turnaround time and mask-less device fabrication of small production lots with a variety of designs. The exposure
time has been decreasing because the irradiation time of electrons is being reduced by development of high-sensitivity
resist and by decrease in the number of EB shots with the CP method, and the amplifiers of the deflectors have attained
specifications required by EBIS. In order to further increase the throughput, overhead time, that is, the exposure waiting
time, must be shortened. This paper describes our strategy for reducing the exposure waiting time. The reduction ratio of
the exposure waiting time was about 60% and the throughput was increased about 20%.
KEYWORDS: Virtual colonoscopy, Optical alignment, Signal detection, Silicon, Metals, Image analysis, Overlay metrology, Lithography, Distortion, Back end of line
We have developed the EBIS (Electron Beam Integrated System), which is a character projection (CP) type low-energy electron-beam direct writing (LEBDW) system. In this system, the proximity effect due to backscattering electrons is very small under the condition that the energy of primary electron is 5 keV. However, there is a serious problem, in that the signal of the mark buried under a thick insulator couldn't be detected. To overcome this problem, we adopted a mark detection method using Voltage Contrast (VC) image with negative charge on the sample surface.
So far, we have detected the signal of alignment mark buried under 600nm-thick (nmt) tri-layer resist using VC image on EBIS. Then we exposed overlay patterns with alignment using the mark detection with VC image. The mark image is very clear with a sufficiently high contrast. The asymmetry originating from VC is mitigated by means of FB scanning. Using this VC mark detection method, EB drawing was performed with alignment with 600nmt tri-layer resist on Si substrate. Moreover, VC mark detection with 600nmt tri-layer resist on the substrates of back-end-of-line (BEOL) of logic device was performed and the mark images with sufficient contrast were obtained. Although the characteristic distortion of VC image exists, mark detection is possible by using X/Y separate scanning, which consists of X-direction scanning to get an X position and Y-direction scanning to get a Y position in non-charged area.
KEYWORDS: Semiconducting wafers, Electron beam direct write lithography, Control systems, Electron beams, Vestigial sideband modulation, Data conversion, Beam shaping, Photomasks, Optical alignment, Amplifiers
A character projection (CP)-type, low energy, electron beam direct writing (EBDW) system, for quick-turn-around-time and mask-less device fabrications of small production lots featuring a variety of designs has been developed. This system, named the EBIS (Electron Beam Integrated System), can satisfy a set of requirements for EBDWs, including higher throughput and mask-less exposure. A standardized CP aperture method that enables reduction in the number of EB shots without frequent aperture making has been applied as a means for attaining effective CP and mask-less fabrication. This breakthrough was able to be realized only by using low energy EB with the advantage of the free proximity effect. To resolve critical low energy EB issues, a compact EB column, equipped with monolithic deflectors and lenses for restricting beam blur caused by Coulomb interaction, was developed and put to use. Sufficient resolution, corresponding to 100 nm L/S patterns, was attained by using a thin-layered resist process. As the mark detection method, voltage contrast imaging using a micro channel plate was used. This method made it possible to detect buried marks when using low energy EB. The authors are currently verifying the basic performance of this EBIS. This paper outlines and discusses geometrical details and performance data of this system.
KEYWORDS: Sensors, Digital signal processing, Signal processing, Microscopes, Scanning electron microscopy, Electron microscopes, Digital filtering, CRTs, Video, Image sensors
This paper proposes a new approach to reducing an effect of floor vibration on an image of a scanning electron microscope. An image-shifting coil is used to move the electron probe in order to cancel undesirable motion of a specimen due to the floor vibration. The floor vibration is structurally transmitted through the microscope and detected by two acceleration sensors at the root of the specimen chamber of the microscope. The outputs of the acceleration sensors are fed forward into a controller to move the electron probe by the image-shifting coil. The feed-forward controllers are designed in two ways. The first one is based on a transfer function from the sensor outputs to the relative displacement of a specimen to the electron probe being at rest. The microscope is put on a table attached to a shaker. Sinusoidal excitation tests are done many times to estimate the transfer functions from vibrating images of a micro scale. Moreover, the second controller is designed by manually amplifying and delaying the sensor outputs so as to minimize amplitude of the vibrating images on a CRT. Those two controllers are implemented as a digital filter running on a digital signal processor.
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