Dr. Martin Samayoa Profile

Dr. Martin Samayoa

at Samsung Austin Semiconductor

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Author

Publications (5)

Proceedings Article | 3 October 2018 Presentation + Paper

Advancements in pellicle glue residue removal

Davide Dattilo, Sebastian Dietze, Martin Samayoa, Uwe Dietze, Victoria Dahl, Zhenxing Han

Proceedings Volume 10810, 108100R (2018) https://doi.org/10.1117/12.2503937

KEYWORDS: Pellicles, Inspection, Scanning probe microscopy, Photomasks, Optical inspection, Reticles, Chemistry, Visualization, Polymers, Particles

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Proceedings Article | 20 October 2016 Paper

Towards expanding megasonic cleaning capability

Zhenxing Han, Berthold Ferstl, Günter Oetter, Uwe Dietze, Martin Samayoa, Davide Dattilo

Proceedings Volume 10032, 1003207 (2016) https://doi.org/10.1117/12.2248594

KEYWORDS: Particles, Cavitation, Acoustics, Acoustic cavitation, Photomasks, Photons, Chemistry, Transducers, Extreme ultraviolet, Sonoluminescence

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Proceedings Article | 4 October 2016 Paper

Megasonic cleaning strategy for sub-10nm photomasks

Jyh-Wei Hsu, Martin Samayoa, Peter Dress, Uwe Dietze, Ai-Jay Ma, Chia-Shih Lin, Rick Lai, Peter Chang, Laurent Tuo

Proceedings Volume 9985, 998515 (2016) https://doi.org/10.1117/12.2241143

KEYWORDS: SRAF, Photomasks, Cavitation, Particles, Inspection, Glasses, Plasma, Mask cleaning, Acoustics, Oxygen

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Proceedings Article | 19 March 2015 Paper

Potential application of tip-enhanced Raman spectroscopy (TERS) in semiconductor manufacturing

P. Hung, Thomas O'Loughlin, Aaron Lewis, Rimma Dechter, Martin Samayoa, Sarbajit Banerjee, Erin Wood, Angela R. Hight Walker

Proceedings Volume 9424, 94241S (2015) https://doi.org/10.1117/12.2175623

KEYWORDS: Raman spectroscopy, Gold, Silicon, Scanning electron microscopy, Metrology, Transmission electron microscopy, Etching, Atomic force microscopy, Particles, Spatial resolution

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Proceedings Article | 17 April 2014 Paper

Particle control challenges in process chemicals and ultra-pure water for sub-10nm technology nodes

Abbas Rastegar, Martin Samayoa, Matthew House, Hüseyin Kurtuldu, Sang-Kee Eah, Lauren Morse, Jenah Harris-Jones

Proceedings Volume 9048, 90480P (2014) https://doi.org/10.1117/12.2048080

KEYWORDS: Particles, Atmospheric particles, Silica, Extreme ultraviolet, Semiconducting wafers, Transmission electron microscopy, Photomasks, Aerosols, Ions, Neodymium

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