Mr. Scott Goad Profile

Scott Goad

Process Engineer at Advanced Micro Devices Inc

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Author

Publications (6)

Proceedings Article | 13 March 2009 Paper

Computational requirements for OPC

Chris Spence, Scott Goad

Proceedings Volume 7275, 72750U (2009) https://doi.org/10.1117/12.813522

KEYWORDS: Optical proximity correction, Photomasks, Computer simulations, Etching, Resolution enhancement technologies, Lithography, Statistical modeling, SRAF, Computer hardware, Optical lithography

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Proceedings Article | 17 October 2008 Paper

Technology interactions on reticle delivery

Paul Ackmann, Scott Goad, Craig West

Proceedings Volume 7122, 712234 (2008) https://doi.org/10.1117/12.801239

KEYWORDS: Reticles, Optical proximity correction, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Lithography, Modulation, Logic, Calibration, Product engineering

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Proceedings Article | 17 October 2008 Paper

Compute resource management and turn around time control in mask data prep

Travis Lewis, Scott Goad, Kenneth Jantzen, Ahmed Nouh, Minyoung Park, Emile Sahouria, Steffen Schulze

Proceedings Volume 7122, 71222O (2008) https://doi.org/10.1117/12.801544

KEYWORDS: Databases, Optical proximity correction, Data centers, Metals, Photomasks, Control systems, Data processing, Resolution enhancement technologies, Optical components, Optical resolution

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Proceedings Article | 16 November 2007 Paper

Reduction of layout complexity for shorter mask write-time

Sean Hannon, Travis Lewis, Scott Goad, Kenneth Jantzen, Jianlin Wang, Hien Vu, Emile Sahouria, Steffen Schulze

Proceedings Volume 6730, 67303K (2007) https://doi.org/10.1117/12.746986

KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Reticles, Manufacturing, Optical alignment, Tolerancing, Lithography, Data processing, Semiconducting wafers

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Proceedings Article | 21 June 2006 Paper

Mask data volume: historical perspective and future requirements

Chris Spence, Scott Goad, Peter Buck, Richard Gladhill, Russell Cinque, Jürgen Preuninger, Üwe Griesinger, Martin Blöcker

Proceedings Volume 6281, 62810H (2006) https://doi.org/10.1117/12.692639

KEYWORDS: Optical proximity correction, Photomasks, Vestigial sideband modulation, Logic, SRAF, Reticles, Resolution enhancement technologies, Manufacturing, Metals, Data storage

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Proceedings Article | 5 November 2005 Paper

Mask data volume: explosion or damp squib?

Chris Spence, Scott Goad, Peter Buck, Richard Gladhill, Russell Cinque

Proceedings Volume 5992, 599211 (2005) https://doi.org/10.1117/12.629369

KEYWORDS: Photomasks, Optical proximity correction, Vestigial sideband modulation, Resolution enhancement technologies, SRAF, Metals, Manufacturing, Logic, Reticles, Data storage

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Showing 5 of 6 publications

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