Mr. Se-Jin Park Profile

Se-Jin Park

Manager at Semiconductor Manufacturing International Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 25 September 2010 Paper

An optimized OPC and MDP flow for reducing mask write time and mask cost

Ellyn Yang, Cheng He Li, Se Jin Park, Yu Zhu, Eric Guo

Proceedings Volume 7823, 78233E (2010) https://doi.org/10.1117/12.864790

KEYWORDS: Optical proximity correction, Photomasks, Logic, Metals, Resolution enhancement technologies, Model-based design, Semiconducting wafers, Optical lithography, Databases, Logic devices

Read Abstract +

Proceedings Article | 7 March 2008 Paper

OPC optimization for double dipole lithography and its application on 45nm node with dry exposure

Se-Jin Park, Jae-Kyung Seo, ChengHe Li, Daisy Liu, Petros An, Xiao-Hui Kang, Eric Guo

Proceedings Volume 6924, 69243O (2008) https://doi.org/10.1117/12.773290

KEYWORDS: SRAF, Photomasks, Optical proximity correction, Lithography, Semiconducting wafers, Phase shifts, Lithographic illumination, Metals, Scanners, Logic

Read Abstract +

Proceedings Article | 20 May 2006 Paper

A study for effect of rounded contact hole pattern by laser mask writing machine onto wafer process margin

Se-Jin Park, Kyung-Hee Yoon, Jae-Hyun Kang, Jae-Young Choi, Yong-Suk Lee, Keeho Kim

Proceedings Volume 6283, 62831K (2006) https://doi.org/10.1117/12.681745

KEYWORDS: Photomasks, Semiconducting wafers, Deep ultraviolet, Lithography, Laser systems engineering, Electron beam lithography, Critical dimension metrology, Scanners, Back end of line, Data modeling

Read Abstract +

Proceedings Article | 21 March 2006 Paper

Methodology to set up mask CD specification including MEEF and process sensitivity of mask CD error

Yeon-Ah Shim, Se-Jin Park, Ju-Hyun Kim, Jea-Hee Kim, Kee-Ho Kim

Proceedings Volume 6154, 61544B (2006) https://doi.org/10.1117/12.657081

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Lithography, Electroluminescence, Process control, Optical lithography, Reticles, Cadmium

Read Abstract +

Proceedings Article | 20 March 2006 Paper

Mask process variation induced OPC accuracy in sub-90nm technology node

Se-Jin Park, Yeon-Ah Shim, Jae-Hyun Kang, Jae-Young Choi, Kyung-Hee Yoon, Yong-Suk Lee, Keeho Kim

Proceedings Volume 6154, 61543K (2006) https://doi.org/10.1117/12.657036

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Electroluminescence, Critical dimension metrology, Lithography, Data modeling, Error analysis, Logic, Etching

Read Abstract +

Proceedings Article | 2 June 2003 Paper

CMP and self-shadowing effect of overlay mark in metal sputtering process

Se-Jin Park, Hong-Rae Kim, Yong-Suk Lee, Won-Sik Yang

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483660

KEYWORDS: Metals, Semiconducting wafers, Chemical mechanical planarization, Overlay metrology, Etching, Sputter deposition, Polishing, Signal detection, Oxides, Electronics

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years