Mr. Toshikazu Umatate Profile

Toshikazu Umatate

Operating Officer/General Manager at Nikon Corp

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 28 May 2004 Paper

New advanced lithography tools with mix-and-match strategy

Jun Ishikawa, Masahiro Nei, Masato Hamatani, Shinji Wakamoto, Toshikazu Umatate

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537214

KEYWORDS: Lithography, Scanners, Distortion, Semiconducting wafers, Systems engineering, Reticles, Projection systems, Wavefront aberrations, Semiconductors, Wavefronts

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Photomask repeater strategy for high-quality and low-cost reticle fabrication

Suigen Kyoh, Soichi Inoue, Osamu Ikenaga, Tomotaka Higaki, Fumiaki Shigemitsu, Ichiro Mori, Haruo Kokubo, Naoya Hayashi, Nobuyuki Irie, Yuki Ishii, Toshikazu Umatate

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504178

KEYWORDS: Photomasks, Reticles, Mask making, Deep ultraviolet, Optical lithography, Semiconductors, Printing, Manufacturing, Lithography, Critical dimension metrology

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Improvement of photomask repeater for 130-nm lithography

Suigen Kyoh, Soichi Inoue, Ichiro Mori, Nobuyuki Irie, Yuuki Ishii, Toshikazu Umatate, Haruo Kokubo, Naoya Hayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438376

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Error analysis, Semiconducting wafers, Metals, Optical proximity correction, Printing, Inspection, Measurement devices

Read Abstract +

Proceedings Article | 22 January 2001 Paper

New concept photomask repeater with stitching exposure technique

Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate, Suigen Kyoh, Shun-Ichiro Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410713

KEYWORDS: Reticles, Photomasks, Manufacturing, Critical dimension metrology, System on a chip, Optical lithography, Terbium, Optical alignment, Semiconducting wafers, Optical proximity correction

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Management of pattern generation system based on i-line stepper

Suigen Kyoh, Satoshi Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410728

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Semiconducting wafers, Opacity, Optical proximity correction, Optical lithography, Error analysis, Inspection, Chromium

Read Abstract +

Proceedings Article | 19 July 2000 Paper

New-concept i-line stepper for mask fabrication

Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate, Suigen Kyoh, Satoshi Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392077

KEYWORDS: Reticles, Photomasks, Critical dimension metrology, Manufacturing, System on a chip, Optical proximity correction, Mask making, Semiconducting wafers, Digital signal processing, Fabrication

Read Abstract +

Proceedings Article | 19 July 2000 Paper

New photomask pattern generation method based on i-line stepper

Suigen Kyoh, Shun-Ichiro Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392096

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Critical dimension metrology, System on a chip, Lithography, Printing, Kinematics, Scanning electron microscopy, Process engineering

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years