Mr. Shinji Wakamoto Profile

Shinji Wakamoto

Manager at Nikon Precision Inc.

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 18 March 2015 Paper

Total lithography system based on a new application software platform enabling smart scanner management

Hirotaka Kono, Kazuo Masaki, Tomoyuki Matsuyama, Shinji Wakamoto, Seemoon Park, Taro Sugihara, Yuichi Shibazaki

Proceedings Volume 9426, 942619 (2015) https://doi.org/10.1117/12.2085689

KEYWORDS: Scanners, Metrology, Semiconducting wafers, Lithography, Calibration, Overlay metrology, Atrial fibrillation, Feedback loops, Yield improvement, Time metrology

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Proceedings Article | 31 March 2014 Paper

Immersion lithography extension to sub-10nm nodes with multiple patterning

Soichi Owa, Shinji Wakamoto, Masayuki Murayama, Hidetami Yaegashi, Kenichi Oyama

Proceedings Volume 9052, 90520O (2014) https://doi.org/10.1117/12.2046604

KEYWORDS: Optical lithography, Transistors, Immersion lithography, Metals, Reactive ion etching, Line edge roughness, Logic, Semiconductors, Etching, Photoresist processing

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Proceedings Article | 12 April 2013 Paper

Mix-and-match overlay performance of the NSR-S622D immersion scanner

Katsushi Makino, Takahisa Kikuchi, Satoru Sasamoto, Park Hongki, Akiko Mori, Nobuyuki Takahashi, Shinji Wakamoto

Proceedings Volume 8683, 86830Q (2013) https://doi.org/10.1117/12.2010875

KEYWORDS: Distortion, Semiconducting wafers, Source mask optimization, Reticles, Overlay metrology, Scanners, Metrology, Lithography, Optical alignment, Motion models

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Proceedings Article | 23 March 2011 Paper

Stability and calibration of overlay and focus control for a double patterning immersion scanner

Masahiko Yasuda, Shinji Wakamoto, Hiroto Imagawa, Shinya Takubo, Yuuji Shiba, Takahisa Kikuchi, Yosuke Shirata, Yuuki Ishii

Proceedings Volume 7973, 79730Z (2011) https://doi.org/10.1117/12.879291

KEYWORDS: Calibration, Computer programming, Metrology, Interferometers, Distortion, Semiconducting wafers, Double patterning technology, Overlay metrology, Control systems, Scanners

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Proceedings Article | 10 March 2010 Paper

Actual performance data analysis of overlay, focus, and dose control of an immersion scanner for double patterning

Shinji Wakamoto, Yuho Kanaya, Junichi Kosugi, Noriaki Kasai, Hisashi Nishinaga, Kenichi Shiraishi, Yosuke Shirata, Yuuki Ishii

Proceedings Volume 7640, 76400A (2010) https://doi.org/10.1117/12.846341

KEYWORDS: Semiconducting wafers, Double patterning technology, Computer programming, Sensors, Interferometers, Servomechanisms, Metrology, Artificial intelligence, Reticles, Overlay metrology

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Proceedings Article | 16 March 2009 Paper

Achieving overlay budgets for double patterning

Andrew Hazelton, Nobutaka Magome, Shinji Wakamoto, Akira Tokui, Céline Lapeyre, Sébastien Barnola, Guillaume Jullien, Vincent Salvetat

Proceedings Volume 7274, 72740X (2009) https://doi.org/10.1117/12.813599

KEYWORDS: Double patterning technology, Optical alignment, Semiconducting wafers, Optical lithography, Distortion, Etching, Overlay metrology, Lithography, Reticles, Logic

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SPIE Journal Paper | 1 January 2009

Double-patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

JM3, Vol. 8, Issue 01, 011003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3023077

KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

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Proceedings Article | 26 March 2008 Paper

A system to optimize mix-and-match overlay in lithography

Shinji Wakamoto, Yuuki Ishii, Koji Yasukawa, Shinroku Maejima, Atsuhiko Kato, John Robinson, Dong-Sub Choi

Proceedings Volume 6922, 69222V (2008) https://doi.org/10.1117/12.771778

KEYWORDS: Scanners, Distortion, Semiconducting wafers, Databases, Reticles, Lithography, Phase modulation, Overlay metrology, Distributed interactive simulations, Factor analysis

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Proceedings Article | 7 March 2008 Paper

Recent performance results of Nikon immersion lithography tools

Andrew Hazelton, Kenichi Shiraishi, Shinji Wakamoto, Yuuki Ishii, Masahiko Okumura, Nobutaka Magome, Hiroyuki Suzuki

Proceedings Volume 6924, 69241N (2008) https://doi.org/10.1117/12.771823

KEYWORDS: Semiconducting wafers, Calibration, Immersion lithography, Sensors, Scanners, Critical dimension metrology, Lens design, Manufacturing, Imaging systems, Control systems

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Proceedings Article | 7 March 2008 Paper

Double patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

Proceedings Volume 6924, 69240R (2008) https://doi.org/10.1117/12.771914

KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Semiconducting wafers, Lithography, Image processing, Photoresist processing, Optical lithography, Deposition processes

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Proceedings Article | 5 April 2007 Paper

Improved overlay control through automated high order compensation

S. Wakamoto, Y. Ishii, K. Yasukawa, A. Sukegawa, S. Maejima, A. Kato, J. Robinson, B. Eichelberger, P. Izikson, M. Adel

Proceedings Volume 6518, 65180J (2007) https://doi.org/10.1117/12.712710

KEYWORDS: Scanners, Distortion, Databases, Semiconducting wafers, Overlay metrology, Reticles, Control systems, Optical alignment, Lithography, Error analysis

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Proceedings Article | 24 March 2006 Paper

Overlay improvement by using new framework of grid compensation for matching

Ayako Sukegawa, Shinji Wakamoto, Shinichi Nakajima, Masaharu Kawakubo, Nobutaka Magome

Proceedings Volume 6152, 61523A (2006) https://doi.org/10.1117/12.656876

KEYWORDS: Semiconducting wafers, Overlay metrology, Distortion, Optical alignment, Lithography, Data processing, Semiconductor manufacturing, Thermal effects, Control systems, Data modeling

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Proceedings Article | 28 May 2004 Paper

New advanced lithography tools with mix-and-match strategy

Jun Ishikawa, Masahiro Nei, Masato Hamatani, Shinji Wakamoto, Toshikazu Umatate

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537214

KEYWORDS: Lithography, Scanners, Distortion, Semiconducting wafers, Systems engineering, Reticles, Projection systems, Wavefront aberrations, Semiconductors, Wavefronts

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Proceedings Article | 7 June 1996 Paper

KrF step-and-scan exposure system using higher-NA projection lens

Kazuaki Suzuki, Shinji Wakamoto, Kenji Nishi

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240938

KEYWORDS: Semiconducting wafers, Reticles, Interferometers, Optical alignment, Excimer lasers, Distortion, Tolerancing, Optical scanning systems, Control systems, Error control coding

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Showing 5 of 14 publications

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