Mr. William A. Stanton Profile

William A. Stanton

Sr. R&D Manager

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Author

Publications (8)

Proceedings Article | 26 May 2022 Presentation + Paper

Mask synthesis for silicon photonics devices

Rainer Zimmermann, Luis Orbe, Bernd Küchler, Ji Li, Jim Burdorf, William Stanton, Tung-Yu Su, Remco Stoffer, Ulrich Klostermann, Wolfgang Demmerle

Proceedings Volume 12148, 1214809 (2022) https://doi.org/10.1117/12.2620724

KEYWORDS: Optical proximity correction, Photomasks, Waveguides, Photonic devices, Lithography, Line edge roughness, Stochastic processes, Photonics, Signal to noise ratio

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Proceedings Article | 31 March 2014 Paper

Applying ILT mask synthesis for co-optimizing design rules and DSA process characteristics

Thuc Dam, William Stanton

Proceedings Volume 9052, 90521B (2014) https://doi.org/10.1117/12.2046370

KEYWORDS: Photomasks, Lithography, Source mask optimization, Photovoltaics, Calibration, Lens design, Process modeling, Performance modeling, Neck, Directed self assembly

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Proceedings Article | 18 April 2013 Paper

Design-based metrology for development and manufacturing applications

Peter Brooker, Michael Lee, Ezequiel Vidal Russel, Shimon Levi, Sylvain Berthiaume, William Stanton, Travis Brist

Proceedings Volume 8681, 868123 (2013) https://doi.org/10.1117/12.2014182

KEYWORDS: Scanning electron microscopy, Metrology, Manufacturing, Optical proximity correction, Semiconducting wafers, Data modeling, Reticles, Feature extraction, Dysprosium, Data analysis

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Proceedings Article | 5 April 2012 Paper

Automated SEM recipe generation for OPC applications

Sylvain Berthiaume, Travis Brist, Peter Brooker, William Stanton, Brian Ward, Shimon Levi, Amit Siany

Proceedings Volume 8324, 83241W (2012) https://doi.org/10.1117/12.918083

KEYWORDS: Scanning electron microscopy, Metrology, Data modeling, Optical proximity correction, Electronic design automation, Semiconducting wafers, Manufacturing, Computer aided design, Photomasks, Critical dimension metrology

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Proceedings Article | 15 March 2012 Paper

Computational lithography work flows and design rule exploration automation

S. Sethi, William Stanton, Kevin Lucas, Jay Hiserote, Duck-Hyung Hur, Rooli Choi

Proceedings Volume 8327, 83270O (2012) https://doi.org/10.1117/12.918057

KEYWORDS: Source mask optimization, Optical proximity correction, Optimization (mathematics), Computational lithography, Resolution enhancement technologies, Atrial fibrillation, Lithography, Computing systems, Manufacturing, Process engineering

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Proceedings Article | 25 September 2010 Paper

Simultaneous source-mask optimization: a numerical combining method

Thomas Mülders, Vitaliy Domnenko, Bernd Küchler, Thomas Klimpel, Hans-Jürgen Stock, Amyn Poonawala, Kunal Taravade, William Stanton

Proceedings Volume 7823, 78233X (2010) https://doi.org/10.1117/12.865965

KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Electroluminescence, Image processing, Lithography, Semiconducting wafers, Cadmium sulfide, Optimization (mathematics), Manufacturing

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Proceedings Article | 4 March 2010 Paper

Source mask optimization for advanced lithography nodes

Amyn Poonawala, William Stanton, Chander Sawh

Proceedings Volume 7640, 76401M (2010) https://doi.org/10.1117/12.846783

KEYWORDS: Source mask optimization, Photomasks, Atrial fibrillation, Lithography, Optical proximity correction, Calibration, Statistical analysis, Semiconducting wafers, Mathematical modeling, 193nm lithography

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Proceedings Article | 11 March 2002 Paper

ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Jerry Chen, John Riddick, Matt Lamantia, Azeddine Zerrade, Robert Henderson, Greg Hughes, Cyrus Tabery, Khoi Phan, Chris Spence, Amy Winder, William Stanton, Eugene Delarosa, John Maltabes, Cecilia Philbin, Lloyd Litt, Anthony Vacca, Scott Pomeroy

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458362

KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Scanning electron microscopy, Etching, Atomic force microscopy, Ions, Reticles, Inspection, Critical dimension metrology

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Showing 5 of 8 publications

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