Dr. Yuan He Profile

Dr. Yuan He

at Siemens EDA

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 10 December 2024 Paper

Investigation of mask thickness effects and their significance for the 28nm node and beyond

Hong Chen, Lijie Wei, Han Bao, Zhong Shu, Yuan He

Proceedings Volume 13423, 134231D (2024) https://doi.org/10.1117/12.3053135

KEYWORDS: 3D mask effects, Simulations, Calibration, Near field, Modeling, Lithography, Optical proximity correction, Finite-difference time-domain method

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SPIE Journal Paper | 11 September 2015

Directed self-assembly graphoepitaxy template generation with immersion lithography

Yuansheng Ma, Junjiang Lei, J. Andres-Torres, Le Hong, James Word, Germain Fenger, Alexander Tritchkov, George Lippincott, Rachit Gupta, Neal Lafferty, Yuan He, Joost Bekaert, Geert Vanderberghe

JM3, Vol. 14, Issue 03, 031216, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031216

KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

Yuansheng Ma, Junjiang Lei, J. Torres, Le Hong, James Word, Germain Fenger, Alexander Tritchkov, George Lippincott, Rachit Gupta, Neal Lafferty, Yuan He, Joost Bekaert, Geert Vanderberghe

Proceedings Volume 9423, 942306 (2015) https://doi.org/10.1117/12.2085850

KEYWORDS: Photomasks, Optical proximity correction, Printing, Source mask optimization, Optical lithography, Neodymium, Visualization, Transmission electron microscopy, Dysprosium, Directed self assembly

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Proceedings Article | 18 March 2015 Paper

RET selection on state-of-the-art NAND flash

Neal Lafferty, Yuan He, Jinhua Pei, Feng Shao, QingWei Liu, Xuelong Shi

Proceedings Volume 9426, 94260L (2015) https://doi.org/10.1117/12.2087176

KEYWORDS: Source mask optimization, Resolution enhancement technologies, Photomasks, Lithography, Optical proximity correction, Nanoimprint lithography, SRAF, Optical lithography, Photovoltaics, Visualization

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Proceedings Article | 29 October 2014 Paper

Full-flow RET creation, comparison, and selection

Neal Lafferty, Yuan He, Mikhail Silakov, Toshi Endo, Kostas Adam

Proceedings Volume 9235, 92351Z (2014) https://doi.org/10.1117/12.2069473

KEYWORDS: Resolution enhancement technologies, Source mask optimization, Photomasks, Optical lithography, Lithography, Optical proximity correction, Photovoltaics, Nanoimprint lithography, Visualization, Performance modeling

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Proceedings Article | 12 April 2013 Paper

A study on the automation of scanner matching

Yuan He, Alexander Serebryakov, Scott Light, Vivek Jain, Erik Byers, Ronald Goossens, Zhi-Yuan Niu, Peter Engblom, Scott Larson, Bernd Geh, Craig Hickman, Hoyoung Kang

Proceedings Volume 8683, 86830W (2013) https://doi.org/10.1117/12.2014402

KEYWORDS: Scanners, Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Optical lithography, Metrology, Cadmium, Optics manufacturing, Databases, Diffractive optical elements

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Proceedings Article | 20 April 2011 Paper

Wafer quality analysis of various scribe line mark designs

Jianming Zhou, Craig Hickman, Yuan He, Scott Light, Lucas Lamonds, Anton deVilliers

Proceedings Volume 7971, 79711H (2011) https://doi.org/10.1117/12.881551

KEYWORDS: Semiconducting wafers, Spatial light modulators, Optical alignment, Diffraction, Scanners, Reflection, Signal detection, Manufacturing, Thin films, Sensors

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Proceedings Article | 4 March 2010 Paper

Improving aberration control with application specific optimization using computational lithography

Jianming Zhou, Youping Zhang, Peter Engblom, Mike Hyatt, Eric Wu, Martin Snajdr, Anton deVilliers, Yuan He, Craig Hickman, Peng Liu, Dennis de Lang, Bernd Geh, Erik Byers, Scott Light

Proceedings Volume 7640, 76400K (2010) https://doi.org/10.1117/12.846697

KEYWORDS: Semiconducting wafers, Scanners, Computational lithography, Optimization (mathematics), Calibration, Finite element methods, Thermal modeling, Computer simulations, Data modeling, Critical dimension metrology

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Proceedings Article | 4 March 2010 Paper

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Yuan He, Erik Byers, Scott Light, Danielle Hines, Anton Devilliers, Mike Hyatt, Jianming Zhou, Vinay Nair, Zongchang Yu, Yu Cao, Xu Xie, Wenjin Shao, Rafael Aldana, Ronald Goossens, Chang-Qun Ma, Junwei Lu, Hua-yu Liu, Chris Aquino, Peter Engblom, Tjitte Nooitgedagt, Eric Janda

Proceedings Volume 7640, 764014 (2010) https://doi.org/10.1117/12.848255

KEYWORDS: Scanners, Wafer-level optics, Semiconducting wafers, Metrology, Data modeling, Calibration, Critical dimension metrology, Optics manufacturing, Performance modeling, Optical simulations

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Proceedings Article | 16 March 2009 Paper

Process transfer strategies between ASML immersion scanners

Yuan He, Peter Engblom, Jianming Zhou, Eric Janda, Anton Devilliers, Bernd Geh, Erik Byers, Jasper Menger, Steve Hansen, Mircea Dusa

Proceedings Volume 7274, 72742P (2009) https://doi.org/10.1117/12.816417

KEYWORDS: Scanners, Printing, Semiconducting wafers, Reticles, Calibration, Metrology, Scatterometry, Data modeling, Cadmium, Scanning electron microscopy

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Showing 5 of 10 publications

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