Dr. Changhoon Choi Profile

Dr. Changhoon Choi

at SAMSUNG Electronics Co., Ltd.

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 13 June 2022 Presentation

Automatic beam optimization technique based on beam profile deconvolution for scanning electron microscopy

Yunje Cho, Subong Shon, Yeny Yim, Changhoon Choi, Myungjun Lee

Proceedings Volume PC12053, PC120530B (2022) https://doi.org/10.1117/12.2612446

KEYWORDS: Scanning electron microscopy, Deconvolution, Monochromatic aberrations, Image processing, Resolution enhancement technologies, Mathematics, Image resolution, Image quality, Image enhancement, Distortion

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Proceedings Article | 13 June 2022 Presentation

Interferometric ellipsometry for massive angular spectra to overcome sensitivity limitation in device metrology

Jaehwang Jung, Jinseob Kim, Jinyong Kim, Seungwoo Lee, Seoyeon Jeong, Inho Shin, Wookrae Kim, Changhoon Choi, Myungjun Lee

Proceedings Volume 12053, 120530R (2022) https://doi.org/10.1117/12.2607442

KEYWORDS: Ellipsometry, Metrology, Interferometry, Semiconducting wafers, Wafer-level optics, Spectroscopic ellipsometry, Silica, Optical metrology, Microscopy, Mathematical modeling

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SPIE Journal Paper | 20 April 2022 Open Access

Toward realization of high-throughput hyperspectral imaging technique for semiconductor device metrology

Changhyeong Yoon, Gwangsik Park, Daehoon Han, Sang-il Im, Sungmin Jo, Jinseob Kim, Wookrae Kim, Changhoon Choi, Myungjun Lee

JM3, Vol. 21, Issue 02, 021209, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021209

KEYWORDS: Semiconducting wafers, Cameras, Critical dimension metrology, Semiconductors, Spectral resolution, Spatial resolution, Hyperspectral imaging, Imaging systems, Metrology, Wafer-level optics

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Proceedings Article | 17 March 2021 Presentation + Paper

Machine learning aided process control: critical dimension uniformity control of etching process in 1z nm DRAM

Taeyong Jo, Insoo Choi, Doocheol Choi, Yoonsung Bae, Seunggun Byoun, Inho Kim, Sukwon Lee, Changhoon Choi, Euiseok Kum, Youngil Kang, Taejoong Kim, Youngjoo Lee

Proceedings Volume 11611, 116111L (2021) https://doi.org/10.1117/12.2583473

KEYWORDS: Process control, Etching, Machine learning, Semiconductors, Cadmium, Temperature metrology, Semiconducting wafers, Neural networks, Metrology, Artificial neural networks

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