Mr. Aksel Göhnermeier Profile

Aksel Göhnermeier

at Carl Zeiss SMT AG

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 1 October 2009

Imaging budgets for extreme ultraviolet optics: ready for 22-nm node and beyond

Marc Bienert, Aksel Göhnermeier, Oliver Natt, Martin Lowisch, Paul Gräupner, Tilmann Heil, Reiner Garreis, Koen van Ingen Schenau, Steven Hansen

JM3, Vol. 8, Issue 04, 041509, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238543

KEYWORDS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction

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Proceedings Article | 18 March 2009 Paper

Imaging budgets for EUV optics: ready for 22-nm node and beyond

Marc Bienert, Aksel Göhnemeier, Oliver Natt, Martin Lowisch, Paul Gräupner, Tilmann Heil, Reiner Garreis, Koen van Ingen Schenau, Steve Hansen

Proceedings Volume 7271, 72711B (2009) https://doi.org/10.1117/12.814185

KEYWORDS: Extreme ultraviolet, EUV optics, Nanoimprint lithography, Fiber optic illuminators, Critical dimension metrology, Optics manufacturing, Lithography, Optical proximity correction, Image processing, Solids

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Proceedings Article | 27 March 2007 Paper

Modeling polarization for hyper-NA lithography tools and masks

Kafai Lai, Alan Rosenbluth, Geng Han, Jaione Tirapu-Azpiroz, Jason Meiring, Aksel Goehnermeier, Bernhard Kneer, Michael Totzeck, Laurens de Winter, Wim de Boeij, Mark van de Kerkhof

Proceedings Volume 6520, 65200D (2007) https://doi.org/10.1117/12.712272

KEYWORDS: Polarization, Photomasks, Lithography, Optical proximity correction, Diffraction, Birefringence, Pellicles, Critical dimension metrology, Optical lithography, Thin films

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SPIE Journal Paper | 1 July 2005

Polarization influence on imaging

Michael Totzeck, Paul Gräupner, Tilmann Heil, Aksel Göhnermeier, Olaf Dittmann, Daniel Kraehmer, Vladimir Kamenov, Johannes Ruoff, Donis Flagello

JM3, Vol. 4, Issue 03, 031108, (July 2005) https://doi.org/10.1117/12.10.1117/1.2049187

KEYWORDS: Polarization, Diffraction, Wavefronts, Imaging systems, Zernike polynomials, Superposition, Jones vectors, Radio propagation, Birefringence, Lithography

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Proceedings Article | 12 May 2005 Paper

How to describe polarization influence on imaging

M. Totzeck, P. Graupner, T. Heil, A. Gohnermeier, O. Dittmann, D. Krahmer, V. Kamenov, J. Ruoff, D. Flagello

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599908

KEYWORDS: Polarization, Diffraction, Wavefronts, Superposition, Imaging systems, Jones vectors, Zernike polynomials, Radio propagation, Wave propagation, Birefringence

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Proceedings Article | 26 June 2003 Paper

Impact of wavefront errors on low k1 processes at extremely high NA

Paul Graeupner, Reiner Garreis, Aksel Goehnermeier, Tilmann Heil, Martin Lowisch, Donis Flagello

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.482694

KEYWORDS: Monochromatic aberrations, Critical dimension metrology, Lithography, Wavefronts, Lawrencium, Spherical lenses, Wavefront aberrations, Zernike polynomials, Systems modeling, 193nm lithography

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Proceedings Article | 30 July 2002 Paper

Solutions for printing sub-100-nm contacts with ArF

Paul Graeupner, Aksel Goehnermeier, Martin Lowisch, Reiner Garreis, Donis Flagello, Steven Hansen, Robert Socha, Carsten Koehler

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474569

KEYWORDS: Photomasks, Printing, Nanoimprint lithography, Image processing, Lithography, Image filtering, Reticles, Binary data, Monochromatic aberrations, Electroluminescence

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Showing 5 of 7 publications

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