Prof. Robert L. Brainard
Professor at University at Albany
SPIE Involvement:
Conference Program Committee | Author
Publications (62)

Proceedings Article | 23 April 2024 Presentation + Paper
Proceedings Volume 12957, 1295709 (2024) https://doi.org/10.1117/12.3010930
KEYWORDS: Annealing, Photoresist processing, Coating, Viscosity, Solids, Polymers, Film thickness, Thin film coatings, Stochastic processes, Photoresist materials

Proceedings Article | 30 April 2023 Poster
Proceedings Volume 12498, 124981X (2023) https://doi.org/10.1117/12.2659165
KEYWORDS: Polymers

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12498, 124980V (2023) https://doi.org/10.1117/12.2659167
KEYWORDS: Switching, Polymers, Molecules

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proceedings Volume 11612, 1161210 (2021) https://doi.org/10.1117/12.2583013
KEYWORDS: Photoresist materials, Ions, Polymers, Lithography, Extreme ultraviolet lithography, Deep ultraviolet, Amplifiers

Proceedings Article | 24 March 2020 Presentation
Michael Murphy, James Passarelli, Maximilian Weires, Jodi Grzeskowiak, Robert Brainard
Proceedings Volume 11326, 1132605 (2020) https://doi.org/10.1117/12.2553529

Proceedings Article | 8 April 2019 Paper
Shaheen Hasan, Michael Murphy, Maximilian Weires, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard
Proceedings Volume 10960, 109601Q (2019) https://doi.org/10.1117/12.2516010
KEYWORDS: Antimony, Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Polymerization, Photoresist materials, Metals

Proceedings Article | 27 March 2019 Presentation + Paper
Michael Murphy, Shaheen Hasan, Steven Novak, Greg Denbeaux, Robert Brainard
Proceedings Volume 10960, 1096010 (2019) https://doi.org/10.1117/12.2516011
KEYWORDS: Antimony, Ions, Extreme ultraviolet lithography, Photoresist materials, Photoresist developing, Oxides, Extreme ultraviolet, Metals, Bismuth

Proceedings Article | 25 March 2019 Presentation
Steven Grzeskowiak, Robert Brainard, Gregory Denbeaux
Proceedings Volume 10960, 1096007 (2019) https://doi.org/10.1117/12.2515428
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Lithography, Diffusion, Chemical reactions, Ionization, Printing, Photons, Electron beam lithography

Proceedings Article | 25 March 2019 Open Access Presentation
Proceedings Volume 10960, 1096002 (2019) https://doi.org/10.1117/12.2516012
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Metals, Extreme ultraviolet, Chemical elements, Absorbance, Photons, Optical components

SPIE Journal Paper | 19 December 2018
Miles Wilklow-Marnell, David Moglia, Benjamin Steimle, Brian Cardineau, Hashim Al-Mashat, Peter Nastasi, Kara Heard, Amber Aslam, Rachel Kaminski, Michael Murphy, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber , Yasin Ekinci, Robert Brainard, Daniel Freedman
JM3, Vol. 17, Issue 04, 043507, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043507
KEYWORDS: Extreme ultraviolet, Cobalt, Extreme ultraviolet lithography, Chromium, Metals, Photolysis, Solids, Iron, Electrons, Carbon monoxide

SPIE Journal Paper | 23 July 2018
Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Amrit Narasimhan, Robert Brainard, Greg Denbeaux
JM3, Vol. 17, Issue 03, 033501, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.033501
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Molecules, Absorbance, Chemical reactions, Absorption, Spectroscopy, Electrodes

Proceedings Article | 28 March 2018 Paper
Jake Kaminsky, Steven Grzeskowiak, Sean Gibbons, Jonathan Chandonait, Ulrich Welling, Lawrence Melvin, Yudhishthir Kandel, Robert Brainard, Greg Denbeaux
Proceedings Volume 10586, 105861N (2018) https://doi.org/10.1117/12.2297386
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Ionizing radiation, Radiation effects, Electrons, Photons, Polymers, Extreme ultraviolet, Photoresist developing, Standards development

Proceedings Article | 27 March 2018 Paper
Proceedings Volume 10586, 105861P (2018) https://doi.org/10.1117/12.2316333
KEYWORDS: Tellurium, Antimony, Bismuth, Extreme ultraviolet lithography, Metals, Carbon monoxide, Extreme ultraviolet, Chromium, Semiconducting wafers, Photoresist materials

Proceedings Article | 27 March 2018 Paper
Proceedings Volume 10586, 1058608 (2018) https://doi.org/10.1117/12.2298418
KEYWORDS: Hydrogen, Extreme ultraviolet lithography, Photoresist materials, Antimony, Extreme ultraviolet, Semiconducting wafers, Spectroscopy, Carbon monoxide, Chromium, Molecules

Proceedings Article | 21 March 2018 Presentation + Paper
Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Michael Murphy, Jonathan Chandonait, Robert Brainard, Greg Denbeaux
Proceedings Volume 10586, 105860D (2018) https://doi.org/10.1117/12.2297692
KEYWORDS: Electrons, Polymers, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Absorbance, Absorption, Photoresist materials, Polymethylmethacrylate, Liquids

Proceedings Article | 18 April 2017 Presentation + Paper
William Earley, Deanna Soucie, Kenji Hosoi, Arata Takahashi, Takashi Aoki, Brian Cardineau, Koichi Miyauchi, Jay Chun, Michael O'Sullivan, Robert Brainard
Proceedings Volume 10146, 101460H (2017) https://doi.org/10.1117/12.2258324
KEYWORDS: Photoresist materials, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Polymers, Line width roughness, Solids, Polymerization, Sodium, Glasses

Proceedings Article | 31 March 2017 Presentation + Paper
Proceedings Volume 10143, 1014309 (2017) https://doi.org/10.1117/12.2258126
KEYWORDS: Extreme ultraviolet, Photoresist developing, Cobalt, Platinum, Palladium, Photoresist materials, Imaging systems, Metals, Carbon dioxide, Extreme ultraviolet lithography, Lithography, Light emitting diodes, Photochemistry, Switches, Photons

Proceedings Article | 31 March 2017 Presentation + Paper
Michael Murphy, Amrit Narasimhan, Steven Grzeskowiak, Jacob Sitterly, Philip Schuler, Jeff Richards, Greg Denbeaux, Robert Brainard
Proceedings Volume 10143, 1014307 (2017) https://doi.org/10.1117/12.2258119
KEYWORDS: Extreme ultraviolet lithography, Antimony, Extreme ultraviolet, Photoresist materials, Photons, Polymerization, Chemical elements, Manufacturing, Metals, Hydrogen, Molecules, Electrons, Spectroscopy, Semiconducting wafers

Proceedings Article | 27 March 2017 Presentation + Paper
Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Lee Napolitano, Daniel Freedman, Robert Brainard, Greg Denbeaux
Proceedings Volume 10146, 1014605 (2017) https://doi.org/10.1117/12.2258151
KEYWORDS: Electrons, Extreme ultraviolet, Metals, Extreme ultraviolet lithography, Photons, Absorption, Photoresist materials, Absorbance, Microelectronics, Carbon monoxide, Carbon dioxide, Iron

Proceedings Article | 27 March 2017 Presentation + Paper
Amrit Narasimhan, Steven Grzeskowiak, Christian Ackerman, Tracy Flynn, Greg Denbeaux, Robert Brainard
Proceedings Volume 10143, 101430W (2017) https://doi.org/10.1117/12.2258321
KEYWORDS: Extreme ultraviolet lithography, Electrons, Chemistry, Polymers, Molecular interactions, Extreme ultraviolet, Photoresist materials, Quantum efficiency, Lithography, Photons, Absorbance, Phase modulation, Molecules

Proceedings Article | 27 March 2017 Paper
Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Christian Ackerman, Jake Kaminsky, Robert Brainard, Greg Denbeaux
Proceedings Volume 10146, 101462C (2017) https://doi.org/10.1117/12.2274128
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Spectroscopy, Extreme ultraviolet, FT-IR spectroscopy, Absorption, Absorption spectroscopy, Lithography, Mass spectrometry, Electrons, Silicon, Hydrogen, Molecules, Photodiodes

Proceedings Article | 25 March 2016 Paper
Amrit Narasimhan, Steven Grzeskowiak, Jonathan Ostrander, Jonathon Schad, Eliran Rebeyev, Mark Neisser, Leonidas Ocola, Gregory Denbeaux, Robert Brainard
Proceedings Volume 9779, 97790F (2016) https://doi.org/10.1117/12.2219850
KEYWORDS: Electrons, Luminescence, Extreme ultraviolet lithography, Extreme ultraviolet, Molecules, Photons, Lithography, Photoresist materials, Ionization, Molecular interactions, Polymers, Photodiodes, Polymethylmethacrylate, Phase modulation, Quantum efficiency

Proceedings Article | 21 March 2016 Paper
Steven Grzeskowiak, Amrit Narasimhan, Liam Wisehart, Jonathon Schad, Mark Neisser, Leonidas Ocola, Robert Brainard, Greg Denbeaux
Proceedings Volume 9779, 97790C (2016) https://doi.org/10.1117/12.2219851
KEYWORDS: Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Photochemistry, Ionization, Chemically amplified resists, Mass spectrometry, Electron beams, Absorption, Polymers, Molecular interactions

Proceedings Article | 18 March 2016 Paper
Liam Wiseheart, Amrit Narasimhan, Steven Grzeskowiak, Mark Neisser, Leonidas Ocola, Greg Denbeaux, Robert Brainard
Proceedings Volume 9776, 97762O (2016) https://doi.org/10.1117/12.2219849
KEYWORDS: Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Solid modeling, Photons, Ionization, Copper, Silicon, Particles

SPIE Journal Paper | 24 December 2015
Miriam Sortland, Jodi Hotalen, Ryan Del Re, James Passarelli, Michael Murphy, Tero Kulmala, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard
JM3, Vol. 14, Issue 04, 043511, (December 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043511
KEYWORDS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates

SPIE Journal Paper | 9 November 2015
Ryan Del Re, James Passarelli, Miriam Sortland, Brian Cardineau, Yasin Ekinci, Elizabeth Buitrago, Mark Neisser, Daniel Freedman, Robert Brainard
JM3, Vol. 14, Issue 04, 043506, (November 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043506
KEYWORDS: Tin, Line edge roughness, Photoresist materials, Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Edge roughness, Crystals, Optical filters

SPIE Journal Paper | 14 October 2015
James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Jodi Hotalen, Levi Dousharm, Roberto Fallica, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard
JM3, Vol. 14, Issue 04, 043503, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043503
KEYWORDS: Antimony, Polymers, Molecules, Chromium, Extreme ultraviolet, Polymerization, Lithography, Bromine, Scanning electron microscopy, Metals

SPIE Journal Paper | 13 October 2015
Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Jonathon Schad, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard
JM3, Vol. 14, Issue 04, 043502, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043502
KEYWORDS: Extreme ultraviolet, Scattering, Electron beams, Extreme ultraviolet lithography, Photons, Photoresist materials, Ionization, Ellipsometry, Monte Carlo methods, Solid modeling

Proceedings Article | 20 March 2015 Paper
James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Levi Dousharm, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard
Proceedings Volume 9425, 94250T (2015) https://doi.org/10.1117/12.2086599
KEYWORDS: Polymers, Molecules, Antimony, Extreme ultraviolet, Lithography, Scanning electron microscopy, Metals, Polymerization, Tin, Bismuth

Proceedings Article | 19 March 2015 Paper
Ryan Del Re, Miriam Sortland, James Pasarelli, Brian Cardineau, Yasin Ekinci, Michaela Vockenhuber, Mark Neisser, Daniel Freedman, Robert Brainard
Proceedings Volume 9422, 942221 (2015) https://doi.org/10.1117/12.2086597
KEYWORDS: Line edge roughness, Tin, Extreme ultraviolet lithography, Photoresist materials, Lithography, Optical lithography, Extreme ultraviolet, Photons, Semiconducting wafers, Neodymium

Proceedings Article | 19 March 2015 Paper
Miriam Sortland, Ryan Del Re, James Passarelli, Jodi Hotalen, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard
Proceedings Volume 9422, 942227 (2015) https://doi.org/10.1117/12.2086598
KEYWORDS: Palladium, Extreme ultraviolet, Platinum, Extreme ultraviolet lithography, Lithography, Metals, Carbonates, Absorbance, Photoresist developing, Transition metals

Proceedings Article | 16 March 2015 Paper
Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard
Proceedings Volume 9422, 942208 (2015) https://doi.org/10.1117/12.2086596
KEYWORDS: Photons, Scattering, Extreme ultraviolet lithography, Ionization, Extreme ultraviolet, Photoresist materials, Monte Carlo methods, Ellipsometry, Lithography, Polymers

Proceedings Article | 4 April 2014 Paper
James Passarelli, Brian Cardineau, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel Freedman, Robert Brainard
Proceedings Volume 9051, 90512A (2014) https://doi.org/10.1117/12.2046537
KEYWORDS: Bismuth, Extreme ultraviolet, Metals, Calibration, Lithography, Chlorine, Post-transition metals, Absorbance, Photons, Photoresist materials

Proceedings Article | 4 April 2014 Paper
Brian Cardineau, Ryan Del Re, Hashim Al-Mashat, Miles Marnell, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel Freedman, Robert Brainard
Proceedings Volume 9051, 90511B (2014) https://doi.org/10.1117/12.2046536
KEYWORDS: Tin, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Photoresist materials, Photolysis, Thin films, Semiconducting wafers, Silicon films, Absorbance

Proceedings Article | 23 March 2012 Paper
Gregg Gallatin, Patrick Naulleau, Robert Brainard
Proceedings Volume 8322, 83221C (2012) https://doi.org/10.1117/12.917006
KEYWORDS: Line edge roughness, Stochastic processes, Molecules, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Data modeling, Photoresist materials, Lithography, Statistical modeling

Proceedings Article | 23 March 2012 Paper
Markos Trikeriotis, Marie Krysak, Yeon Sook Chung, Christine Ouyang, Brian Cardineau, Robert Brainard, Christopher Ober, Emmanuel Giannelis, Kyoungyong Cho
Proceedings Volume 8322, 83220U (2012) https://doi.org/10.1117/12.916384
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Etching, Nanoparticles, Resistance, Extreme ultraviolet, Absorbance, Electron beam lithography, Line edge roughness, Hafnium

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83220V (2012) https://doi.org/10.1117/12.917014
KEYWORDS: Nanoparticles, Hafnium, Solids, Sodium, Lithography, Extreme ultraviolet, Oxides, Crystals, Magnetism, Bioalcohols

Proceedings Article | 20 March 2012 Paper
Kenji Hosoi, Brian Cardineau, William Earley, Seth Kruger, Koichi Miyauchi, Robert Brainard
Proceedings Volume 8325, 83251S (2012) https://doi.org/10.1117/12.917018
KEYWORDS: Polymers, Amplifiers, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Diffusion, Glasses, Molecules, Neck

Proceedings Article | 20 March 2012 Paper
Proceedings Volume 8325, 832514 (2012) https://doi.org/10.1117/12.917015
KEYWORDS: Amplifiers, Fluorine, Line edge roughness, Extreme ultraviolet lithography, Lithography, Polymers, Photoresist materials, Polymerization, Temperature metrology, Extreme ultraviolet

Proceedings Article | 16 April 2011 Paper
Craig Higgins, Charles Settens, Patricia Wolfe, Karen Petrillo, Robert Auger, Richard Matyi, Robert Brainard
Proceedings Volume 7972, 797211 (2011) https://doi.org/10.1117/12.879509
KEYWORDS: Line edge roughness, Silicon, Polymers, Lithography, Extreme ultraviolet, Head-mounted displays, Silicon films, Thin films, Extreme ultraviolet lithography, Interfaces

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733Q (2009) https://doi.org/10.1117/12.814308
KEYWORDS: Amplifiers, Line edge roughness, Lithography, Extreme ultraviolet lithography, Molecules, Oxygen, Thermal modeling, Thermodynamics, Photoresist materials, Polymers

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727147 (2009) https://doi.org/10.1117/12.814307
KEYWORDS: Quantum efficiency, Extreme ultraviolet, Line edge roughness, Extreme ultraviolet lithography, Absorbance, Semiconducting wafers, Absorption, Diffusion, Photons, Photoresist materials

SPIE Press Book | 19 February 2009
KEYWORDS: Semiconducting wafers, Photoresist processing, Lithography, Etching, Line edge roughness, Water, Immersion lithography, Coating, Photomasks, Double patterning technology

Proceedings Article | 15 April 2008 Paper
Robert Brainard, Elsayed Hassanein, Juntao Li, Piyush Pathak, Brad Thiel, Franco Cerrina, Richard Moore, Miguel Rodriguez, Boris Yakshinskiy, Elena Loginova, Theodore Madey, Richard Matyi, Matt Malloy, Andrew Rudack, Patrick Naulleau, Andrea Wüest, Kim Dean
Proceedings Volume 6923, 692325 (2008) https://doi.org/10.1117/12.773869
KEYWORDS: Electrons, Photons, Quantum efficiency, Extreme ultraviolet, Polymers, Monte Carlo methods, Extreme ultraviolet lithography, Oscillators, Line width roughness, Electronics

Proceedings Article | 15 April 2008 Paper
Seth Kruger, Srividya Revuru, Shao-Zhong Zhang, Dimitri Vaughn, Eric Block, Paul Zimmerman, Robert Brainard
Proceedings Volume 6923, 69231O (2008) https://doi.org/10.1117/12.772994
KEYWORDS: Absorbance, Refractive index, Water, Sulfur, Oxygen, Refraction, Liquids, Argon, Potassium, Lithography

Proceedings Article | 28 March 2008 Paper
Elsayed Hassanein, Craig Higgins, Patrick Naulleau, Richard Matyi, Gregg Gallatin, Gregory Denbeaux, Alin Antohe, Jim Thackeray, Kathleen Spear, Charles Szmanda, Christopher Anderson, Dimitra Niakoula, Matthew Malloy, Anwar Khurshid, Cecilia Montgomery, Emil Piscani, Andrew Rudack, Jeff Byers, Andy Ma, Kim Dean, Robert Brainard
Proceedings Volume 6921, 69211I (2008) https://doi.org/10.1117/12.774099
KEYWORDS: Quantum efficiency, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, X-rays, Absorbance, Photons, Coating, Reflectometry, Line edge roughness

Proceedings Article | 21 March 2008 Paper
R. Garg, P. Naulleau, R. Brainard, G. Denbeaux
Proceedings Volume 6921, 69213M (2008) https://doi.org/10.1117/12.772869
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Photoresist materials, Printing, Xenon, Optical filters, Ultraviolet radiation, Silicon, Scanning electron microscopy

Proceedings Article | 21 March 2008 Paper
Chimaobi Mbanaso, Gregory Denbeaux, Kim Dean, Robert Brainard, Seth Kruger, Elsayed Hassanein
Proceedings Volume 6921, 69213L (2008) https://doi.org/10.1117/12.772695
KEYWORDS: Extreme ultraviolet lithography, Absorption, Extreme ultraviolet, Photoresist materials, Lithography, Semiconducting wafers, Light, Absorbance, Image quality, Reflectivity

Proceedings Article | 21 March 2008 Paper
Gregg Gallatin, Patrick Naulleau, Dimitra Niakoula, Robert Brainard, Elsayed Hassanein, Richard Matyi, Jim Thackeray, Kathleen Spear, Kim Dean
Proceedings Volume 6921, 69211E (2008) https://doi.org/10.1117/12.772763
KEYWORDS: Line edge roughness, Data modeling, Photoresist materials, Extreme ultraviolet, Lithography, Image resolution, Scanning electron microscopy, Yield improvement, Photoresist developing, Photoresist processing

Proceedings Article | 20 March 2008 Paper
Proceedings Volume 6921, 69211F (2008) https://doi.org/10.1117/12.772943
KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Line edge roughness, Lithography, Interferometers, Photoresist materials, High volume manufacturing, Printing, Image resolution

Proceedings Article | 3 May 2007 Paper
Greg Denbeaux, Rashi Garg, Justin Waterman, Chimaobi Mbanaso, Jeroen Netten, Robert Brainard, Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Kevin DeMarco, Molly Jaffe, Matthew Waldron, Kim Dean
Proceedings Volume 6533, 653318 (2007) https://doi.org/10.1117/12.737192
KEYWORDS: Spectroscopy, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Optical filters, Xenon, Molecular spectroscopy, Calibration, Photoresist materials, Mirrors

Proceedings Article | 22 March 2007 Paper
Gregg Gallatin, Patrick Naulleau, Robert Brainard
Proceedings Volume 6519, 651911 (2007) https://doi.org/10.1117/12.712346
KEYWORDS: Line edge roughness, Quantum efficiency, Electrons, Extreme ultraviolet, Diffusion, Extreme ultraviolet lithography, Photoresist materials, Yield improvement, Mathematical modeling, Image quality

Proceedings Article | 22 March 2007 Paper
Proceedings Volume 6519, 651920 (2007) https://doi.org/10.1117/12.712431
KEYWORDS: Refraction, Molecules, Liquids, Chemical species, Water, Sodium, Excel, Lithography, Refractive index, Chemical analysis

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600511
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Chemically amplified resists, Lithography, Semiconducting wafers, Image resolution, Scanning electron microscopy, Diffractive optical elements

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536411
KEYWORDS: Line edge roughness, Extreme ultraviolet, Molecules, Photons, Deep ultraviolet, Diffusion, Quantum efficiency, Extreme ultraviolet lithography, Optical spheres, Photoresist materials

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535959
KEYWORDS: Absorbance, Reflectivity, Photoresist materials, Semiconducting wafers, Silicon, Extreme ultraviolet, Grazing incidence, Refraction, Extreme ultraviolet lithography, X-rays

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535723
KEYWORDS: Critical dimension metrology, Metrology, Data modeling, 3D metrology, Semiconducting wafers, 3D modeling, Systems modeling, Lithography, Photoresist processing, Data storage

Proceedings Article | 16 June 2003 Paper
Stewart Robertson, Patrick Naulleau, Donna O'Connell, Kevin McDonald, Todd Delano, Kenneth Goldberg, Steven Hansen, Kirk Brown, Robert Brainard
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.499357
KEYWORDS: Photomasks, Photoresist materials, Extreme ultraviolet lithography, Lithography, Calibration, Data modeling, Diffusion, Modeling, Extreme ultraviolet, Wafer-level optics

Proceedings Article | 16 June 2003 Paper
Charlotte Cutler, Joseph Mackevich, Jieming Li, Donna O'Connell, Gregory Cardinale, Robert Brainard
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482370
KEYWORDS: Line edge roughness, Polymers, Surface roughness, Extreme ultraviolet, Atomic force microscopy, Deep ultraviolet, Molecular aggregates, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 20 August 2001 Paper
Jeffrey Guevremont, Robert Brainard, Scott Reeves, Xin Zhou, Thinh Nguyen, Joseph Mackevich, Erik Anderson, Gary Taylor
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436655
KEYWORDS: Polymers, Chemistry, Lithography, Humidity, Deep ultraviolet, Model-based design, Semiconducting wafers, Electron beam lithography, Electrons, Polymer thin films

Proceedings Article | 21 July 2000 Paper
Leonidas Ocola, Myrtle Blakey, Paul Orphanos, Wai-Yi Li, Anthony Novembre, Robert Brainard, Joseph Mackevich, Gary Taylor
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390055
KEYWORDS: Charged-particle lithography, Deep ultraviolet, Monte Carlo methods, Absorption, Electrons, Polymers, Chemically amplified resists, Lithography, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 25 June 1999 Paper
Veena Rao, Jonathan Cobb, Craig Henderson, Uzodinma Okoroanyanwu, Dan Bozman, Pawitter Mangat, Robert Brainard, Joseph Mackevich
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351135
KEYWORDS: Line edge roughness, Extreme ultraviolet, Photoresist processing, Lithography, Etching, Extreme ultraviolet lithography, Polymers, Photoresist materials, Optical lithography, Silicon

Showing 5 of 62 publications
Conference Committee Involvement (16)
Advances in Patterning Materials and Processes XLII
24 February 2025 | San Jose, California, United States
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Showing 5 of 16 Conference Committees
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