Mr. Doo-Youl Lee Profile

Doo-Youl Lee

at Samsung Electronics Co Ltd

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Author

Publications (4)

Proceedings Article | 20 October 2006 Paper

Feasibility study of mask fabrication in double exposure technology

Jong Gul Doh, Sang Hee Lee, Je Bum Yoon, Doo Youl Lee, Seong Yong Cho, Byung Gook Kim, Seong Woon Choi, Woo Sung Han

Proceedings Volume 6349, 63491U (2006) https://doi.org/10.1117/12.686523

KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Image registration, Thermal effects, Mask making, Reticles, Error analysis, Scanners, Chromium

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Proceedings Article | 12 May 2005 Paper

The application criterion of model-based optical proximity correction in a low k1 process

Doo-Youl Lee, In-Sung Kim, Sung-Gon Jung, Myoung-Ho Jung, Joo-On Park, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599013

KEYWORDS: Optical proximity correction, Model-based design, Resolution enhancement technologies, Lithography, Scanning electron microscopy, Photography, Process modeling, Photomasks, Scanners, Semiconducting wafers

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Proceedings Article | 24 May 2004 Paper

Assessments on process parameters' influences to the proximity correction

Eun-Mi Lee, Sung-Woo Lee, Doo-Youl Lee, Soo-Han Choi, Joo-On Park, Sung-Gon Jung, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536341

KEYWORDS: Optical proximity correction, Critical dimension metrology, Atrial fibrillation, Cadmium, Resolution enhancement technologies, Data modeling, Logic devices, Photomasks, Line edge roughness, Scanning electron microscopy

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Proceedings Article | 26 June 2003 Paper

Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Hyun-Jae Kang, Sung-Woo Lee, Doo-Youl Lee, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485472

KEYWORDS: Optical proximity correction, Lithography, Logic devices, Photoresist materials, Line edge roughness, Photomasks, Critical dimension metrology, Atrial fibrillation, Logic, Transistors

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