Dr. Evgeni Gurevich Profile

Dr. Evgeni Gurevich

at KLA Israel

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 22 February 2021 Presentation + Paper

High voltage scanning electron microscope overlay metrology accuracy for after development inspection

S. Czerkas, N. Gutman, R. Gronheid, E. Gurevich, R. Wang, Y. Feler, M. Zaberchik, Y. Grauer, H. Stoschus, Y. Uziel, U. Pohlmann, F. Laske

Proceedings Volume 11611, 116110B (2021) https://doi.org/10.1117/12.2583710

KEYWORDS: Overlay metrology, Scanning electron microscopy, Inspection, Electron microscopes, Optical metrology, Optical lithography, New and emerging technologies, Metrology, Integrated optics, Imaging metrology

Read Abstract +

Proceedings Article | 28 March 2017 Paper

Impact of stochastic process variations on overlay mark fidelity "towards the 5nm node"

Michael Adel, Roel Gronheid, Chris Mack, Philippe Leray, Evgeni Gurevich, Bart Baudemprez, Dieter Vandenheuvel, Antonio Mani, Sharon Aharon, Dana Klein, Jungtae Lee, Mark Smith

Proceedings Volume 10145, 1014509 (2017) https://doi.org/10.1117/12.2258353

KEYWORDS: Overlay metrology, Line edge roughness, Lithography, Stochastic processes, Process control, Manufacturing, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Line width roughness, Extreme ultraviolet lithography, Image segmentation, Scanning electron microscopy

Read Abstract +

Proceedings Article | 24 March 2016 Paper

Accuracy in optical overlay metrology

Barak Bringoltz, Tal Marciano, Tal Yaziv, Yaron DeLeeuw, Dana Klein, Yoel Feler, Ido Adam, Evgeni Gurevich, Noga Sella, Ze'ev Lindenfeld, Tom Leviant, Lilach Saltoun, Eltsafon Ashwal, Dror Alumot, Yuval Lamhot, Xindong Gao, James Manka, Bryan Chen, Mark Wagner

Proceedings Volume 9778, 97781H (2016) https://doi.org/10.1117/12.2219176

KEYWORDS: Overlay metrology, Scatterometry, Process control, Optical metrology, Metrology, Image processing, Optics manufacturing, Semiconductor manufacturing, Semiconductors, Manufacturing, Accuracy assessment, Optical alignment, Signal processing, Semiconducting wafers, Diffraction, Neodymium, Physics

Read Abstract +

Proceedings Article | 23 January 2003 Paper

Maintaining uniformity of IR focal plane arrays by updating offset correction coefficients

Evgeni Gurevich, Asa Fein

Proceedings Volume 4820, (2003) https://doi.org/10.1117/12.453552

KEYWORDS: Staring arrays, Optical proximity correction, Nonuniformity corrections, Data modeling, Lithium, Sensors, Infrared technology, Digital Light Processing, Infrared radiation, Calibration

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years