Dr. Nadav Gutman Profile

Dr. Nadav Gutman

Research Manager at KLA Israel

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Publications (7)

Proceedings Article | 27 April 2023 Poster + Paper

Parallax method for diffraction-based single-cell overlay and film thickness measurement

Mordecai Kot, Yuval Lamhot, Alon Yagil, Tal Yaziv, Nadav Gutman, Renan Milo

Proceedings Volume 12496, 124963A (2023) https://doi.org/10.1117/12.2659163

KEYWORDS: Overlay metrology, Diffraction, Semiconducting wafers, Calibration, Diffraction gratings, Optical alignment, Film thickness

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Proceedings Article | 26 May 2022 Poster + Paper

OPO reduction in scatterometry metrology by rotated quadrupole illumination

Rawi Dirawi, Tal Yaziv, Renan Milo, Nadav Gutman, Ohad Bachar

Proceedings Volume 12053, 120531H (2022) https://doi.org/10.1117/12.2608255

KEYWORDS: Metrology, Overlay metrology, Scatterometry, Diffraction, Semiconductors, Wavelength tuning, Wafer testing, Specular reflections, Spectral resolution, Diffractive optical elements, Semiconductor manufacturing, Wafer inspection

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Proceedings Article | 26 May 2022 Poster + Paper

Prediction and optimization of small scatterometry based overlay targets

Rawi Dirawi, Shlomit Katz, Renan Milo, Nadav Gutman

Proceedings Volume 12053, 120531E (2022) https://doi.org/10.1117/12.2608241

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Semiconductors, Semiconductor manufacturing, Manufacturing, Inspection, Standards development

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Proceedings Article | 26 May 2022 Poster + Paper

Spectral analysis overlay measurement approach for improvement of overlay accuracy in advanced integrated circuits

Vladimir Levinski, Yuri Paskover, Sharon Aharon, Daria Negri, Nadav Gutman, K. Nireekshan Reddy, Jeongpyo Lee, Hedvi Spielberg, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Hongseok Jang, Honggoo Lee, Sangho Lee

Proceedings Volume 12053, 120531Z (2022) https://doi.org/10.1117/12.2613981

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Integrated circuits, Wafer-level optics, Scanners, Principal component analysis, Manufacturing, Inspection, Accuracy assessment

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Proceedings Article | 22 February 2021 Presentation + Paper

High voltage scanning electron microscope overlay metrology accuracy for after development inspection

S. Czerkas, N. Gutman, R. Gronheid, E. Gurevich, R. Wang, Y. Feler, M. Zaberchik, Y. Grauer, H. Stoschus, Y. Uziel, U. Pohlmann, F. Laske

Proceedings Volume 11611, 116110B (2021) https://doi.org/10.1117/12.2583710

KEYWORDS: Overlay metrology, Scanning electron microscopy, Inspection, Electron microscopes, Optical metrology, Optical lithography, New and emerging technologies, Metrology, Integrated optics, Imaging metrology

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Proceedings Article | 20 March 2020 Presentation + Paper

Optical imaging metrology calibration using high voltage scanning electron microscope at after-development inspection for advanced processes

N. Gutman, I. Tarshish, R. Gronheid, C. Dror, D. Michelsson, H. Backhauss, L. Levin, V. Levinski, Y. Paskover, L. Yerushalmi, T. Heidrich, S. Czerkas, U. Pohlmann, F. Laske

Proceedings Volume 11325, 113251X (2020) https://doi.org/10.1117/12.2551797

KEYWORDS: Scanning electron microscopy, Overlay metrology, Metrology, Calibration, Optical calibration

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Proceedings Article | 19 March 2015 Paper

Scanner focus metrology for advanced node scanner monitoring and control

Jimyung Kim, Youngsik Park, Taehwa Jeong, Suhyun Kim, Kwang-Sub Yoon, Byoung-il Choi, Vladimir Levinski, Daniel Kandel, Yoel Feler, Nadav Gutman, Eltsafon Island-Ashwal, Moshe Cooper, DongSub Choi, Eitan Herzel, Tien David, JungWook Kim

Proceedings Volume 9424, 94242E (2015) https://doi.org/10.1117/12.2084671

KEYWORDS: Scanners, Photomasks, Metrology, Finite element methods, Semiconducting wafers, Diffraction, Lithography, Phase shifts, Calibration, Scatterometry

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Showing 5 of 7 publications

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