Dr. Holger Glatzel Profile

Dr. Holger Glatzel

Manager, Optical Engineering at KLA-Tencor Corp

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 17 April 2014 Paper

Paper

Projection optics for EUVL micro-field exposure tools with 0.5 NA

Holger Glatzel, Dominic Ashworth, Dan Bajuk, Matt Bjork, Mark Bremer, Mark Cordier, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Samuel Hardy, Russ Hudyma, James Kennon, Robert Kestner, Lou Marchetti, Keyvan Nouri, Patrick Naulleau, Daniel Pierce, Regina Soufli, Eberhard Spiller, Yogesh Verma

Proceedings Volume 9048, 90481K (2014) https://doi.org/10.1117/12.2048643

KEYWORDS: Mirrors, Metrology, Wavefronts, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography, Optical coatings, Lithography, Optical fabrication

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Proceedings Article | 17 April 2014 Paper

Paper

Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Kevin Cummings, Dominic Ashworth, Mark Bremer, Rodney Chin, Yu-Jen Fan, Luc Girard, Holger Glatzel, Michael Goldstein, Eric Gullikson, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Johannes Bauer, Markus Mengel, Joachim Welker, Michael Grupp, Erik Sohmen, Stefan Wurm

Proceedings Volume 9048, 90481M (2014) https://doi.org/10.1117/12.2046380

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Projection systems, Lithography, Reticles, Cameras, Artificial intelligence, Optical lithography, Wavefronts, Sensors

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Proceedings Article | 1 April 2013 Paper

Paper

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Holger Glatzel, Dominic Ashworth, Mark Bremer, Rodney Chin, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Russ Hudyma, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Eberhard Spiller

Proceedings Volume 8679, 867917 (2013) https://doi.org/10.1117/12.2012698

KEYWORDS: Mirrors, Multilayers, Wavefronts, Extreme ultraviolet lithography, Aspheric lenses, Metrology, Extreme ultraviolet, Projection systems, Lithography, Optical testing

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Proceedings Article | 15 September 2011 Paper

Paper

JWST mirror production status

Benjamin Gallagher, Mark Bergeland, Bob Brown, David Chaney, Tracy Copp, Jake Lewis, Brad Shogrin, Koby Smith, Jeff Sokol, James Hadaway, Holger Glatzel, Patrick Johnson, Allen Lee, Dan Patriarca, Ian Stevenson, Jason Cluney, Tom Parsonage, Jeff Calvert, Brady Rodgers, Andy McKay, Scott Texter, Lester Cohen, Lee Feinberg

Proceedings Volume 8146, 814607 (2011) https://doi.org/10.1117/12.892326

KEYWORDS: Mirrors, James Webb Space Telescope, Coating, Cryogenics, Polishing, Surface finishing, Aerospace engineering, Beryllium, Manufacturing, Composites

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Proceedings Article | 5 August 2010 Paper

Paper

Successful production of the engineering development unit (EDU) primary mirror segment and flight unit tertiary mirror for JWST

Andrea Arneson, Chris Alongi, Rob Bernier, Ed Boese, Jay Daniel, Lee Dettmann, Robert Garfield, Holger Glatzel, John Kincade, Patrick Johnson, Allen Lee, Adam Magruder, Ankit Patel, Martin Seilonen, Gary Surges, Mark Bergeland, Robert Brown, Benjamin Gallagher, Andrew McKay, Lester Cohen

Proceedings Volume 7731, 77310I (2010) https://doi.org/10.1117/12.858049

KEYWORDS: Mirrors, Phase modulation, James Webb Space Telescope, Metrology, Optical testing, Polishing, Beryllium, Surface finishing, Optical fabrication, Aerospace engineering

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Proceedings Article | 24 March 2006 Paper

Paper

EUV optical system for the reticle imaging microscope (RIM)

H. Glatzel, J. Daniel, K. Khajehnouri, U. Mueller, T. Roff, J. Rosenbohm, S. Sporer

Proceedings Volume 6151, 615130 (2006) https://doi.org/10.1117/12.677199

KEYWORDS: Mirrors, Extreme ultraviolet, Imaging systems, Microscopes, Surface finishing, Atomic force microscopy, Reticles, Optical coatings, Wavefronts, Polishing

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Proceedings Article | 6 May 2005 Paper

Paper

Characterization of prototype optical surfaces and coatings for the EUV reticle imaging microscope

H. Glatzel, J. Daniel, K. Khajehnouri, T. Roff, S. Sporer, S. Wong, M. Kriese, Y. Platonov, J. Rodriguez

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.619290

KEYWORDS: Optical coatings, Reflectivity, Photovoltaics, Extreme ultraviolet, Microscopes, Reticles, Light scattering, Mirrors, Atomic force microscopy, Prototyping

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Proceedings Article | 14 September 2001 Paper

Paper

Next-generation 193-nm laser for sub-100-nm lithography

Thomas Duffey, Gerry Blumenstock, Vladimir Fleurov, Xiaojiang Pan, Peter Newman, Holger Glatzel, Tom Watson, J. Erxmeyer, Ralf Kuschnereit, Bernhard Weigl

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435654

KEYWORDS: Lithography, Laser development, Laser applications, Optical lithography, Semiconducting wafers, Electrodes, Excimer lasers, Optical coatings, Light emitting diodes, Semiconductors

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Proceedings Article | 26 July 1999 Paper

Paper

ArF step-and-scan exposure system for 0.15-um and 0.13-um technology nodes

Jan Mulkens, Judon Stoeldraijer, Guy Davies, Marcel Dierichs, Barbra Heskamp, Marco Moers, Richard George, Oliver Roempp, Holger Glatzel, Christian Wagner, Ingrid Pollers, Patrick Jaenen

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354362

KEYWORDS: Semiconducting wafers, Reticles, Lithography, Imaging systems, Photomasks, Overlay metrology, Scanning electron microscopy, Photoresist processing, Monochromatic aberrations, Distortion

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Proceedings Article | 30 September 1994 Paper

Paper

Manufacturing technologies for high-throughput imaging x-ray telescopes: XMM carbon fiber reinforced plastic (CFRP) technology compared to other x-ray systems

Rainer Boerret, Holger Glatzel, Michael Schmidt

Proceedings Volume 2210, (1994) https://doi.org/10.1117/12.188095

KEYWORDS: Mirrors, X-ray telescopes, Nickel, X-rays, Polishing, X-ray optics, Fabrication, Space telescopes, Cadmium sulfide, Optics manufacturing

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Proceedings Article | 30 September 1994 Paper

Paper

Assembly, performance prediction, and x-ray test of the optical demonstration model (ODM) for the x-ray telescope XMM

Holger Glatzel, Michael Schmidt, Wilhelm Egle, Dieter Pauschinger, N. Schulz, Wolfgang Burkert, Heinrich Braeuninger

Proceedings Volume 2210, (1994) https://doi.org/10.1117/12.188096

KEYWORDS: Mirrors, X-rays, Temperature metrology, X-ray telescopes, Error analysis, Optics manufacturing, Epoxies, Spatial frequencies, Geometrical optics, X-ray optics

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Proceedings Article | 13 September 1994 Paper

Paper

X-ray spectroscopy mission (XMM) telescope development

Philippe Gondoin, Kees van Katwijk, Bernd Aschenbach, N. Schulz, Rainer Boerret, Holger Glatzel, Oberto Citterio

Proceedings Volume 2209, (1994) https://doi.org/10.1117/12.185278

KEYWORDS: Mirrors, Nickel, X-rays, Telescopes, Space telescopes, X-ray telescopes, Manufacturing, Spectroscopy, Image quality, Gold

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Proceedings Article | 1 February 1994 Paper

Paper

Optical demonstration model for the XMM telescope based on lightweight CFRP/EPOXY x-ray mirrors

Dieter Pauschinger, Wilhelm Egle, Holger Glatzel, Hubert Salmen, W. Becker

Proceedings Volume 2011, (1994) https://doi.org/10.1117/12.167194

KEYWORDS: Mirrors, X-rays, X-ray telescopes, X-ray optics, Gold, Surface finishing, Lightweight mirrors, Telescopes, Geometrical optics, Space telescopes

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Proceedings Article | 21 January 1993 Paper

Paper

Optical performance prediction of thin-walled Wolter type I mirror shells for x-rays in the 1- to 8-keV energy range

Holger Glatzel, Dieter Pauschinger, Hans-Joachim Frasch, Herbert Gross

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140556

KEYWORDS: Mirrors, X-rays, Geometrical optics, Error analysis, Spatial frequencies, Point spread functions, X-ray optics, Telescopes, Scattering, Measurement devices

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Proceedings Article | 21 January 1993 Paper

Paper

Measurement and analysis of a set of mandrels for the JET-X x-ray optics

Rainer Boerret, Holger Glatzel, Klaus-Friedrich Beckstette, Paolo Conconi, Oberto Citterio

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140562

KEYWORDS: Ray tracing, Metrology, Mirrors, Polishing, Telescopes, X-ray telescopes, Nickel, Aluminum, Received signal strength, Surface finishing

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Proceedings Article | 21 January 1993 Paper

Paper

Production of thin-walled lightweight CFRP/EPOXY x-ray mirrors for the XMM telescope

Dieter Pauschinger, Wilhelm Egle, Walter Neumann, Holger Glatzel, D. Rohde, Hubert Salmen, W. Becker, Gunter Helwig

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140557

KEYWORDS: Mirrors, X-rays, Gold, X-ray telescopes, Epoxies, Surface finishing, Manufacturing, Lightweight mirrors, X-ray optics, Metals

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Showing 5 of 16 publications

Conference Committee Involvement (1)

Advances in Metrology for X-Ray and EUV Optics

2 August 2005 | San Diego, California, United States

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