Dr. William D. Hinsberg Profile

Dr. William D. Hinsberg

Owner at Columbia Hill Technical Consulting

SPIE Involvement:

Author

Publications (58)

SPIE Journal Paper | 17 August 2022

Analytical approach to metal oxide resist modeling: exposure, bake, and network formation

Eric Hansen, Yichi Zhang, Ji Yeon Kim, William Hinsberg

JM3, Vol. 21, Issue 04, 041405, (August 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041405

KEYWORDS: Optical lithography, Oxides, Metals, Photons, Extreme ultraviolet lithography, FT-IR spectroscopy, Extreme ultraviolet, Computer simulations, Monte Carlo methods, Absorption

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SPIE Journal Paper | 2 March 2021 Open Access

Contribution of EUV resist counting statistics to stochastic printing failures

William Hinsberg, Gregory Wallraff, Martha Sanchez, Nimrod Megiddo, Oleg Kostko

JM3, Vol. 20, Issue 01, 014603, (March 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.014603

KEYWORDS: Stochastic processes, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Photon counting, Monte Carlo methods, Chemistry, Polymers, Bridges

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Proceedings Article | 26 September 2019 Paper

An analysis of EUV resist stochastic printing failures

M. Sanchez, G. Wallraff, N. Megiddo, W. Hinsberg

Proceedings Volume 11147, 1114717 (2019) https://doi.org/10.1117/12.2537632

KEYWORDS: Stochastic processes, Printing, Extreme ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Polymers, Photoresist processing, Lithography, Polymer thin films, Molecules

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Proceedings Article | 16 October 2017 Presentation

A novel route to EUV resists design: Fundamental understanding of chemical processes (Conference Presentation)

Oleg Kostko, Bo Xu, Daniel Slaughter, Musahid Ahmed, D. Frank Ogletree, Kristi Closser, David Prendergast, Patrick Naulleau, Deirdre Olynick, Paul Ashby, Yi Liu, William Hinsberg, Gregory Wallraff

Proceedings Volume 10450, 104500J (2017) https://doi.org/10.1117/12.2281520

KEYWORDS: Electrons, Molecules, Extreme ultraviolet, Photons, Extreme ultraviolet lithography, Photoresist materials

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New resists are needed to advance EUV lithography. Tailored design of efficient photoresist is impossible without fundamental understanding of EUV induced chemistry. Resists incorporating high cross-section elements efficiently utilize EUV photons via radiation absorption by core-level electrons, resulting in emission of primary electrons. However, this is only an initial step in the process. Auger emission, molecular fragmentation, and subsequent electron-resist interactions are also critical. Understanding all these steps is crucial to harness all the deposited energy for improved patterning results. In this work, we present recent results of multimodal experimental approaches to study photoresist materials. To build our grasp of EUV photochemistry from the ground up we aim for understanding the whole variety of processes happening after absorption of an EUV photon by a single building block of resist material – a resist molecule. Model photoresist constituent molecules functionalized with halogen atoms, are isolated in the gas phase and exposed to tunable EUV radiation from the Advanced Light Source, Berkeley Lab and the direct processes are investigated by photoelectron spectroscopy and photoionization mass spectrometry. We quantify the performance of several candidate molecules in terms of photoemission cross-sections and electron yield per primary photoionization event. We demonstrate that some prototype resist molecules can emit several (photo- and Auger) electrons after single EUV photon absorption. Following the electron emission, the atomic relaxation leads to the molecule fragmentation, which also depends on the halogen functionalization. Secondary electron-driven reactions are studied by tunable electron impact ionization and dissociative electron attachment mass spectrometry. We demonstrate that even very low kinetic energy electrons may lead to the molecule dissociation. While gas-phase studies do provide insight into the primary EUV photon or electron induced events in the individual resist molecules, we seek to understand these processes in the condensed phase as this is where industrially relevant processes will occur. We discuss techniques allowing for generation of resist nanoparticles of different morphology, representing either condensed resist or a substrate coated by a resist film. The same techniques, as applied to investigate resist’s building blocks, are used to study the condensed resist material, connecting our understanding of the fundamental phenomena from each isolated molecule to the solid state system.

Proceedings Article | 27 March 2017 Paper

A numeric model for the imaging mechanism of metal oxide EUV resists

W. Hinsberg, S. Meyers

Proceedings Volume 10146, 1014604 (2017) https://doi.org/10.1117/12.2260265

KEYWORDS: Absorption, Extreme ultraviolet, Lithography, Polymers, Photons, Imaging systems, Metals, Oxides, Systems modeling, Extreme ultraviolet lithography

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Proceedings Article | 27 March 2014 Paper

ICE: Ionic contrast enhancement for organic solvent negative tone develop

Linda Sundberg, Gregory Wallraff, Luisa Bozano, Hoa Truong, Martha Sanchez, Dario Goldfarb, Karen Petrillo, William Hinsberg

Proceedings Volume 9051, 90510S (2014) https://doi.org/10.1117/12.2046762

KEYWORDS: Image processing, Ions, Photoresist processing, Semiconducting wafers, Polymers, Lithium, Standards development, Lithography, Image quality standards, Reflectivity

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Proceedings Article | 29 March 2013 Paper

Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics

M. Sanchez, L. Sundberg, G. Wallraff, W. Hinsberg, L. Bozano, H. Truong, K. Petrillo

Proceedings Volume 8682, 868218 (2013) https://doi.org/10.1117/12.2010966

KEYWORDS: Line edge roughness, Scanning electron microscopy, Analog electronics, Glasses, Extreme ultraviolet, Photoresist processing, Resist chemistry, Photoresist materials, Semiconducting wafers, Photomicroscopy

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Proceedings Article | 16 April 2011 Paper

Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers

Luisa Bozano, Phillip Brock, Hoa Truong, Martha Sanchez, Gregory Wallraff, William Hinsberg, Robert Allen, Masaki Fujiwara, Kazuhiko Maeda

Proceedings Volume 7972, 797218 (2011) https://doi.org/10.1117/12.884519

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Electron beam lithography, Lithography, Spectroscopy, Line edge roughness, Image resolution, Glasses, Atomic force microscopy

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Proceedings Article | 16 April 2011 Paper

Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications

Anuja De Silva, Linda Sundberg, Ratnam Sooriyakumaran, Luisa Bozano, Greg Breyta, William Hinsberg, Masaki Fujiwara

Proceedings Volume 7972, 79721Z (2011) https://doi.org/10.1117/12.881735

KEYWORDS: Magnesium, Lithography, Glasses, Silicon, Extreme ultraviolet lithography, Electron beam lithography, Molecules, Extreme ultraviolet, Polymers, Thin films

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Proceedings Article | 16 April 2011 Paper

Visualization of the develop process

Linda Sundberg, Gregory Wallraff, Alexander Friz, Blake Davis, Sally Swanson, Phillip Brock, Charles Rettner, William Hinsberg

Proceedings Volume 7972, 79720I (2011) https://doi.org/10.1117/12.882185

KEYWORDS: Polymers, Semiconducting wafers, Visualization, Video, Critical dimension metrology, Luminescence, Optical tracking, Video processing, Photoresist processing, Interfaces

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Proceedings Article | 2 April 2011 Paper

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

Chris Bencher, Jeffrey Smith, Liyan Miao, Cathy Cai, Yongmei Chen, Joy Cheng, Daniel Sanders, Melia Tjio, Hoa Truong, Steven Holmes, William Hinsberg

Proceedings Volume 7970, 79700F (2011) https://doi.org/10.1117/12.881293

KEYWORDS: Semiconducting wafers, Optical lithography, Etching, Polymers, Lithography, Semiconductors, Inspection, Chemical vapor deposition, Silicon, Directed self assembly

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Proceedings Article | 25 September 2010 Paper

Two complementary methods to characterize long range proximity effects due to develop loading

Linda Sundberg, Greg Wallraff, Alexander Friz, Blake Davis, Amy Zweber, Robert Lovchik, Emmanuel Delamarche, Tasuku Senna, Toru Komizo, William Hinsberg

Proceedings Volume 7823, 78230G (2010) https://doi.org/10.1117/12.864336

KEYWORDS: Critical dimension metrology, Standards development, Electron beam lithography, Lithography, Semiconducting wafers, Deep ultraviolet, Photomasks, Optical lithography, Photoresist processing, Photography

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Proceedings Article | 1 April 2010 Paper

Self-assembling materials for lithographic patterning: overview, status, and moving forward

William Hinsberg, Joy Cheng, Ho-Cheol Kim, Daniel Sanders

Proceedings Volume 7637, 76370G (2010) https://doi.org/10.1117/12.852230

KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Image processing, Dry etching, Gold, Photomasks, Reactive ion etching, Directed self assembly

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Proceedings Article | 30 March 2010 Paper

A method to characterize pattern density effects: chemical flare and develop loading

Linda Sundberg, Gregory Wallraff, Alexander Friz, Amy Zweber, Zdenek Benes, Robert Lovchik, Emmanuel Delamarche, William Hinsberg

Proceedings Volume 7639, 76392S (2010) https://doi.org/10.1117/12.849145

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Liquids, Silicon, Ions, Reactive ion etching, Wafer-level optics, Plasma, Photoresist developing, Optical lithography

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Proceedings Article | 23 March 2009 Paper

Cr migration on 193nm binary photomasks

John Bruley, Geoffrey Burr, Robert Davis, Philip Flaitz, William Hinsberg, Frances Houle, Dolores Miller, Michael Pike, Jed Rankin, Alfred Wagner, Andrew Watts

Proceedings Volume 7272, 727215 (2009) https://doi.org/10.1117/12.813934

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Binary data, Manufacturing, Diffusion, Transmission electron microscopy, Roads, Photoresist materials, Oxidation

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Proceedings Article | 26 March 2007 Paper

A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography

Andrew Merriam, Donald Bethune, John Hoffnagle, William Hinsberg, C. Michael Jefferson, James Jacob, Timothy Litvin

Proceedings Volume 6520, 65202Z (2007) https://doi.org/10.1117/12.712210

KEYWORDS: Semiconducting wafers, Interferometry, Visibility, Solid state lasers, Immersion lithography, Laser sources, Photoresist materials, Prisms, Interferometers, Lithography

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Proceedings Article | 29 March 2006 Paper

Numeric analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography

William Hinsberg, Frances Houle

Proceedings Volume 6153, 615303 (2006) https://doi.org/10.1117/12.656979

KEYWORDS: Lithography, Polymers, Oxygen, Photochemistry, Polymer thin films, Liquids, Photolysis, Hydrogen, Ultraviolet radiation, Oxidation

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Proceedings Article | 29 March 2006 Paper

Dissolution fundamentals of 193-nm methacrylate-based photoresists

Ashwin Rao, Shuhui Kang, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-Li Wu, Karen Turnquest, William Hinsberg

Proceedings Volume 6153, 615310 (2006) https://doi.org/10.1117/12.656540

KEYWORDS: Polymers, Photoresist materials, Quartz, Crystals, Photoresist developing, Lithography, Chemistry, Molecules, Standards development, Infrared spectroscopy

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Proceedings Article | 4 May 2005 Paper

Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)

Ratnam Sooriyakumaran, Hoa Truong, Linda Sundberg, Mark Morris, Bill Hinsberg, Hiroshi Ito, Robert Allen, Wu-Song Huang, Dario Goldfarb, Sean Burns, Dirk Pfeiffer

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600615

KEYWORDS: Silicon, Line edge roughness, Polymers, Glasses, Standards development, Diffusion, Lithography, Spectroscopy, Macromolecules, Chemically amplified resists

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Proceedings Article | 4 May 2005 Paper

Studies of acid diffusion in low Ea chemically amplified photoresists

G. Wallraff, D. Medeiros, C. Larson, M. Sanchez, Karen Petrillo, Wu-Song Huang, C. Rettner, B. Davis, Linda Sundberg, William Hinsberg, F. Houle, J. Hoffnagle, Dario Goldfarb, K. Temple, J. Bucchignano

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601759

KEYWORDS: Diffusion, Absorption, Photoresist materials, Polymers, Humidity, Lithography, Extreme ultraviolet lithography, Image resolution, Infrared imaging, Photoresist processing

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Proceedings Article | 4 May 2005 Paper

Evaluation of functional properties of imaging materials for water immersion lithography

William Hinsberg, J. Hoffnagle, G. Wallraff, C. Larson, F. Houle, Linda Sundberg, Hoa Truong, Blake Davis, Robert Allen

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600560

KEYWORDS: Lithography, Water, Polymers, Liquids, Contamination, Reflectivity, Interferometry, Immersion lithography, Semiconducting wafers, Chemical analysis

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Proceedings Article | 28 May 2004 Paper

Deep-UV immersion interferometric lithography

Alex Raub, Andrew Frauenglass, Steven Brueck, Will Conley, Ralph Dammel, Andy Romano, Mitsuru Sato, William Hinsberg

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536772

KEYWORDS: Liquids, Polymers, Lithography, Water, Coating, Immersion lithography, Interferometry, Picosecond phenomena, Prisms, Refractive index

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Proceedings Article | 28 May 2004 Paper

Fast calculation of images for high numerical aperture lithography

Alan Rosenbluth, Gregg Gallatin, Ronald Gordon, William Hinsberg, John Hoffnagle, Frances Houle, Kafai Lai, Alexey Lvov, Martha Sanchez, Nakgeuon Seong

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537716

KEYWORDS: Polarization, Photomasks, Diffraction, Birefringence, System on a chip, Lithography, Optical proximity correction, Image processing, Modulation transfer functions, Thin films

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Proceedings Article | 14 May 2004 Paper

Liquid immersion lithography: evaluation of resist issues

William Hinsberg, Gregory Wallraff, Carl Larson, Blake Davis, Vaughn Deline, Simone Raoux, Dolores Miller, Frances Houle, John Hoffnagle, Martha Sanchez, Charles Rettner, Linda Sundberg, David Medeiros, Ralph Dammel, Willard Conley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536576

KEYWORDS: Liquids, Polymers, Diffusion, Lithography, Immersion lithography, Polymer thin films, Imaging systems, Neodymium, Semiconducting wafers, Absorption

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Proceedings Article | 14 May 2004 Paper

Reactive dissolution kinetics of lithographic copolymers

William Hinsberg, Frances Houle, Hiroshi Ito

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535599

KEYWORDS: Polymers, Diffusion, Polymer thin films, Ionization, Lithography, Taxonomy, Crystals, Reflectivity, Quartz, Chemical analysis

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Proceedings Article | 12 June 2003 Paper

Using the critical ionization model for resist development to estimate contrast curves and roughening

Frances Houle, William Hinsberg, Martha Sanchez

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485131

KEYWORDS: Polymers, Ionization, Polymer thin films, Systems modeling, Line edge roughness, Photoresist processing, Photoresist materials, Chemically amplified resists, Statistical modeling, Computer simulations

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Proceedings Article | 12 June 2003 Paper

Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers

Hiroshi Ito, William Hinsberg, Larry Rhodes, Chun Chang

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485135

KEYWORDS: Polymers, Hydrogen, Resistance, Reflectivity, Lithography, FT-IR spectroscopy, Absorption, Spectroscopy, Chlorine, Roads

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Proceedings Article | 12 June 2003 Paper

Extendibility of chemically amplified resists: another brick wall?

William Hinsberg, Frances Houle, Martha Sanchez, John Hoffnagle, Gregory Wallraff, David Medeiros, Gregg Gallatin, Jonathan Cobb

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487739

KEYWORDS: Lithography, Image resolution, Polymers, Diffusion, Semiconductors, Photoresist processing, Image processing, Chemically amplified resists, Line edge roughness, Molecules

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Proceedings Article | 2 June 2003 Paper

Characterization of photoresist spatial resolution by interferometric lithography

John Hoffnagle, William Hinsberg, Frances Houle, Martha Sanchez

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485015

KEYWORDS: Modulation transfer functions, Photoresist materials, Interferometry, Spatial resolution, Lithography, Modulation, Spatial frequencies, Deep ultraviolet, Photoresist developing, Optical lithography

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SPIE Journal Paper | 1 October 2002

High numerical aperture lithographic imagery at Brewster's angle

Timothy Brunner, Nakgeuon Seong, William Hinsberg, John Hoffnagle, Frances Houle, Martha Sanchez

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1507337

KEYWORDS: Lithography, Polarization, Photoresist processing, Image processing, Reflectivity, Interferometry, Reflection, Photoresist materials, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 30 July 2002 Paper

High-NA lithographic imagery at Brewster's angle

Timothy Brunner, Nakgeuon Seong, William Hinsberg, John Hoffnagle, Frances Houle, Martha Sanchez

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474473

KEYWORDS: Polarization, Lithography, Reflectivity, Photoresist processing, Reflection, Interferometry, Image processing, Photoresist materials, Optics manufacturing, Semiconducting wafers

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Proceedings Article | 24 July 2002 Paper

High numerical aperture: imaging implications for chemically amplified photoresists

Martha Sanchez, Frances Houle, John Hoffnagle, Timothy Brunner, William Hinsberg

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474233

KEYWORDS: Polarization, Scanning electron microscopy, Lithography, Photoresist materials, Interferometry, Systems modeling, Imaging spectroscopy, Electron microscopes, Antireflective coatings, Image acquisition

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Proceedings Article | 24 July 2002 Paper

Effect of humidity on deprotection kinetics in chemically amplified resists

Sean Burns, David Medeiros, Heather Johnson, Gregory Wallraff, William Hinsberg, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474230

KEYWORDS: Humidity, Photoresist materials, Nitrogen, FT-IR spectroscopy, Semiconducting wafers, Chemically amplified resists, Environmental monitoring, Polymers, Switching, Spectroscopy

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Proceedings Article | 24 July 2002 Paper

Characterization of the polymer-developer interface in 193-nm photoresist polymers and formulations during dissolution

Thomas Wallow, Wendy Chan, William Hinsberg, Seok-Won Lee

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474228

KEYWORDS: Polymers, Resistance, Photoresist materials, Interfaces, Photoresist developing, Solids, Modulation, Standards development, Photoresist processing, Annealing

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Proceedings Article | 16 July 2002 Paper

Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern

Cattien Nguyen, Ramsey Stevens, Jabulani Barber, Jie Han, Meyya Meyyappan, Martha Sanchez, Carl Larson, William Hinsberg

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473506

KEYWORDS: Carbon nanotubes, Photoresist materials, Metrology, Atomic force microscopy, Lithography, Semiconductors, Silicon, Chemical vapor deposition, Profiling, Scanning electron microscopy

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Proceedings Article | 1 July 2002 Paper

EUV photoresist performance results from the VNL and the EUV LLC

Jonathan Cobb, Paul Dentinger, Luke Hunter, Donna O'Connell, Gregg Gallatin, William Hinsberg, Frances Houle, Martha Sanchez, Wolf-Dieter Domke, Stefan Wurm, Uzodinma Okoroanyanwu, Sang Hun Lee

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472316

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Photoresist materials, Scanning electron microscopy, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Deep ultraviolet, Semiconductors, Photoresist developing

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Proceedings Article | 24 August 2001 Paper

Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base

William Hinsberg, Seok-Won Lee, Hiroshi Ito, Donald Horne, Kay Kanazawa

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436809

KEYWORDS: Polymers, Resistance, Polymer thin films, Reflectivity, Infrared spectroscopy, Quartz, Crystals, Resonators, Spectroscopy, Infrared radiation

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Proceedings Article | 24 August 2001 Paper

Characterization of new aromatic polymers for 157-nm photoresist applications

Nicolette Fender, Phillip Brock, W. Chau, S. Bangsaruntip, Arpan Mahorowala, Gregory Wallraff, William Hinsberg, Carl Larson, Hiroshi Ito, Gregory Breyta, Kikue Burnham, Hoa Truong, P. Lawson, Robert Allen

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436873

KEYWORDS: Polymers, Diffusion, Absorbance, Fluorine, Etching, Photoresist materials, Lithography, Silicon, Semiconducting wafers, Transparency

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Proceedings Article | 23 June 2000 Paper

Effect of resist components on image spreading during postexposure bake of chemically amplified resists

William Hinsberg, Frances Houle, Martha Sanchez, Michael Morrison, Gregory Wallraff, Carl Larson, John Hoffnagle, Phillip Brock, Gregory Breyta

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388294

KEYWORDS: Diffusion, Polymers, Chemistry, Photoresist processing, Image processing, Chemically amplified resists, Temperature metrology, Polymer thin films, Chemical analysis, Lithography

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Proceedings Article | 23 June 2000 Paper

Real-time analysis of volatiles formed during processing of a chemically amplified resist

Frances Houle, G. Poliskie, William Hinsberg, Dean Pearson, Martha Sanchez, Hiroshi Ito, John Hoffnagle

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388301

KEYWORDS: Ions, Polymers, Chemical analysis, Chemistry, Ionization, Spectroscopy, Molecules, Mass spectrometry, Nitrogen, Chemically amplified resists

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Proceedings Article | 11 June 1999 Paper

Aerial image contrast using interferometric lithography: effect on line-edge roughness

Martha Sanchez, William Hinsberg, Frances Houle, John Hoffnagle, Hiroshi Ito, Cattien Nguyen

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350198

KEYWORDS: Line edge roughness, Lithography, Polymers, Interferometry, Photoresist materials, Scanning electron microscopy, Image analysis, Semiconducting wafers, Chemistry, Modulation

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Proceedings Article | 11 June 1999 Paper

Experimental method for quantifying acid diffusion in chemically amplified resists

Gregory Wallraff, William Hinsberg, Frances Houle, Mons Morrison, Carl Larson, Martha Sanchez, John Hoffnagle, Phillip Brock, Gregory Breyta

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350196

KEYWORDS: Diffusion, Polymers, Polymer thin films, Image processing, Chemistry, Chemically amplified resists, Systems modeling, Quantum efficiency, Semiconducting wafers, 3D image processing

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Proceedings Article | 29 June 1998 Paper

Probabilistic model for the mechanism of phenolic polymer dissolution

Lewis Flanagin, Christopher McAdams, Pavlos Tsiartas, Clifford Henderson, William Hinsberg, C. Grant Willson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312416

KEYWORDS: Polymers, Polymerization, Ionization, Photoresist materials, Data modeling, Diffusion, Polymer thin films, Photoresist developing, Etching, Polymethylmethacrylate

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Proceedings Article | 7 July 1997 Paper

Diffusivity measurements in polymers: II. Residual casting solvent measurement by liquid scintillation counting

Allen Gardiner, Anwei Qin, Clifford Henderson, Sanju Pancholi, William Koros, C. Grant Willson, Ralph Dammel, Chris Mack, William Hinsberg

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275886

KEYWORDS: Scintillation, Diffusion, Liquids, Process control, Refraction, Data modeling, Semiconducting wafers, Picture Archiving and Communication System, Temperature metrology, Polymers

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Proceedings Article | 7 July 1997 Paper

Reactivity and kinetic parameters for UVIIHS

Gregory Wallraff, Juliann Opitz, William Hinsberg, Frances Houle, James Thackeray, Theodore Fedynyshyn, Doris Kang, Martha Rajaratnam

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275851

KEYWORDS: Systems modeling, Polymers, Chemistry, Stochastic processes, Deep ultraviolet, Catalysis, Contamination, Semiconducting wafers, Chemical analysis, Atmospheric modeling

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Proceedings Article | 9 June 1995 Paper

Lithographic performance of a positive photoresist for thick-film applications

Alfred Renaldo, Laurie Lauchlan, Donald Hofer, William Hinsberg, Dennis McKean, Hugo Santini, C. Grant Willson

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210414

KEYWORDS: Photoresist materials, Photoresist developing, Lithography, Scanning electron microscopy, Copper, Thin films, Thin film coatings, Head, Electroplating, Metals

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Proceedings Article | 9 June 1995 Paper

Kinetics of chemically amplified resists

Gregory Wallraff, William Hinsberg, Frances Houle, Juliann Opitz, Dale Hopper, John Hutchinson

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210391

KEYWORDS: Polymers, Photoresist processing, Diffusion, Systems modeling, Catalysis, Chemically amplified resists, Lithography, Ultraviolet radiation, Deep ultraviolet, Chemistry

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Proceedings Article | 9 June 1995 Paper

Characterization and modeling of a chemically amplified resist for ArF lithography

John Hutchinson, Gregory Wallraff, William Hinsberg, Juliann Opitz, William Oldham

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210397

KEYWORDS: Lithography, Data modeling, Statistical modeling, Photoresist processing, Chemically amplified resists, Photoresist materials, FT-IR spectroscopy, Scanning electron microscopy, Absorption, Excimer lasers

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Proceedings Article | 16 May 1994 Paper

Role of residual casting solvent in dissolution behavior of poly (3-methyl-4-hydroxystyrene) films

Veena Rao, William Hinsberg, Curtis Frank, Roger Fabian Pease

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175373

KEYWORDS: Polymers, Diffusion, Annealing, Polymer thin films, Hydrogen, Thin films, Data modeling, Liquids, Chemical engineering, Polymethylmethacrylate

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SPIE Journal Paper | 1 October 1993

Acid-catalyzed single-layer resists for ArF lithography

Roderick Kunz, Robert Allen, William Hinsberg, Gregory Wallraff

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.145955

KEYWORDS: Lithography, Deep ultraviolet, Absorption, Prototyping, Chemically amplified resists, Optical lithography, Photoresist materials, Printing, Absorbance, Laser development

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