Mr. Lawrence Lane Profile

Lawrence Lane

Director of Applications at Tokyo Electron America Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 5 April 2007 Paper

OCD metrology by floating n/k

Shinn-Sheng Yu, Jacky Huang, Chih-Ming Ke, Tsai-Sheng Gau, Burn Lin, Anthony Yen, Lawrence Lane, Vi Vuong, Yan Chen

Proceedings Volume 6518, 65183C (2007) https://doi.org/10.1117/12.713341

KEYWORDS: Metrology, Semiconducting wafers, Critical dimension metrology, Lithography, Thin films, Scanning electron microscopy, Process control, Deposition processes, Roentgenium, Error analysis

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Implementation strategies and return on investment for integrated CD control

Lawrence Lane, Bob Monteverde

Proceedings Volume 6518, 651857 (2007) https://doi.org/10.1117/12.729247

KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Lithography, Process control, Scatterometry, Scanners, Yield improvement, Control systems, Time metrology

Read Abstract +

Proceedings Article | 10 May 2005 Paper

A comprehensive comparison of spectral scatterometry hardware

Kevin Lensing, Broc Stirton, Brian Starnes, Joseph Synoradzki, Bryan Swain, Lawrence Lane

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600783

KEYWORDS: Critical dimension metrology, Scatterometry, Reflectance spectroscopy, Reflectometry, Metrology, Spectroscopy, Reflectivity, Logic, Data modeling, Lithography

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Metrology exposure-induced resist and ARC damage

Jackie Yu, Anita Viswanathan, Mokoto Miyagi, Junichi Uchida, Lawrence Lane, Kelly Barry, Machi Kajitani, Toshihiko Kikuchi, K. Chan, Fred Stanke

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534373

KEYWORDS: Metrology, Optical filters, Reflectivity, Silicon, Critical dimension metrology, Semiconducting wafers, Process control, Ultraviolet radiation, Photoresist materials, Scatterometry

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Characterization of integrated optical CD for process control

Jackie Yu, Junichi Uchida, Youri van Dommelen, Rene Carpaij, Shaunee Cheng, Ivan Pollentier, Anita Viswanathan, Lawrence Lane, Kelly Barry, Nickhil Jakatdar

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535949

KEYWORDS: Critical dimension metrology, Metrology, Semiconducting wafers, Process control, Cadmium, Integrated optics, Finite element methods, Scatterometry, Wafer-level optics, Semiconductors

Read Abstract +

Proceedings Article | 15 July 2003 Paper

LithoCell-integrated critical dimension metrology

J. Stirton, Clinton Miller, Anita Viswanathan, Makoto Miyagi, Lawrence Lane, Michael Laughery, Tarun Parikh, Kin Chung Chan, Apo Sezginer

Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.485241

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Metrology, Particles, Time metrology, Control systems, Metals, Scanning electron microscopy, Tin, Process control

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years