Dr. Pavlos C. Tsiartas Profile

Dr. Pavlos C. Tsiartas

Post-Doctoral Fellow at Univ of Texas at Austin

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Publications (11)

Proceedings Article | 24 March 2006 Paper

Photocurable Pillar Arrays Formed via AC- and Ultrasound-Induced Electrohydrodynamic Instabilities

Pavlos Tsiartas, Michael Dickey, Keris Allrich, C. Willson

Proceedings Volume 6151, 61513G (2006) https://doi.org/10.1117/12.657442

KEYWORDS: Electrodes, Polymers, Ultrasonics, Transducers, Polymer thin films, Capacitors, Photomicroscopy, Optical lithography, Glasses, Image analysis

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Proceedings Article | 4 May 2005 Paper

Understanding the photoresist surface-liquid interface for ArF immersion lithography

Will Conley, Robert LeSuer, Frank Fan, Allen Bard, Chris Taylor, Pavlos Tsiartas, Grant Willson, Andrew Romano, Ralph Dammel

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601482

KEYWORDS: Photoresist materials, Semiconducting wafers, Scintillation, Liquids, Water, Immersion lithography, Polymers, Interfaces, Signal detection, Fluorine

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Proceedings Article | 14 May 2004 Paper

Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography

Robert LeSuer, Fu-Ren Fan, Allen Bard, J. Christopher Taylor, Pavlos Tsiartas, Grant Willson, Willard Conley, Gene Feit, Roderick Kunz

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537527

KEYWORDS: Electrodes, Chemistry, Interfaces, Mercury, Immersion lithography, Platinum, Microscopy, Scanning probe microscopy, Water, Antimony

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Proceedings Article | 12 June 2003 Paper

Fundamental study of photoresist dissolution with real-time spectroscopic ellipsometry and interferometry

Sean Burns, Gerard Schmid, Brian Trinque, James Willson, Jennifer Wunderlich, Pavlos Tsiartas, James Taylor, Ryan Burns, C. Wilson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485182

KEYWORDS: Polymers, Interferometry, Data modeling, Photoresist materials, Water, Ellipsometry, Spectroscopic ellipsometry, Reflectivity, Refraction, Thin films

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Proceedings Article | 29 June 1998 Paper

Probabilistic model for the mechanism of phenolic polymer dissolution

Lewis Flanagin, Christopher McAdams, Pavlos Tsiartas, Clifford Henderson, William Hinsberg, C. Grant Willson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312416

KEYWORDS: Polymers, Polymerization, Ionization, Photoresist materials, Data modeling, Diffusion, Polymer thin films, Photoresist developing, Etching, Polymethylmethacrylate

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Proceedings Article | 29 June 1998 Paper

Dissolution of phenolic polymers in aqueous base: the influence of polymer structure

Christopher McAdams, Lewis Flanagin, Clifford Henderson, Adam Pawlowski, Pavlos Tsiartas, C. Grant Willson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312345

KEYWORDS: Polymers, Ionization, Hydrogen, Photoresist materials, Diffusion, Deep ultraviolet, Chromophores, Photoresist developing, Polarization, Ions

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Proceedings Article | 29 June 1998 Paper

Modeling parameter extraction for DNQ-novolak thick film resists

Clifford Henderson, Steven Scheer, Pavlos Tsiartas, Benjamen Rathsack, John Sagan, Ralph Dammel, Andreas Erdmann, C. Grant Willson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312415

KEYWORDS: Refractive index, Data modeling, Photoresist developing, Photoresist materials, Reflectivity, Software development, Silicon, Lithography, Absorbance, Picture Archiving and Communication System

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Proceedings Article | 7 July 1997 Paper

Photoresist characterization for lithography simulation: IV. Processing effects on resist parameters

Clifford Henderson, Pavlos Tsiartas, Lewis Flanagin, Sanju Pancholi, Sajed Chowdhury, Katherine Dombrowski, Ammar Chinwalla, C. Grant Willson

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275820

KEYWORDS: Photoresist developing, Semiconducting wafers, Photoresist materials, Lithography, Picture Archiving and Communication System, Refractive index, Absorption, Photoresist processing, Statistical analysis, Data modeling

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Proceedings Article | 7 July 1997 Paper

Photoresist characterization for lithography simulation: III. Development parameter measurements

Clifford Henderson, Pavlos Tsiartas, Sanju Pancholi, Sajed Chowdhury, Katherine Dombrowski, C. Grant Willson, Ralph Dammel

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275882

KEYWORDS: Photoresist developing, Data modeling, Picture Archiving and Communication System, Diffusion, Refractive index, Photoresist materials, Lithography, Information operations, Semiconducting wafers, Silicon

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Proceedings Article | 14 June 1996 Paper

Factors affecting the dissolution rate of novolac resins II: developer composition effects

Clifford Henderson, Pavlos Tsiartas, Logan Simpson, Kelly Clayton, Sanju Pancholi, Adam Pawlowski, C. Grant Willson

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241846

KEYWORDS: Ions, Polymers, Alkali metals, Potassium, Macromolecules, Interfaces, Polymer thin films, Molecules, Photoresist developing, Photoresist materials

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Proceedings Article | 9 June 1995 Paper

Effect of molecular weight distribution on the dissolution properties of novolac blends

Pavlos Tsiartas, Logan Simpson, Anwei Qin, C. Grant Willson, Robert Allen, Val Krukonis, Paula Gallagher-Wetmore

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210347

KEYWORDS: Manganese, Binary data, Potassium, Photoresist materials, Polymers, Coating, Calibration, Standards development, Statistical analysis, Roads

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Showing 5 of 11 publications

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