Mr. Shinji Kobayashi Profile

Shinji Kobayashi

Chief Engineer at TOKYO ELECTRON KYUSHU LIMITED

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Author

Publications (19)

Proceedings Article | 20 March 2020 Presentation + Paper

Statistical local CD uniformity with novel SEM noise reduction method

Shinji Kobayashi

Proceedings Volume 11325, 1132520 (2020) https://doi.org/10.1117/12.2551821

KEYWORDS: Line width roughness, Critical dimension metrology, Scanning electron microscopy, Denoising, Edge detection, Image analysis, Statistical analysis, Image filtering, Correlation function, Stochastic processes

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Proceedings Article | 26 March 2019 Paper

New method removing SEM image noise to characterize CD and LWR

Shinji Kobayashi, Satoru Shimura, Masashi Enomoto, Robert Kern, Timothy Diller, Tony McDaniel, Nan Qin, Thomas Reay, Roger Serwy

Proceedings Volume 10959, 109592N (2019) https://doi.org/10.1117/12.2514661

KEYWORDS: Line width roughness, Scanning electron microscopy, Image processing, Image analysis, Image filtering, Stochastic processes, Semiconducting wafers, Critical dimension metrology, Gaussian filters

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Proceedings Article | 25 March 2019 Paper

Robustness of interactive pattern fidelity error as a quality metric for integrated patterning

Soichiro Okada, Shinji Kobayashi, Satoru Shimura, Masashi Enomoto, Shota Yoshimura, Kiyohito Ito, Shinya Morikita

Proceedings Volume 10960, 109601P (2019) https://doi.org/10.1117/12.2514663

KEYWORDS: Critical dimension metrology, Optical lithography, Overlay metrology, Etching, Stochastic processes, Semiconducting wafers, Statistical analysis

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Proceedings Article | 13 March 2018 Paper

Monte Carlo simulation of edge placement error

Shinji Kobayashi, Soichiro Okada, Satoru Shimura, Kathleen Nafus, Carlos Fonseca, Joel Estrella, Masashi Enomoto

Proceedings Volume 10585, 1058529 (2018) https://doi.org/10.1117/12.2297135

KEYWORDS: Semiconducting wafers, Monte Carlo methods, Line width roughness, Critical dimension metrology, Bridges, Statistical analysis, Stochastic processes, Overlay metrology, Semiconductors

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Proceedings Article | 27 March 2017 Presentation + Paper

Pattern uniformity control in integrated structures

Shinji Kobayashi, Soichiro Okada, Satoru Shimura, Kathleen Nafus, Carlos Fonseca, Serge Biesemans, Masashi Enomoto

Proceedings Volume 10146, 101461B (2017) https://doi.org/10.1117/12.2257868

KEYWORDS: Critical dimension metrology, Overlay metrology, Semiconductors, Error control coding, Optical lithography, Control systems, Manufacturing equipment, Lithography, Etching, Semiconducting wafers, Bridges, Line width roughness, Reticles, Statistical analysis, Stochastic processes, Data modeling, Digital electronics

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Proceedings Article | 21 March 2016 Paper

Analyzing block placement errors in SADP patterning

Shinji Kobayashi, Soichiro Okada, Satoru Shimura, Kathleen Nafus, Carlos Fonseca, Marc Demand, Serge Biesemans, Janko Versluijs, Monique Ercken, Philippe Foubert, Shinobu Miyazaki

Proceedings Volume 9779, 97791T (2016) https://doi.org/10.1117/12.2218597

KEYWORDS: Optical lithography, Overlay metrology, Process control, Error analysis, Semiconductors, Error control coding, Wafer inspection, Inspection, Manufacturing, Semiconducting wafers, System on a chip, Etching, Device simulation, Plasma etching, Scanning electron microscopy, Tin

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Proceedings Article | 8 April 2011 Paper

EUV processing investigation on state of the art coater/developer system

H. Shite, N. Bradon, T. Shimoaoki, S. Kobayashi, K. Nafus, H. Kosugi, P. Foubert, J. Hermans, E. Hendrickx, M. Goethals, R. Gronheid, C. Jehoul

Proceedings Volume 7969, 796937 (2011) https://doi.org/10.1117/12.879406

KEYWORDS: Photoresist processing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Standards development, Manufacturing, Particles, Critical dimension metrology

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Proceedings Article | 30 March 2010 Paper

LWR reduction by novel lithographic and etch techniques

Shinji Kobayashi, Satoru Shimura, Tetsu Kawasaki, Kathleen Nafus, Shinichi Hatakeyama, Hideo Shite, Eiichi Nishimura, Masato Kushibiki, Arisa Hara, Roel Gronheid, Alessandro Vaglio-Pret, Junichi Kitano

Proceedings Volume 7639, 763914 (2010) https://doi.org/10.1117/12.846318

KEYWORDS: Line width roughness, Photoresist processing, Etching, Image processing, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Image analysis, Coating, Critical dimension metrology

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Proceedings Article | 1 April 2009 Paper

EUV resist outgassing quantification and application

Shinji Kobayashi, Julius Joseph Santillan, Hiroaki Oizumi, Toshiro Itani

Proceedings Volume 7273, 72731P (2009) https://doi.org/10.1117/12.813362

KEYWORDS: Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Ions, Protactinium, Contamination, Semiconducting wafers, Mirrors, Quality measurement, Chemical analysis

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Proceedings Article | 1 April 2009 Paper

Development of EUV resists at Selete

Hiroaki Oizumi, Daisuke Kawamura, Koji Kaneyama, Shinji Kobayashi, Toshiro Itani

Proceedings Volume 7273, 72731M (2009) https://doi.org/10.1117/12.812937

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Optical lithography, Manufacturing, Standards development, Semiconductors, Photoresist processing, Chemically amplified resists, Diffusion

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Proceedings Article | 1 April 2009 Paper

EUV resist processing in vacuum

Koji Kaneyama, Shinji Kobayashi, Toshiro Itani

Proceedings Volume 7273, 72731Q (2009) https://doi.org/10.1117/12.813365

KEYWORDS: Photoresist processing, Lithography, Extreme ultraviolet lithography, Line width roughness, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Protactinium, Cooling systems, Image resolution

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Proceedings Article | 1 April 2009 Paper

Evaluation of track performance for EUV lithography

Keiichi Tanaka, Junji Nakamura, Yoshiaki Yamada, Shinji Kobayashi, Toshiro Itani

Proceedings Volume 7273, 727320 (2009) https://doi.org/10.1117/12.813989

KEYWORDS: Polymers, Semiconducting wafers, Coating, Silicon, Extreme ultraviolet, Extreme ultraviolet lithography, Liquids, Photoresist processing, Time metrology, Solids

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Proceedings Article | 4 December 2008 Paper

Current benchmarking results of EUV resist at Selete

Daisuke Kawamura, Koji Kaneyama, Shinji Kobayashi, Hiroaki Oizumi, Toshiro Itani

Proceedings Volume 7140, 714008 (2008) https://doi.org/10.1117/12.804665

KEYWORDS: Line width roughness, Extreme ultraviolet, Convolution, Lithographic illumination, Extreme ultraviolet lithography, Scanning electron microscopy, Polymers, Manufacturing, Electroluminescence, Point spread functions

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Proceedings Article | 15 April 2008 Paper

Quantitative analysis of EUV resist outgassing

Shinji Kobayashi, Julius Joseph Santillan, Toshiro Itani

Proceedings Volume 6923, 692345 (2008) https://doi.org/10.1117/12.771828

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Molecules, Semiconducting wafers, Xenon, Analytical research, Protactinium, Mirrors, EUV optics, Wafer-level optics

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Proceedings Article | 4 April 2008 Paper

EUV resist outgassing analysis in Selete

Julius Joseph Santillan, Shinji Kobayashi, Toshiro Itani

Proceedings Volume 6923, 692342 (2008) https://doi.org/10.1117/12.771779

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Carbon dioxide, Ions, Molecules, Protactinium, Analytical research, Statistical analysis, Mass spectrometry, Line width roughness

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Proceedings Article | 4 April 2008 Paper

EUV resist development in Selete

Daisuke Kawamura, Koji Kaneyama, Shinji Kobayashi, Julius Joseph Santillan, Toshiro Itani

Proceedings Volume 6923, 692313 (2008) https://doi.org/10.1117/12.771858

KEYWORDS: Line width roughness, Extreme ultraviolet, Electroluminescence, Scanning electron microscopy, Extreme ultraviolet lithography, Solids, 3D modeling, Diffusion, Photomasks, Lithographic illumination

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Proceedings Article | 26 March 2008 Paper

Surface roughness of molecular resist for EUV lithography

Minoru Toriumi, Koji Kaneyama, Shinji Kobayashi, Toshiro Itani

Proceedings Volume 6923, 69230L (2008) https://doi.org/10.1117/12.772349

KEYWORDS: Polymers, Surface roughness, Line edge roughness, Spatial frequencies, Extreme ultraviolet lithography, Atomic force microscopy, Polymer thin films, Extreme ultraviolet, Photoresist processing, Image processing

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Proceedings Article | 6 December 2004 Paper

Advanced edge resist remover for photomask

Shinji Kobayashi, Norihisa Koga, Yasuo Mori, Masatoshi Kaneda

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569181

KEYWORDS: Photomasks, Photoresist processing, Particles, Coating, Manufacturing equipment, Sensors, Manufacturing, Contamination, Photomask technology, Standards development

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Proceedings Article | 1 August 2002 Paper

Model of coating and drying process for flat polymer film fabrication

Hiroyuki Kagami, Ryuji Miyagawa, Atsushi Kawata, Daisuke Nakashima, Shinji Kobayashi, Takahiro Kitano, Kazuhiro Takeshita, Hiroshi Kubota, Tadahiro Ohmi

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476948

KEYWORDS: Diffusion, Molecules, Liquids, Polymers, Polymer thin films, Coating, Thin films, Electrochemical etching, Photoresist processing, Dielectrics

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Showing 5 of 19 publications

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