Prof. Vladimir Dmitriev
Technology Manager at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 13 November 2024 Presentation
Scott Chegwidden, Chang Ju Choi, Joseph Rodriguez, Safak Sayan, Avi Cohen, Vladimir Dmitriev
Proceedings Volume 13216, 132161X (2024) https://doi.org/10.1117/12.3038761
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Opacity

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 111770J (2019) https://doi.org/10.1117/12.2535641
KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Scanners, Image processing, Deep ultraviolet, Lithography, Metrology, Chemical elements, Error analysis

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109592K (2019) https://doi.org/10.1117/12.2516362
KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Scanners, Deep ultraviolet, Lithography, Metrology

Proceedings Article | 5 June 2018 Paper
Markus Seesselberg, Vladimir Dmitriev, Uri Stern, Joachim Welte
Proceedings Volume 10690, 106900Y (2018) https://doi.org/10.1117/12.2317723
KEYWORDS: Photomasks, Optical design, Monochromatic aberrations

SPIE Journal Paper | 9 June 2016
JM3, Vol. 15, Issue 02, 021410, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021410
KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Image registration, Birefringence, Pulsed laser operation, Inspection, Calibration, Metrology, Overlay metrology

Showing 5 of 24 publications
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