Ms. Ayako Sukegawa Profile

Ayako Sukegawa

at Nikon Corp

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Author

Publications (6)

Proceedings Article | 31 March 2014 Paper

Scanner performance predictor and optimizer in further low-k1 lithography

Hajime Aoyama, Toshiharu Nakashima, Taro Ogata, Shintaro Kudo, Naonori Kita, Junji Ikeda, Ryota Matsui, Hajime Yamamoto, Ayako Sukegawa, Katsushi Makino, Masayuki Murayama, Kazuo Masaki, Tomoyuki Matsuyama

Proceedings Volume 9052, 90520A (2014) https://doi.org/10.1117/12.2046547

KEYWORDS: Reticles, Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Lithography, Electroluminescence, Error analysis, Distortion, Data modeling

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Proceedings Article | 5 April 2007 Paper

Improved overlay control through automated high order compensation

S. Wakamoto, Y. Ishii, K. Yasukawa, A. Sukegawa, S. Maejima, A. Kato, J. Robinson, B. Eichelberger, P. Izikson, M. Adel

Proceedings Volume 6518, 65180J (2007) https://doi.org/10.1117/12.712710

KEYWORDS: Scanners, Distortion, Databases, Semiconducting wafers, Overlay metrology, Reticles, Control systems, Optical alignment, Lithography, Error analysis

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Proceedings Article | 26 March 2007 Paper

Current status of high-index immersion lithography development

Yasuhiro Ohmura, Toshiharu Nakashima, Hiroyuki Nagasaka, Ayako Sukegawa, Satoshi Ishiyama, Koichi Kamijo, Masahiko Shinkai, Soichi Owa

Proceedings Volume 6520, 652006 (2007) https://doi.org/10.1117/12.711252

KEYWORDS: Microfluidics, Immersion lithography, Lithography, Refractive index, Water, Lens design, Semiconducting wafers, Absorption, Birefringence, Polarization

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Proceedings Article | 24 March 2006 Paper

Overlay improvement by using new framework of grid compensation for matching

Ayako Sukegawa, Shinji Wakamoto, Shinichi Nakajima, Masaharu Kawakubo, Nobutaka Magome

Proceedings Volume 6152, 61523A (2006) https://doi.org/10.1117/12.656876

KEYWORDS: Semiconducting wafers, Overlay metrology, Distortion, Optical alignment, Lithography, Data processing, Semiconductor manufacturing, Thermal effects, Control systems, Data modeling

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Proceedings Article | 26 June 2003 Paper

Outlier rejection with mixture models in alignment

Shinichi Nakajima, Yuho Kanaya, Mengling Li, Taro Sugihara, Ayako Sukegawa, Nobutaka Magome

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485385

KEYWORDS: Expectation maximization algorithms, Statistical analysis, Optical alignment, Computer simulations, Particles, Semiconducting wafers, Neodymium, Lithography, Distortion, Visibility

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Proceedings Article | 2 June 2003 Paper

New method to reduce alignment error by optical system

Tadashi Nagayama, Shinichi Nakajima, Ayako Sugaya, Yuho Kanaya, Ayako Sukegawa

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483513

KEYWORDS: Optical alignment, Semiconducting wafers, Monochromatic aberrations, Neodymium, Microscopes, Spatial frequencies, Reflectivity, Chemical mechanical planarization, Phase shifts, Image analysis

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Showing 5 of 6 publications

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