Mr. Andy J. Hazelton Profile

Andy J. Hazelton

at Intuitive Surgical Inc

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 10 March 2010 Paper

Double patterning lithography study with high overlay accuracy

Takahisa Kikuchi, Yosuke Shirata, Masahiko Yasuda, Yasuhiro Iriuchijima, Kengo Takemasa, Ryo Tanaka, Andrew Hazelton, Yuuki Ishii

Proceedings Volume 7640, 76400H (2010) https://doi.org/10.1117/12.846486

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Immersion lithography, Scanners, Glasses, Overlay metrology

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Proceedings Article | 18 March 2009 Paper

Estimation of cost comparison of lithography technologies at the 22-nm half-pitch node

Andrea Wüest, Andrew Hazelton, Greg Hughes

Proceedings Volume 7271, 72710Y (2009) https://doi.org/10.1117/12.814255

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Semiconducting wafers, Etching, Reticles, Double patterning technology, Metrology, Process modeling

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Proceedings Article | 16 March 2009 Paper

Impact of CD and overlay errors on double-patterning processes

Céline Lapeyre, Sébastien Barnola, Isabelle Servin, Stéphanie Gaugirana, Vincent Salvetat, Nobutaka Magome, Andrew Hazelton, Martin McCallum

Proceedings Volume 7274, 72740W (2009) https://doi.org/10.1117/12.814165

KEYWORDS: Double patterning technology, Etching, Semiconducting wafers, Lithography, Photomasks, Image processing, Photoresist processing, Reticles, Line width roughness, Overlay metrology

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Proceedings Article | 16 March 2009 Paper

Achieving overlay budgets for double patterning

Andrew Hazelton, Nobutaka Magome, Shinji Wakamoto, Akira Tokui, Céline Lapeyre, Sébastien Barnola, Guillaume Jullien, Vincent Salvetat

Proceedings Volume 7274, 72740X (2009) https://doi.org/10.1117/12.813599

KEYWORDS: Double patterning technology, Optical alignment, Semiconducting wafers, Optical lithography, Distortion, Etching, Overlay metrology, Lithography, Reticles, Logic

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SPIE Journal Paper | 1 January 2009

Double-patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

JM3, Vol. 8, Issue 01, 011003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3023077

KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

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Proceedings Article | 4 December 2008 Paper

Cost of ownership for future lithography technologies

Andrew Hazelton, Andrea Wüest, Greg Hughes, Lloyd Litt, Frank Goodwin

Proceedings Volume 7140, 71401Q (2008) https://doi.org/10.1117/12.804711

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Semiconducting wafers, Etching, Reticles, Metrology, Double patterning technology, Process modeling

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Proceedings Article | 4 December 2008 Paper

Exposure tool for 32-nm lithography: requirements and development progress

Andrew Hazelton, Jun Ishikawa, Nobutaka Magome

Proceedings Volume 7140, 714028 (2008) https://doi.org/10.1117/12.804647

KEYWORDS: Double patterning technology, Reticles, Semiconducting wafers, Lithography, Etching, Photomasks, Distortion, Photoresist processing, Interferometers, Logic

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Proceedings Article | 19 May 2008 Paper

Predicting lithography costs: guidance for ≤ 32 nm patterning solutions

Andrew Hazelton, Andrea Wüest, Greg Hughes, Michael Lercel

Proceedings Volume 7028, 70283N (2008) https://doi.org/10.1117/12.793129

KEYWORDS: Lithography, Extreme ultraviolet, Photomasks, Reticles, Double patterning technology, Optical lithography, Extreme ultraviolet lithography, Etching, Semiconducting wafers, Manufacturing

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Proceedings Article | 11 April 2008 Paper

The rapid introduction of immersion lithography for NAND flash: challenges and experience

Chan-Tsun Wu, Hung Ming Lin, Wei-Ming Wu, Meng-Hsun Chan, Benjamin Lin, Kuan-Heng Lin, Andrew Hazelton, Toshio Ohhashi, Katsushi Nakano, Yasuhiro Iriuchijima, Chunhsin Lee, Long Hung

Proceedings Volume 6924, 69241A (2008) https://doi.org/10.1117/12.772448

KEYWORDS: Photoresist materials, Semiconducting wafers, Particles, Scanners, Line width roughness, Immersion lithography, Lithography, Critical dimension metrology, Coating, Defect inspection

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Proceedings Article | 7 March 2008 Paper

Double patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

Proceedings Volume 6924, 69240R (2008) https://doi.org/10.1117/12.771914

KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Semiconducting wafers, Lithography, Image processing, Photoresist processing, Optical lithography, Deposition processes

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Proceedings Article | 7 March 2008 Paper

Recent performance results of Nikon immersion lithography tools

Andrew Hazelton, Kenichi Shiraishi, Shinji Wakamoto, Yuuki Ishii, Masahiko Okumura, Nobutaka Magome, Hiroyuki Suzuki

Proceedings Volume 6924, 69241N (2008) https://doi.org/10.1117/12.771823

KEYWORDS: Semiconducting wafers, Calibration, Immersion lithography, Sensors, Scanners, Critical dimension metrology, Lens design, Manufacturing, Imaging systems, Control systems

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Proceedings Article | 21 November 1995 Paper

Autonomous agent for on-machine acceptance of machined components

Carmen Pancerella, Andrew Hazelton, H. Frost

Proceedings Volume 2596, (1995) https://doi.org/10.1117/12.227212

KEYWORDS: Inspection, Manufacturing, Computer aided design, Process modeling, Systems modeling, Tolerancing, Data modeling, Design for manufacturability, Data processing, CAD systems

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Showing 5 of 12 publications

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