Ms. Marylyn Hoy Bennett Profile

Marylyn Hoy Bennett

Retired

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 12 May 2005 Paper

Paper

Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations

Marylyn Bennett, Andrew Grenville, Scott Hector, Shane Palmer, Leonardus Leunissen, Vicky Philipsen, Theodore Bloomstein, Dennis Hardy, Mordechai Rothschild, James Hilfiker

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600098

KEYWORDS: Photomasks, Diffraction, Sensors, Polarization, Binary data, Diffraction gratings, Phase shifts, Polarizers, Laser beam diagnostics, Attenuators

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Proceedings Article | 24 May 2004 Paper

Paper

Phase defect detection with spatial heterodyne interferometry

Philip Bingham, Kenneth Tobin, Marylyn Bennett, Pat Marmillion

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536765

KEYWORDS: Phase shifts, Defect detection, Photomasks, Wavefronts, Reflectivity, Phase measurement, Inspection, Heterodyning, Interferometry, Imaging systems

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SPIE Journal Paper | 1 April 2004

Photomask dimensional metrology in the scanning electron microscope, part II: High-pressure/environmental scanning electron microscope

Michael Postek, András Vladár, Marylyn Bennett, Trisha Rice, Ralph Knowles

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1668272

KEYWORDS: Scanning electron microscopy, Photomasks, Metrology, Electron beams, Dimensional metrology, Electron microscopes, Inspection, Contamination, Semiconducting wafers, Sensors

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SPIE Journal Paper | 1 April 2004

Photomask dimensional metrology in the scanning electron microscope, part I: Has anything really changed?

Michael Postek, András Vladár, Marylyn Bennett

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1668271

KEYWORDS: Photomasks, Metrology, Scanning electron microscopy, Standards development, Dimensional metrology, Calibration, Electron beams, Semiconducting wafers, Instrument modeling, Semiconductors

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Proceedings Article | 17 December 2003 Paper

Paper

Preliminary results for mask metrology using spatial heterodyne interferometry

Philip Bingham, Kenneth Tobin, Marylyn Bennett, Pat Marmillion

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518364

KEYWORDS: Photomasks, Metrology, Phase measurement, Phase shifts, Inspection, Wavefronts, Phase shifting, Refraction, Semiconducting wafers, Quartz

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Proceedings Article | 15 July 2003 Paper

Paper

Sidewall structure estimation from CD-SEM for lithographic process control

Philip Bingham, Jeffery Price, Kenneth Tobin, Thomas Karnowski, Marylyn Bennett, E. Hal Bogardus, Michael Bishop

Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.485229

KEYWORDS: Scanning electron microscopy, Finite element methods, Feature extraction, Databases, Semiconducting wafers, Critical dimension metrology, Sensors, Lithography, Image retrieval, Electron beams

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Proceedings Article | 2 June 2003 Paper

Paper

Implementation of reference measurement system using CD-AFM

Ronald Dixson, Angela Guerry, Marylyn Bennett, Theodore Vorburger, Benjamin Bunday

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483667

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Standards development, Calibration, Atomic force microscopy, Metrology, Critical dimension metrology, Error analysis, Semiconductor manufacturing, Line edge roughness

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Proceedings Article | 27 December 2002 Paper

Paper

Photomask dimensional metrology in the SEM: Has anything really changed?

Michael Postek, Andras Vladar, Marylyn Bennett

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467760

KEYWORDS: Metrology, Photomasks, Scanning electron microscopy, Standards development, Semiconducting wafers, Electron beams, Dimensional metrology, Instrument modeling, Calibration, Semiconductors

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Proceedings Article | 16 July 2002 Paper

Paper

Toward traceability for at-line AFM dimensional metrology

Ronald Dixson, Angela Guerry, Marylyn Bennett, Theodore Vorburger, Michael Postek

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473471

KEYWORDS: Calibration, Semiconducting wafers, Metrology, Standards development, Scanners, Line edge roughness, Error analysis, Motion measurement, Atomic force microscopy, Scanning electron microscopy

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Proceedings Article | 16 July 2002 Paper

Paper

Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control

Benjamin Bunday, Michael Bishop, Marylyn Bennett, John Swyers, Zipora Haberman-Golan

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473452

KEYWORDS: Semiconducting wafers, Calibration, Etching, Critical dimension metrology, Scanning electron microscopy, Lithography, Line edge roughness, Cadmium, Error analysis, Process control

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Proceedings Article | 16 July 2002 Paper

Paper

CD reference materials for sub-10th um applications

Michael Cresswell, E. Hal Bogardus, J.V. Martinez de Pinillos, Marylyn Bennett, Richard Allen, William Guthrie, Christine Murabito, Barbara am Ende, Loren Linholm

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473450

KEYWORDS: Cadmium, Silicon, Semiconducting wafers, Resistance, Oxides, Critical dimension metrology, Optical lithography, Etching, Calibration, Ions

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Proceedings Article | 14 June 1999 Paper

Paper

Telepresence: a new paradigm for industrial and scientific collaboration

Michael Postek, Marylyn Bennett, Nestor Zaluzec

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350847

KEYWORDS: Manufacturing, Microscopy, Internet, Computing systems, Standards development, Metrology, Human-machine interfaces, Analytical research, Microscopes, Control systems

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Proceedings Article | 21 May 1996 Paper

Paper

Image paradigm for semiconductor defect data reduction

Kenneth Tobin, Shaun Gleason, Thomas Karnowski, Hamed Sari-Sarraf, Marylyn Bennett

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240084

KEYWORDS: Semiconducting wafers, Image segmentation, Image processing, Photomasks, Manufacturing, Semiconductors, Particles, Statistical analysis, Defect detection, Binary data

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Proceedings Article | 22 September 1995 Paper

Paper

Meeting advanced pattern inspection system requirements for 0.25-um technology and beyond

Brian Trafas, Marylyn Bennett, M. Godwin

Proceedings Volume 2635, (1995) https://doi.org/10.1117/12.221460

KEYWORDS: Semiconducting wafers, Prototyping, Inspection, Defect detection, Wafer inspection, Image processing, Reliability, Metals, Optical spheres, Laser systems engineering

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Proceedings Article | 22 May 1995 Paper

Paper

Automatic defect classification: status and industry trends

Marylyn Bennett, Kenneth Tobin, Shaun Gleason

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209203

KEYWORDS: Semiconducting wafers, Image processing, Defect detection, Image segmentation, Fuzzy logic, Manufacturing, Inspection, Semiconductors, Algorithm development, Detection and tracking algorithms

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Proceedings Article | 1 July 1994 Paper

Paper

Particle metrology for microelectronics

Marylyn Hoy Bennett

Proceedings Volume 10274, 102740D (1994) https://doi.org/10.1117/12.187455

KEYWORDS: Particles, Metrology, Microelectronics, Semiconducting wafers, Semiconductors, Photomasks, Process engineering, Manufacturing

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Proceedings Article | 1 June 1992 Paper

Paper

Advanced in-line process control of defects

M. Slama, Marylyn Bennett, Peter Fletcher

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59808

KEYWORDS: Inspection, Semiconducting wafers, Process control, Reliability, Semiconductors, Integrated circuits, Metrology, Manufacturing, Inspection equipment, Particles

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Proceedings Article | 1 June 1992 Paper

Paper

Particle generation mechanisms in vacuum processing tools

Thomas Fu, Marylyn Bennett, R. Bowling

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59844

KEYWORDS: Particles, Semiconducting wafers, Etching, Contamination, Chemical analysis, Scanning electron microscopy, Tungsten, Chemical vapor deposition, Plasma, Silicon

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Proceedings Article | 1 July 1991 Paper

Paper

Semiwafer metrology project

Marylyn Bennett, William Hiatt, Laurie Lauchlan, Lynda Hannemann-Mantalas, Hans Rottmann, Mark Seliger, Bhanwar Singh, Don Yansen

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44472

KEYWORDS: Metrology, Scanning electron microscopy, Semiconducting wafers, Calibration, Process control, Reticles, Integrated circuits, Inspection, Etching, Integrated optics

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Showing 5 of 19 publications

Proceedings Volume Editor (2)

SPIE Conference Volume | 22 May 1995

Integrated Circuit Metrology, Inspection, and Process Control IX

SPIE Conference Volume | 1 May 1994

Integrated Circuit Metrology, Inspection, and Process Control VIII

Conference Committee Involvement (11)

SPIE 31st International Symposium on Advanced Lithography

19 February 2006 | San Jose, United States

Metrology, Inspection, and Process Control for Microlithography XIX

28 February 2005 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XVIII

23 February 2004 | Santa Clara, California, United States

Microlithography 2004

22 February 2004 | Santa Clara, United States

Process and Materials Characterization and Diagnostics in IC Manufacturing II

27 February 2003 | Santa Clara, CA, United States

Showing 5 of 11 Conference Committees

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