Dr. Roy Anunciado Profile

Dr. Roy Anunciado

at ASML Netherlands BV

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Author

Publications (7)

Proceedings Article | 30 April 2023 Presentation

The edge placement error characterization and optimization for advanced logic and DRAM nodes

Roy Anunciado, Yichen Zhang, Konstantin Nechaev, Zuan Khalik, Harm Dillen, Wim Tel, Jaap Karssenberg, Jan Mulkens

Proceedings Volume 12496, 124960O (2023) https://doi.org/10.1117/12.2658832

KEYWORDS: Overlay metrology, Logic, Optical proximity correction, Metrology, Stochastic processes, Semiconductors, Semiconductor manufacturing, Scanners, Manufacturing, Line edge roughness

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Proceedings Article | 1 December 2022 Presentation + Paper

Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE

Stefan van der Sanden, Roy Anunciado, Jisun Lee, Ellaheh Barzegar, Guillaume Schelcher, Stijn Schoofs

Proceedings Volume 12292, 122920J (2022) https://doi.org/10.1117/12.2637772

KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Optical lithography, Critical dimension metrology, Amorphous silicon, Scanning electron microscopy, Dielectrics, Overlay metrology, Photomasks

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Proceedings Article | 13 March 2018 Paper

Assessment of local variability by high-throughput e-beam metrology for prediction of patterning defect probabilities

Stefan Hunsche, Roy Anunciado, Fuming Wang , Antonio Corradi , Junwei Wei, Yongjun Wang, Wei Fang, Anton van Oosten, Koen van Ingen Schenau, Hung Yu Tien, Peng Tang, Patrick Wong, Bram Slachter

Proceedings Volume 10585, 1058525 (2018) https://doi.org/10.1117/12.2297603

KEYWORDS: Semiconducting wafers, Stochastic processes, Scanning electron microscopy, Metrology, Electron beam lithography, Photomasks, Inspection, Critical dimension metrology, Optical proximity correction, Deep ultraviolet

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Proceedings Article | 28 March 2017 Paper

Efficient hybrid metrology for focus, CD, and overlay

B. Segers, R. Anunciado, C. Prentice, T. Hasan, W. T. Tel, P. Wong, Y. Zhang

Proceedings Volume 10145, 101452E (2017) https://doi.org/10.1117/12.2257965

KEYWORDS: Metrology, Overlay metrology, Critical dimension metrology, Optical lithography, Scanners, Semiconductors, Semiconducting wafers, Etching, Sensors, Reticles

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Proceedings Article | 15 March 2016 Paper

CDU budget breakdown as a diagnostic method for imaging sensitivity in HVM

Young Ki Kim, Pavan Samudrala, Juan-Manuel Gomez, Peter Nikolsky, Maria Barkelid, Shawn Lee, Ye Tian, Justin Hanson, Roy Anunciado

Proceedings Volume 9780, 97801Q (2016) https://doi.org/10.1117/12.2214123

KEYWORDS: Semiconducting wafers, Reticles, Critical dimension metrology, Scanners, Photomasks, Metrology, Laser processing, Laser scanners, 3D scanning, Laser metrology

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Proceedings Article | 8 March 2016 Paper

Process window limiting hot spot monitoring for high-volume manufacturing

Marinus Jochemsen, Stefan Hunsche, Xinjian Zhou, Chris Jones, Neal Callan, Roy Anunciado, Vadim Timoshkov

Proceedings Volume 9778, 97781R (2016) https://doi.org/10.1117/12.2219906

KEYWORDS: Semiconducting wafers, Data modeling, Metrology, Defect detection, High volume manufacturing, Deep ultraviolet, Inspection, Detection and tracking algorithms, Process control, Etching, Optical lithography, Scanning electron microscopy, Sensors, Lithography, Scanners

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Proceedings Article | 2 April 2014 Paper

CD uniformity optimization at volume ramp up stage for new product introduction

Won-Kwang Ma, Young-Sik Kim, Jin-Soo Kim, Myoung-Soo Kim, Sung-Ki Park, Peter Nikolsky, Marian Otter, Maryana Escalante Marun, Roy Anunciado, Kyu-Tae Sun, Ewould van West, Greet Storms, Won-Taik Kwon

Proceedings Volume 9050, 905037 (2014) https://doi.org/10.1117/12.2057390

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Yield improvement, Semiconductors, Etching, Photoresist processing, Optical lithography, Process control, Overlay metrology, Manufacturing

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Showing 5 of 7 publications

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