Mr. Sheldon Meyers Profile

Sheldon Meyers

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Publications (5)

Proceedings Article | 22 January 2018 Presentation + Paper

Reduction and control of intrafield focus variation on 7nm technology

Jennifer Shumway, Nathan Neal, Sheldon Meyers, Jens Reichelt, Young Ki Kim, Justin Hanson, Ferhad Kamalizadeh, Dionysios Petromanolakis, Youri van Dommelen, Robert Bonanni, Arjan Gijsbertsen

Proceedings Volume 10147, 101470B (2018) https://doi.org/10.1117/12.2258391

KEYWORDS: Optical lithography, Current controlled current source, Calibration, Scanners, Reticles, Monochromatic aberrations, Software development, Semiconducting wafers

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Proceedings Article | 24 March 2017 Presentation + Paper

Mix-and-match considerations for EUV insertion in N7 HVM

Xuemei Chen, Allen Gabor, Pavan Samudrala, Sheldon Meyers, Erik Hosler, Richard Johnson, Nelson Felix

Proceedings Volume 10143, 101430F (2017) https://doi.org/10.1117/12.2258674

KEYWORDS: Extreme ultraviolet, Overlay metrology, Extreme ultraviolet lithography, Distortion, Control systems, Scanners, Imaging systems, Photomasks, Systems modeling, Error analysis, Semiconducting wafers, Reticles, Metrology

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Proceedings Article | 2 April 2014 Paper

Evaluation of lens heating effect in high transmission NTD processes at the 20nm technology node

Bumhwan Jeon, Sam Lee, Lokesh Subramany, Chen Li, Shyam Pal, Sheldon Meyers, Sohan Mehta, Yayi Wei, David Cho

Proceedings Volume 9050, 90501U (2014) https://doi.org/10.1117/12.2034206

KEYWORDS: Semiconducting wafers, Reticles, Calibration, Photomasks, Critical dimension metrology, Source mask optimization, Computational modeling, Optical lithography, Wavefronts, Overlay metrology

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Proceedings Article | 1 April 2013 Paper

Considerations for high-numerical aperture EUV lithography

Harry Levinson, Pawitter Mangat, Thomas Wallow, Lei Sun, Paul Ackmann, Sheldon Meyers

Proceedings Volume 8679, 867916 (2013) https://doi.org/10.1117/12.2015829

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Reticles, Mask making, Defect inspection, Ions, Scanners, Lithography

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Proceedings Article | 4 April 2012 Paper

High-order wafer alignment in manufacturing

Michael Pike, Nelson Felix, Vinayan Menon, Christopher Ausschnitt, Timothy Wiltshire, Sheldon Meyers, Won Kim, Blandine Minghetti

Proceedings Volume 8324, 832408 (2012) https://doi.org/10.1117/12.916483

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Manufacturing, Control systems, Semiconductor manufacturing, Data modeling, Process control, Metrology

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