Mr. Sungha Woo Profile

Sungha Woo

Sr Manager at SK hynix Inc

SPIE Involvement:

Author

I joined the SK hynix Photomask Technology Team in February 2006 and have been deeply involved in various aspects of photomask process development and R&D process planning.Over the years, I have successfully led the development of EUV masks and the improvement of photomask yields. As an expert in the entire photomask process, I currently lead the Mask Quality Team at SK hynix.

Proceedings Article | 12 November 2024 Presentation + Paper

New EUV mask and blanks for DRAM 1a nm and beyond

Hiroshi Hanekawa, Yoshiaki Ikuta, Jongsub Kim, Hyunman Jo, Sangjin Jo, Euisang Park, Sungha Woo, Chanha Park

Proceedings Volume 13215, 132150E (2024) https://doi.org/10.1117/12.3034600

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Hydrogen, Scanners, Plasma, Optical properties, Lithography, Reflectivity, Inspection, Dry etching

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Proceedings Article | 10 April 2024 Poster + Paper

Wafer printability simulation of EUV mask defects using mask SEM and AFM

Donghwan Son, Lanpo He, Masaki Satake, Ying He, Kihun Park, Suhwan Kim, Jing Jiao, Peter Hu, Vikram Tolani, Kangjoon Seo, Kiwoo Jun, Heeyeon Jang, Sujeong Won, Bonseung Koo, Yongwook Lee, Sungha Woo, Euisang Park

Proceedings Volume 12955, 129552N (2024) https://doi.org/10.1117/12.3010196

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Printing, Extreme ultraviolet, Atomic force microscopy, Contour extraction, Binary data, Data processing, Scanners, Extreme ultraviolet lithography

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Proceedings Article | 10 May 2016 Paper

Comparison of analysis techniques for aerial image metrology on advanced photomask

Seolchong Hwang, Sungha Woo, Heeyeon Jang, Youngmo Lee, Sangpyo Kim, Hyunjo Yang, Kristian Schulz, Anthony Garetto

Proceedings Volume 9984, 998409 (2016) https://doi.org/10.1117/12.2240301

KEYWORDS: Metrology, Photomasks, Critical dimension metrology, Image processing, Scanning electron microscopy, Semiconducting wafers, Image analysis, Error analysis, Reliability, Scanners

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Proceedings Article | 23 October 2015 Paper

A study on the factors that affect the advanced mask defect verification

Sungha Woo, Heeyeon Jang, Youngmo Lee, Sangpyo Kim, Donggyu Yim

Proceedings Volume 9635, 96351Y (2015) https://doi.org/10.1117/12.2195850

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Lithography, Lithographic illumination, Inspection, Error analysis, Photoresist processing, Geometrical optics, Scanners

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Proceedings Article | 8 October 2014 Paper

Characteristics and issues of haze management in a wafer fabrication environment

Sung Ha Woo, Dae Ho Hwang, Goo Min Jeong, Young Mo Lee, Sang Pyo Kim, Dong Gyu Yim

Proceedings Volume 9235, 923524 (2014) https://doi.org/10.1117/12.2066275

KEYWORDS: Air contamination, Photomasks, Laser therapeutics, Pellicles, Semiconducting wafers, Metrology, Critical dimension metrology, Laser processing, Inspection, Chromium

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Proceedings Article | 8 November 2012 Paper

CD uniformity improvement through elimination of hardware influences on post-exposure bake

Jong Hoon Lim, Sung Ha Woo, Eui-Sang Park, Sang Pyo Kim, Dong Gyu Yim, Osamu Katada, Tobias Wähler, Peter Dress, Uwe Dietze

Proceedings Volume 8522, 85222L (2012) https://doi.org/10.1117/12.979470

KEYWORDS: Sensors, Mirrors, Photomasks, Photoresist processing, Temperature metrology, Manufacturing, Optimization (mathematics), Photoresist materials, Etching, Critical dimension metrology

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Proceedings Article | 17 October 2008 Paper

The study of CD behavior due to transmission control position change within photomask substrate

Munsik Kim, Hyemi Lee, Sungha Woo, Kangjoon Seo, Yongkyoo Choi, Changyeol Kim

Proceedings Volume 7122, 712239 (2008) https://doi.org/10.1117/12.801432

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Quartz, Control systems, Printing, Refractive index, Laser scattering, Optical lithography, Ultrafast lasers

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