Mr. Tatsuro Okawa Profile

Tatsuro Okawa

manager at Advantest Corp

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Publications (4)

Proceedings Article | 21 November 2023 Presentation + Paper

Optimizing CD-SEM metrology for anamorphic high-NA EUV photomasks

Kiyoshi Oura, Wataru Ito, Soichi Shida, Tatsuro Okawa, Mark Sheppard, Toshimichi Iwai, Deepan Kishore Kumar, Varun Mohan, Adam Seeger, Malahat Tavassoli, Hatsey Frezghi, Masayuki Kuribara

Proceedings Volume 12751, 127510R (2023) https://doi.org/10.1117/12.2687660

KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical proximity correction, Reticles

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Proceedings Article | 5 October 2023 Paper

High-performance computing architecture (HW/SW) for mask CDSEM design based metrology

Tatsuro Okawa, Toshimichi Iwai, Soichi Shida, Yoshiaki Ogiso, Shinichi Kojima, Yusuke Kakinuma, Naoyuki Tanaka, Kazuo Mukawa

Proceedings Volume 12802, 128020D (2023) https://doi.org/10.1117/12.2675545

KEYWORDS: Image processing, Metrology, Design and modelling, Computer hardware, Image processing software, Scanning electron microscopy, Contour extraction, Parallel processing, Computing systems, Lithography

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Proceedings Article | 25 May 2010 Paper

Evaluation of throughput improvement and character projection in multi-column-cell E-beam exposure system

Tatsuro Okawa, Masaki Yamabe, Masahiro Takizawa, Yoshihisa Oae, Akio Yamada

Proceedings Volume 7748, 774816 (2010) https://doi.org/10.1117/12.864286

KEYWORDS: Photomasks, Logic devices, Beam shaping, Vestigial sideband modulation, Optical proximity correction, Power supplies, Analytical research, Analog electronics, Semiconducting wafers, Logic

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Proceedings Article | 11 March 2010 Paper

Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system

Masahiro Takizawa, Akio Yamada, Yoshihisa Oae, Masaki Yamabe, Tatsuro Okawa

Proceedings Volume 7637, 76370C (2010) https://doi.org/10.1117/12.846464

KEYWORDS: Photomasks, Beam shaping, Vestigial sideband modulation, Power supplies, Semiconducting wafers, Analog electronics, Analytical research, Lenses, Silicon, Calibration

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