Mr. Hideaki Sakurai Profile

Hideaki Sakurai

Process and Manufacturing Engineering at Toshiba Corp

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 29 January 2020 Paper

Paper

Template development for sub15nm nanoimprint lithography

Ryota Seki, Akihiko Ando, Takeharu Motokawa, Machiko Suenaga, Noriko Iida nee Sakurai, Ryu Komatsu, Masato Naka, Rikiya Taniguchi, Syuichi Taniguchi, Kazuki Hagihara, Masato Saito, Hideaki Sakurai, Ryoji Yoshikawa, Eiji Yamanaka, Shingo Kanamitsu

Proceedings Volume 11178, 111780S (2020) https://doi.org/10.1117/12.2567043

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Inspection, Scanning electron microscopy, Optical lithography, Etching, Lithography, Double patterning technology, Quartz

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Proceedings Article | 29 September 2019 Presentation + Paper

Presentation + Paper

Novel cleaning technology for nanoparticle removal

Mana Tanabe, Kosuke Takai, Kyo Otsubo, Kaori Umezawa, Minako Iinuma, Hideaki Sakurai, Shingo Kanamitsu

Proceedings Volume 11148, 111480N (2019) https://doi.org/10.1117/12.2536471

KEYWORDS: Particles, Photomasks, Nanoparticles, Liquids, Nanotechnology, Inspection, Lithography, Optical lithography

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Proceedings Article | 11 May 2009 Paper

Paper

Study of electric-field-induced-development method

Masatoshi Terayama, Hideaki Sakurai, Mari Sakai, Masamitsu Ito, Osamu Ikenaga, Hideo Funakoshi, Takahiro Shiozawa, Syoutarou Miyazaki, Yoshihiko Saito, Naoya Hayashi

Proceedings Volume 7379, 73791X (2009) https://doi.org/10.1117/12.824310

KEYWORDS: Ions, Line edge roughness, Line width roughness, Critical dimension metrology, Spatial frequencies, Photomasks, Photoresist processing, Halftones, Scanning electron microscopy, Fourier transforms

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Proceedings Article | 17 October 2008 Paper

Paper

Study of second-generation Proximity Gap Suction Development System (PGSD-II) for mask fabrication

Hideaki Sakurai, Masatoshi Terayama, Mari Sakai, Masamitsu Itoh, Osamu Ikenaga, Hideo Funakoshi, Norifumi Sato, Kenji Nakamizo, Masato Nomura, Yoshihiko Saito, Junji Nakao, Naoya Hayashi

Proceedings Volume 7122, 71220D (2008) https://doi.org/10.1117/12.801424

KEYWORDS: Particles, Mask making, Metals, Polonium, Liquids, Control systems, Sensors, Error analysis, Atomic force microscopy, Temperature sensors

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Proceedings Article | 20 October 2006 Paper

Paper

More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products

Hideaki Sakurai, Yukio Oppata, Koji Murano, Mari Sakai, Masamitsu Itoh, Hidehiro Watanabe, Hideo Funakoshi, Kotaro Ooishi, Yoshiki Okamoto, Masatoshi Kaneda, Shigenori Kamei, Naoya Hayashi

Proceedings Volume 6349, 63494J (2006) https://doi.org/10.1117/12.685740

KEYWORDS: Mask making, Photomasks, Motion controllers, Electron transport, Printing, Process engineering, Manufacturing, Semiconductor manufacturing, Semiconductors, Photomask technology

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Proceedings Article | 16 June 2005 Paper

Paper

Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication

Hideaki Sakurai, Tooru Shibata, Masamitsu Itoh, Kotaro Ooishi, Hideo Funakoshi, Yoshiki Okamoto, Shigemi Oono, Masatoshi Kaneda, Shigenori Kamei, Naoya Hayashi

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637275

KEYWORDS: Critical dimension metrology, Error analysis, Photomasks, Mask making, Lithium, Visualization, Printing, Process engineering, Manufacturing, Semiconductor manufacturing

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Proceedings Article | 28 August 2003 Paper

Paper

New development method eliminating the loading and microloading effect

Kotaro Ooishi, Yukihiko Esaki, Kazuo Sakamoto, Hideaki Sakurai, Masamitsu Itoh, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi, Shinji Tanabe, Yoshihisa Oosaki, Yasuyoshi Sasagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504050

KEYWORDS: Photomasks, Particles, Critical dimension metrology, Control systems, Printing, Electronics, Sensors, Fluctuations and noise, Humidity

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Proceedings Article | 27 December 2002 Paper

Paper

Performance of proximity gap suction development (PGSD)

Hideaki Sakurai, Masamitsu Itoh, Yukihiko Esaki, Kotaro Ooishi, Kazuo Sakamoto, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467297

KEYWORDS: Critical dimension metrology, Photomasks, Cadmium, Mask making, Photoresist processing, Printing, Process engineering, Manufacturing, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 27 December 2002 Paper

Paper

Novel resist development system for photomasks

Masamitsu Itoh, Hideaki Sakurai, Yukihiko Esaki, Kotaro Ooishi, Kazuo Sakamoto

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467260

KEYWORDS: Photoresist processing, Photomasks, Sensors, Cadmium sulfide, Critical dimension metrology, Chemically amplified resists, Etching, Microfluidics, Photomask technology, Plasma etching

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Proceedings Article | 1 August 2002 Paper

Paper

Novel baking technology using halogen lamps for higher-precision photomask fabrication

Hideaki Sakurai, Masamitsu Itoh, Noboru Fujiwara, Satoshi Yasuda, T. Ishimura, Shigeru Wakayama, Shinichi Ito

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476950

KEYWORDS: Lamps, Halogens, Temperature metrology, Photomasks, Chromium, Quartz, Calibration, Waveguides, Infrared radiation, Surface finishing

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In fabrication of next-generation photomask for devices under 100 nm, more precise control of critical dimension (CD) is required. Each process for the photomask fabrication must be developed corresponding to each requirement of CD accuracy. The same applies to post-exposure baking (PEB) and post-coat baking (PCB), and so more precise control of reaction amount in baking is required. Multiple zone-controlled type of hot plate to improve uniformity of temperature has been enthusiastically developed Generally, conventional hot plates don't directly control the temperature of resist film because its measurement means, for example, thermo-couples or resistance bulb are embedded near the surface of hot plate, and so cannot accurately control resist temperature. We think next-generation baking technology should involve direct measurement and control of the actual temperature of films. Furthermore, serious problems arose in that heat history in PEB was different in each pattern area, such as mask center or edge, and large overshooting of temperature was caused in photomask baking because heat capacity of quartz is very large and heat transfer speed of quartz is very slow. To solve this problem, it is necessary to control resist temperature directly by means of a quick response. It is difficult to satisfy this requirement with conventional bakers of the hot plate type or with such bakers to which a minor improvement has been made to achieve the quick response. To realize the quick response, the four following concepts are needed. (i) Quick response of heat source for resist film (ii) Direct measuring of temperature of resist film (iii) Shortening interval of feedback (iv) Improvement of repeatability ofmeasuring temperature We have studied a candidate next-generation baking technology for photomask fabrication, namely a novel baking system consisting of halogen lamps and non-contact type thermometers. We call this novel baking system "Lamp Heater System". In this paper, the heating performance is reported.

Proceedings Article | 21 July 2000 Paper

Paper

Control of resist heating effect

Hirohito Anze, Takayuki Abe, Hideaki Sakurai, Tomohiro Iijima, Yoshiaki Hattori, Noriaki Nakayamada, Takashi Kamikubo

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390061

KEYWORDS: Critical dimension metrology, Photomasks, HVAC controls, Electron beams, Diffusion, Mask making, Vestigial sideband modulation, Control systems, Analytical research, Microelectronics

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Proceedings Article | 25 August 1999 Paper

Paper

Inspection and printability of programmed defects on reticles for 0.200- and 0.175-um rule devices

Shinji Yamaguchi, Hideki Kanai, Haruki Komano, Hideaki Sakurai, Takehiro Kondo, Masamitsu Itoh, Ichiro Mori, Iwao Higashikawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360229

KEYWORDS: Critical dimension metrology, Photomasks, Inspection, Opacity, Lithography, Scanning electron microscopy, Defect detection, Semiconducting wafers, Tolerancing, Reticles

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Proceedings Article | 25 August 1999 Paper

Paper

Resist heating effect on 50-KeV EB mask writing

Hideaki Sakurai, Takayuki Abe, Masamitsu Itoh, Akitoshi Kumagae, Hirohito Anze, Iwao Higashikawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360210

KEYWORDS: Critical dimension metrology, Electron beams, Photomasks, Chemically amplified resists, Diffusion, Error analysis, Standards development, Semiconductors, Optical simulations, Mask making

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Proceedings Article | 1 September 1998 Paper

Paper

Process optimization for mask fabrication

Hideaki Sakurai, Masamitsu Itoh, Akitoshi Kumagae, Hirohito Anze, Takayuki Abe, Iwao Higashikawa

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328799

KEYWORDS: Photomasks, Photoresist processing, Mask making, Electron beams, Chemically amplified resists, Quartz, Error analysis, Critical dimension metrology, X-ray technology, Coating

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Proceedings Article | 12 February 1997 Paper

Paper

Practical approach to evaluating mask CD uniformity patterned by a variable-shaped beam

Shusuke Yoshitake, Yoji Ogawa, Hideaki Sakurai, Masamitsu Itoh, Iwao Higashikawa, Noriaki Nakayamada, Kazuto Matsuki, Shuichi Tamamushi

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301200

KEYWORDS: Chromium, Beam shaping, Photomasks, Reactive ion etching, Critical dimension metrology, Etching, Semiconductors, Reticles, Optical lithography, Quartz

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Proceedings Article | 24 July 1996 Paper

Paper

Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask

Suigen Kyoh, Hideaki Sakurai, Takayuki Iwamatsu, Akiko Yamada, Iwao Higashikawa

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245248

KEYWORDS: Phase shifts, Transmittance, Photomasks, Halftones, Semiconducting wafers, Critical dimension metrology, Deep ultraviolet, Optical properties, Error analysis, Microelectronics

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Proceedings Article | 27 May 1996 Paper

Paper

CD uniformity of photomasks written with high-voltage variable-shaped e beam

Noriaki Nakayamada, Shigehiro Hara, Toshiyuki Magoshi, Hideaki Sakurai, Takayuki Abe, Iwao Higashikawa

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240462

KEYWORDS: Vestigial sideband modulation, Photomasks, Calibration, Critical dimension metrology, Laser scattering, Scattering, Error analysis, Electron beam lithography, Optics manufacturing, Photoresist processing

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Proceedings Article | 8 December 1995 Paper

Paper

Deep-UV attenuated phase-shift mask for a quarter-micrometer photolithography

Suigen Kyoh, Hideaki Sakurai, Takayuki Iwamatsu, Iwao Higashikawa, Rikiya Taniguchi, Hidehiro Watanabe, Takashi Tuchiya

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228183

KEYWORDS: Photomasks, Phase shifts, Transmittance, Deep ultraviolet, Printing, Semiconducting wafers, Optical lithography, Optical fabrication, Attenuators, Lithography

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Showing 5 of 18 publications

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