Dr. Kwang-sun Yoon Profile

Dr. Kwang-sun Yoon

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 29 March 2013 Paper

Negative tone imaging (NTI) with KrF: extension of 248nm IIP lithography to under sub-20nm logic device

Tae-Hwan Oh, Tae-Sun Kim, Yura Kim, Jahee Kim, Sujeong Heo, Bumjoon Youn, Jaekyung Seo, Kwang-Sub Yoon, Byoung-il Choi

Proceedings Volume 8682, 86820P (2013) https://doi.org/10.1117/12.2011426

KEYWORDS: Photoresist processing, Lithography, Photomasks, Optical lithography, Logic devices, Image processing, Ion implantation, Chemically amplified resists, Scanning electron microscopy, Nanoimprint lithography

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Proceedings Article | 16 April 2011 Paper

Performance of tri-layer process required for 22 nm and beyond

Yayi Wei, Martin Glodde, Hakeem Yusuff, Margaret Lawson, Sang Yil Chang, Kwang Sub Yoon, Chung-Hsi Wu, Mark Kelling

Proceedings Volume 7972, 79722L (2011) https://doi.org/10.1117/12.879301

KEYWORDS: System on a chip, Etching, Silicon, Dielectrics, Semiconducting wafers, Particles, Coating, Reflectivity, Plasma etching, Plasma

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Proceedings Article | 16 April 2011 Paper

Systematic studies on reactive ion etch-induced deformations of organic underlayers

Martin Glodde, Sebastian Engelmann, Michael Guillorn, Sivananda Kanakasabapathy, Erin Mclellan, Chiew-Seng Koay, Yunpeng Yin, Muthumanickam Sankarapandian, John Arnold, Karen Petrillo, Markus Brink, Hiroyuki Miyazoe, E. Anuja de Silva, Hakeem Yusuff, Kwang-sub Yoon, Yayi Wei, Chung-hsi Wu, P. Rao Varanasi

Proceedings Volume 7972, 797216 (2011) https://doi.org/10.1117/12.879442

KEYWORDS: Reactive ion etching, Etching, Ions, Plasma, Hydrogen, Gases, Plasma etching, Silicon, Oxides, Electron beam lithography

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Proceedings Article | 4 March 2010 Paper

OMOG mask topography effect on lithography modeling of 32nm contact hole patterning

Lei Yuan, Wenzhan Zhou, Larry Zhuang, Kwang Sub Yoon, Qun Ying Lin, Scott Mansfield

Proceedings Volume 7640, 76402K (2010) https://doi.org/10.1117/12.846547

KEYWORDS: Photomasks, SRAF, Lithography, Finite element methods, Opacity, Optical lithography, Glasses, Binary data, 3D modeling, Data modeling

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Proceedings Article | 1 April 2009 Paper

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Yun-Kyeong Jang, Jin-Young Yoon, Shi-Yong Lee, Kwang-Sub Yoon, Seok-Hwan Oh, Seong-Woon Choi, Woo-Sung Han, Seokho Kang, Thomas Penniman, Duk-Soo Kim, Dong Won Chung, Sung-Seo Cho, Cheng Bai Xu, George Barclay

Proceedings Volume 7273, 727339 (2009) https://doi.org/10.1117/12.814483

KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

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Proceedings Article | 4 December 2008 Paper

Practical requirement for reflectivity control in sub 30nm device using high NA immersion lithography

Yun-kyeong Jang, So-ra Han, Hyoung-hee kim, Jin-Young Yoon, Shi-yong Lee, Kwang-sub Yoon, Seok-hwan Oh, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 7140, 714032 (2008) https://doi.org/10.1117/12.804671

KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

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Proceedings Article | 20 August 2004 Paper

New approach for quartz dry etching using hardmask for sub-90-nm photomask technology

Sungmin Huh, Ki-Sung Yoon, Il-Yong Jang, Jung-Hyun Hwang, In-Kyun Shin, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557675

KEYWORDS: Quartz, Etching, Photomasks, Dry etching, Chromium, Diffractive optical elements, Polymers, Resolution enhancement technologies, Phase shifts, Ions

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Proceedings Article | 26 June 2003 Paper

ArF issues of 90-nm-node DRAM device integration

Doo-Hoon Goo, Byeong-Soo Kim, Joon-Soo Park, Kwang-Sub Yoon, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485473

KEYWORDS: Line edge roughness, Vacuum ultraviolet, Optical proximity correction, Atrial fibrillation, Photoresist processing, Semiconductors, Etching, Lithography, Semiconducting wafers, Nanoimprint lithography

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Proceedings Article | 24 July 2002 Paper

Fluorocarbon-based single-layer resist for 157-nm lithography

Ki-Yong Song, Kwang-Sub Yoon, Sang-Jun Choi, Sang-Gyun Woo, Woo-Sung Han, Jae-Jun Lee, Sang-Kyun Lee, Chang-Ho Noh, Kenji Honda

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474248

KEYWORDS: Polymers, Lithography, Absorbance, Etching, Carbonates, Resistance, Plasma, Transparency, Systems modeling, Photoresist materials

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Proceedings Article | 24 August 2001 Paper

Novel 193-nm photoresist based on Olefin-containing lactones

Kwang-Sub Yoon, Dong-Won Jung, Sook Lee, Sung-Ho Lee, Sang-Jun Choi, Sang-Gyun Woo, Joo-Tae Moon

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436902

KEYWORDS: Polymers, Etching, Resistance, Photoresist materials, Lithography, Fluorine, Oxides, Polymerization, Dry etching, Chlorine

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Proceedings Article | 23 June 2000 Paper

Novel polymers for 193-nm single-layer resist based on cycloolefin polymers

Hyun-Woo Kim, Si-Hyeung Lee, Ki-Young Kwon, Dong-Won Jung, Sook Lee, Kwang-Sub Yoon, Sang-Jun Choi, Sang-Gyun Woo, Joo-Tae Moon

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388273

KEYWORDS: Polymers, Etching, Polymerization, Lithography, Resistance, Monochromatic aberrations, Transparency, Dry etching, Oxides, Scanning electron microscopy

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Showing 5 of 11 publications

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